公开(公告)号：US10222701B2

公开(公告)日：2019-03-05

申请号：US15024815

申请日：2014-09-18

Applicant: ASML Netherlands B.V.

Inventor： Chuangxin Zhao ,  Sander Baltussen ,  Pär Mårten Lukas Broman ,  Richard Joseph Bruls ,  Cristian Bogdan Craus ,  Jan Groenewold ,  Dzmitry Labetski ,  Kerim Nadir ,  Hendrikus Gijsbertus Schimmel ,  Christian Felix Wählisch

IPC: G03B27/42 ,  G03F7/20 ,  H05G2/00

Abstract: A radiation source for a lithographic apparatus, in particular a laser-produced plasma source includes a fan unit surrounding but not obstructing the collected radiation beam that is operated to generate a flow in a buffer gas away from the optical axis. The fan unit can include a plurality of flat or curved blades generally parallel to the optical axis and driven to rotate about the optical axis.

公开(公告)号：US10042260B2

公开(公告)日：2018-08-07

申请号：US15508543

申请日：2015-08-11

Applicant: ASML Netherlands B.V.

Inventor： Erik Willem Bogaart ,  Chuangxin Zhao

IPC: G01N27/22 ,  G01N27/00 ,  G03F7/20 ,  H05G2/00

Abstract: Capacitive measurements for monitoring vapor or deposits from a vapor in a radiation source for a lithography apparatus. The measurements may be used to control operation of the radiation source. In one particular arrangement measurements from a plurality of capacitors are used to distinguish between changes in capacitance caused by the vapor and changes in capacitance caused by deposits from the vapor.