公开(公告)号：US10095123B2

公开(公告)日：2018-10-09

申请号：US15129380

申请日：2015-04-01

Applicant: ASML Netherlands B.V.

Inventor： Marinus Maria Johannes Van De Wal ,  Wilhelmus Henricus Theodorus Maria Aangenent ,  Jeroen Johannes Theodorus Hendrikus De Best ,  Jan Van Eijk

IPC: G03B27/68 ,  G03F7/20

Abstract: A control system for a positioning system, for positioning a driven object, e.g. in a lithographic apparatus, in N dimensions has M sensors, where M>N. A transformation module converts the M measurements by the sensors into a positional estimate in N dimensions taking into account compliance of the driven object.

公开(公告)号：US09927721B2

公开(公告)日：2018-03-27

申请号：US15314440

申请日：2015-05-01

Applicant: ASML Netherlands B.V.

Inventor： Hans Butler ,  Wilhelmus Henricus Theodorus Maria Aangenent ,  Nic Jasper Dirkx ,  Ramidin Izair Kamidi ,  Wilhelmus Franciscus Johannes Simons

IPC: G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70725 ,  G03F7/70775 ,  G03F9/7088 ,  G03F9/7092

Abstract: An object positioning system including a movable object, an actuator system and a control system. The moveable object is moveable relative to a reference. The actuator system is configured to apply a force to the object at a force application location on the object in order to move the moveable object relative to the reference. The control system is configured to position a point of interest of the object relative to the reference. The control system is configured to drive the actuator system based on a parameter representing a spatial relationship between the force application location and the point of interest. The parameter is dependent on a further parameter representing a position of the object relative to the reference.

公开(公告)号：US09715182B2

公开(公告)日：2017-07-25

申请号：US14647778

申请日：2013-11-25

Applicant: ASML Netherlands B.V.

Inventor： Marinus Maria Johannes Van De Wal ,  Wilhelmus Henricus Theodorus Maria Aangenent ,  Ramidin Izair Kamidi ,  Khalid Manssouri

IPC: G03F7/20

CPC classification number: G03F7/70725 ,  G03F7/70341 ,  G03F7/70758 ,  G03F7/70783

Abstract: A lithographic apparatus includes a driven object having compliant dynamics; a plurality of actuators configured to act on the driven object, wherein the plurality of actuators are over-determined in an actuator degree of freedom; a control system including a transformation matrix configured to generate controller output signals for each of the plurality of actuators in response to a setpoint, wherein the transformation matrix is configured such that the controller output signals do not excite the compliant dynamics of the driven object in at least one degree of freedom.

公开(公告)号：US09494869B2

公开(公告)日：2016-11-15

申请号：US14357530

申请日：2012-12-05

Applicant: ASML Netherlands B.V.

Inventor： Hans Butler ,  Arno Jan Bleeker ,  Pieter Renaat Maria Hennus ,  Martinus Hendricus Henricus Hoeks ,  Sven Antoin Johan Hol ,  Harmen Klaas Van Der Schoot ,  Bernardus Antonius Slaghekke ,  Patricius Aloysius Jacobus Tinnemans ,  Marc Wilhelmus Maria Van Der Wijst ,  Koen Jacobus Johannes Maria Zaal ,  Theodorus Petrus Maria Cadee ,  Ruud Antonius Catharina Maria Beerens ,  Olof Martinus Josephus Fischer ,  Wilhelmus Henricus Theodorus Maria Aangenent ,  Niels Johannes Maria Bosch

IPC: G03B27/32 ,  G03B27/44 ,  G03B27/54 ,  H02K5/24 ,  G03F7/20

CPC classification number: G03F7/70258 ,  G03F7/70275 ,  G03F7/70366 ,  G03F7/70391 ,  G03F7/704 ,  G03F7/70558 ,  G03F7/70816 ,  G03F7/709

Abstract: An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.

Abstract translation: 一种曝光装置，包括：投影系统，被配置为将多个辐射束投影到目标上; 至少可绕轴旋转的可移动框架; 以及致动器系统，其构造成将可移动框架移动到远离与可移动框架的几何中心对应的轴线的轴线上，并使框架围绕通过框架的质心的轴线旋转。

公开(公告)号：US20150168852A1

公开(公告)日：2015-06-18

申请号：US14407038

申请日：2013-06-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Ruud Antonius Catharina Maria Beerens ,  Andre Bernardus Jeunink ,  Marinus Maria Johannes Van De Wal ,  Wilhelmus Henricus Theodorus Maria Aangenent ,  Richard Henricus Adrianus Van Lieshout ,  Henricus Martinus Johannes Van De Groes ,  Saartje Willemijn Van Der Hoeven

IPC: G03F7/20

CPC classification number: G03F7/70775 ,  G03F7/70783

Abstract: There is provided a positioning system for positioning an object in a lithographic apparatus. The positioning system includes a support, a position measurement device, a deformation sensor and a processor. The support is constructed to hold the object. The position measurement device is configured to measure a position of the support. The position measurement device includes at least one position sensor target and a plurality of position sensors to cooperate with the at least one position sensor target to provide a redundant set of position signals representing the position of the support. The deformation sensor is arranged to provide a deformation signal representing a deformation of one of the support and the position measurement device. The processor is configured to calibrate one of the position measurement device and the deformation sensor based on the deformation signal and the redundant set of position signals.

Abstract translation: 提供了一种用于在光刻设备中定位物体的定位系统。 定位系统包括支撑件，位置测量装置，变形传感器和处理器。 构造支撑件来保持对象。 位置测量装置被配置为测量支撑件的位置。 所述位置测量装置包括至少一个位置传感器目标和多个位置传感器，以与所述至少一个位置传感器目标配合，以提供代表所述支撑件的位置的冗余的一组位置信号。 变形传感器被布置成提供表示支撑件和位置测量装置之一的变形的变形信号。 处理器被配置为基于变形信号和冗余的位置信号集来校准位置测量装置和变形传感器之一。