公开(公告)号：US09715182B2

公开(公告)日：2017-07-25

申请号：US14647778

申请日：2013-11-25

Applicant: ASML Netherlands B.V.

Inventor： Marinus Maria Johannes Van De Wal ,  Wilhelmus Henricus Theodorus Maria Aangenent ,  Ramidin Izair Kamidi ,  Khalid Manssouri

IPC: G03F7/20

CPC classification number: G03F7/70725 ,  G03F7/70341 ,  G03F7/70758 ,  G03F7/70783

Abstract: A lithographic apparatus includes a driven object having compliant dynamics; a plurality of actuators configured to act on the driven object, wherein the plurality of actuators are over-determined in an actuator degree of freedom; a control system including a transformation matrix configured to generate controller output signals for each of the plurality of actuators in response to a setpoint, wherein the transformation matrix is configured such that the controller output signals do not excite the compliant dynamics of the driven object in at least one degree of freedom.