公开(公告)号：USRE47237E1

公开(公告)日：2019-02-12

申请号：US15182514

申请日：2016-06-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Niek Jacobus Johannes Roset ,  Nicolaas Ten Kate ,  Sergei Shulepov ,  Raymond Wilhelmus Louis Lafarre

IPC: G03B27/32 ,  G03B27/52 ,  G03B27/58 ,  G03F7/20

Abstract: A lithographic apparatus including a fluid handling structure configured to contain immersion fluid in a space adjacent to an upper surface of the substrate table and/or a substrate located in a recess of the substrate table, a cover having a planar main body that, in use, extends around a substrate from the upper surface to a peripheral section of an upper major face of the substrate in order to cover a gap between an edge of the recess and an edge of the substrate, and an immersion fluid film disruptor, configured to disrupt the formation of a film of immersion fluid between an edge of the cover and immersion fluid contained by the fluid handling structure during movement of the substrate table relative to the fluid handling structure.

公开(公告)号：US09971255B2

公开(公告)日：2018-05-15

申请号：US15451007

申请日：2017-03-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Rogier Hendrikus Magdalena Cortie ,  Nicolaas Ten Kate ,  Niek Jacobus Johannes Roset ,  Michel Riepen ,  Henricus Jozef Castelijns ,  Cornelius Maria Rops ,  Jim Vincent Overkamp

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341

Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; and a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the one or more meniscus pinning features, wherein the plurality of gas supply openings in a linear array are of a similar or the same size.

公开(公告)号：US09927715B2

公开(公告)日：2018-03-27

申请号：US14973421

申请日：2015-12-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Niek Jacobus Johannes Roset ,  Nicolaas Ten Kate ,  Sergei Shulepov ,  Raymond Wilhelmus Louis Lafarre

IPC: G03B27/52 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: A lithographic apparatus having a fluid handling structure configured to contain immersion fluid in a space adjacent to an upper surface of a substrate table and/or a substrate located in a recess of the substrate table, a cover including a planar main body that, in use, extends around a substrate from the upper surface to a peripheral section of an upper major face of the substrate in order to cover a gap between an edge of the recess and an edge of the substrate, and an immersion fluid film disruptor configured to disrupt the formation of a film of immersion fluid between an edge of the cover and immersion fluid contained by the fluid handling structure during movement of the substrate table relative to the fluid handling structure.

公开(公告)号：US20170176875A1

公开(公告)日：2017-06-22

申请号：US15451007

申请日：2017-03-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Rogier Hendrikus Magdalena CORTIE ,  Nicolaas Ten Kate ,  Niek Jacobus Johannes Roset ,  Michel Riepen ,  Henricus Jozef Castelijns ,  Cornelius Maria Rops ,  Jim Vincent Overkamp

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341

Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; and a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the one or more meniscus pinning features, wherein the plurality of gas supply openings in a linear array are of a similar or the same size.

公开(公告)号：US09588437B2

公开(公告)日：2017-03-07

申请号：US14975481

申请日：2015-12-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Rogier Hendrikus Magdalena Cortie ,  Nicolaas Ten Kate ,  Niek Jacobus Johannes Roset ,  Michel Riepen ,  Henricus Jozef Castelijns ,  Cornelius Maria Rops ,  Jim Vincent Overkamp

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341

Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; and a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the one or more meniscus pinning features, wherein the plurality of gas supply openings in a linear array are of a similar or the same size.

Abstract translation: 一种用于光刻设备的流体处理结构，所述流体处理结构在从被配置为将浸没流体包含在流体处理结构外部的区域的空间的边界处具有：弯液面锁定特征，以阻止浸没流体在径向向外 方向从空间; 以及线性阵列中的至少部分地围绕并径向向外的一个或多个弯液面钉扎特征的多个气体供应开口，其中线性阵列中的多个气体供应开口具有相似或相同的尺寸。