公开(公告)号：US11094502B2

公开(公告)日：2021-08-17

申请号：US16064193

申请日：2016-12-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Bernardo Kastrup ,  Johannes Catharinus Hubertus Mulkens ,  Marinus Aart Van Den Brink ,  Jozef Petrus Henricus Benschop ,  Erwin Paul Smakman ,  Tamara Druzhinina ,  Coen Adrianus Verschuren

IPC: H01J37/26 ,  H01J37/15 ,  H01J37/02 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28

Abstract: An electron beam inspection apparatus, the apparatus including a plurality of electron beam columns, each electron beam column configured to provide an electron beam and detect scattered or secondary electrons from an object, and an actuator system configured to move one or more of the electron beam columns relative to another one or more of the electron beam columns. The actuator system may include a plurality of first movable structures at least partly overlapping a plurality of second movable structures, the first and second movable structures supporting the plurality of electron beam columns.

公开(公告)号：US10928736B2

公开(公告)日：2021-02-23

申请号：US16064274

申请日：2016-12-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Pieter Willem Herman De Jager ,  Coen Adrianus Verschuren ,  Erwin Paul Smakman ,  Erwin John Van Zwet ,  Wouter Frans Willem Mulckhuyse ,  Pieter Verhoeff ,  Robert Albertus Johannes Van Der Werf

IPC: G03F7/20 ,  G03B27/42

Abstract: An exposure apparatus including: a substrate holder constructed to support a substrate; a patterning device configured to provide radiation modulated according to a desired pattern, the patterning device including a plurality of two-dimensional arrays of radiation sources, each radiation source configured to emit a radiation beam; a projection system configured to project the modulated radiation onto the substrate, the projection system including a plurality of optical elements arranged side by side and arranged such that a two-dimensional array of radiation beams from a two-dimensional array of radiation sources impinges a single optical element of the plurality of optical elements; and an actuator configured to provide relative motion between the substrate and the plurality of two-dimensional arrays of radiation sources in a scanning direction to expose the substrate.

公开(公告)号：US10180630B2

公开(公告)日：2019-01-15

申请号：US15639467

申请日：2017-06-30

Applicant: ASML Netherlands B.V.

Inventor： Teunis Willem Tukker ,  Nitesh Pandey ,  Coen Adrianus Verschuren

IPC: G03F7/20 ,  F21V9/30 ,  F21V14/08 ,  F21Y115/10

Abstract: An illumination system has a microLED array 502. The microLED array 502 is imaged or placed very close to a phosphor coated glass disc 504 which upconverts the light from the microLED array into a narrow band emission. The plate has at least two different photoluminescent materials arranged to be illuminated by the microLED array and to thereby emit output light. The different photoluminescent materials have different emission spectral properties of the output light, e.g. different center wavelength and optionally different bandwidth. Illumination of different photoluminescent materials by the illumination sources is selectable, by selective activation of the microLEDs or by movement of the photoluminescent materials relative to the illumination sources, to provide different illumination of the different photoluminescent materials. This provides tunable spectral properties of the output light. Selectively configurable filters 506 are arranged to filter the output light in accordance with the selected illumination of the different photoluminescent materials.

公开(公告)号：US20180004095A1

公开(公告)日：2018-01-04

申请号：US15639467

申请日：2017-06-30

Applicant: ASML Netherlands B.V.

Inventor： Teunis Willem TUKKER ,  Nitesh Pandey ,  Coen Adrianus Verschuren

IPC: G03F7/20 ,  F21V9/16 ,  F21V14/08 ,  F21Y2115/10

CPC classification number: G03F7/70191 ,  F21V9/30 ,  F21V14/08 ,  F21Y2115/10 ,  G03F7/7005 ,  G03F7/70575 ,  G03F7/70625 ,  G03F7/70633

Abstract: An illumination system has a microLED array 502. The microLED array 502 is imaged or placed very close to a phosphor coated glass disc 504 which upconverts the light from the microLED array into a narrow band emission. The plate has at least two different photoluminescent materials arranged to be illuminated by the microLED array and to thereby emit output light. The different photoluminescent materials have different emission spectral properties of the output light, e.g. different center wavelength and optionally different bandwidth. Illumination of different photoluminescent materials by the illumination sources is selectable, by selective activation of the microLEDs or by movement of the photoluminescent materials relative to the illumination sources, to provide different illumination of the different photoluminescent materials. This provides tunable spectral properties of the output light. Selectively configurable filters 506 are arranged to filter the output light in accordance with the selected illumination of the different photoluminescent materials.