公开(公告)号：US20240231242A9

公开(公告)日：2024-07-11

申请号：US18279694

申请日：2022-02-03

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Bram Paul Theodoor VAN GOCH ,  Johan Gertrudis Cornelis KUNNEN ,  Sae Na NA

IPC: G03F7/00 ,  G03F1/84

CPC classification number: G03F7/70508 ,  G03F1/84 ,  G03F7/7065

Abstract: A method includes detecting data associated with a patterning device and/or a lithographic apparatus, performing an action from a plurality of actions when a determination not to proceed is made, and performing the action on the patterning device and/or a lithographic apparatus.

公开(公告)号：US20190294056A1

公开(公告)日：2019-09-26

申请号：US16437760

申请日：2019-06-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Johan Gertrudis Cornelis KUNNEN ,  Martijn HOUBEN ,  Thibault Simon Mathieu LAURENT ,  Hendrikus Johannes Marinus VAN ABEELEN ,  Armand Rosa Jozef DASSEN ,  Sander Catharina Reinier DERKS

IPC: G03F7/20 ,  H01L21/687 ,  H01L21/68

Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.

公开(公告)号：US20190196345A1

公开(公告)日：2019-06-27

申请号：US16289875

申请日：2019-03-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Laurentius Johannes Adrianus VAN BOKHOVEN ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Günes NAKIBOGLU ,  Marinus Jan REMIE ,  Johan Gertrudis Cornelis KUNNEN

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70716 ,  G03F7/70783 ,  G03F7/70858 ,  G03F7/70933

Abstract: An apparatus and method for controlling temperature of a patterning device in a lithographic apparatus, by flowing gas across the patterning device. A patterning apparatus includes: a patterning device support structure configured to support a patterning device; a patterning device conditioning system including a first gas outlet configured to provide a gas flow over a surface of the patterning device and a second gas outlet configured to provide a gas flow over a part of a surface of the patterning device support structure not supporting the patterning device; and a control system configured to separately control the temperature of the gas exiting the first and second gas outlets such that the gas exiting the second gas outlet is at a higher temperature than the gas exiting the first gas outlet and/or to separately control the temperature and gas flow rate of the gas exiting the first and second gas outlets.

公开(公告)号：US20170176872A1

公开(公告)日：2017-06-22

申请号：US15435094

申请日：2017-02-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Johan Gertrudis Cornelis KUNNEN ,  Martijn HOUBEN ,  Thibault Simon Mathieu LAURENT ,  Hendrikus Johannes Marinus VAN ABEELEN ,  Armand Rosa Jozef DASSEN ,  Sander Catharina Reinier DERKS

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/707 ,  G03F7/70875 ,  H01L21/68 ,  H01L21/6875

Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.

公开(公告)号：US20150277243A1

公开(公告)日：2015-10-01

申请号：US14634272

申请日：2015-02-27

Applicant: ASML NETHERLANDS B.V.

Inventor： Johan Gertrudis Cornelis KUNNEN ,  Martijn HOUBEN ,  Thibault Simon Mathieu LAURENT ,  Hendrikus Johannes Marinus VAN ABEELEN ,  Armand Rosa Jozef DASSEN ,  Sander Catharina Reinier DERKS

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/707 ,  G03F7/70875 ,  H01L21/68 ,  H01L21/6875

Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.

Abstract translation: 用于光刻设备的支撑台，支撑台具有支撑部分和调节系统，其中支撑部分，调节系统或两者都被配置成使得热传递到支撑在支撑台上的基板或从支撑在支撑台上的基板，导致 从处理系统的操作来看，在衬底的与衬底边缘相邻的区域中比在衬底中心处的区域更大。

公开(公告)号：US20230176487A1

公开(公告)日：2023-06-08

申请号：US17922580

申请日：2021-05-03

Applicant: ASML NETHERLANDS B.V.

Inventor： Rogier Sebastiaan GILIJAMSE ,  Johan Gertrudis Cornelis KUNNEN ,  Marco Adrianus Peter VAN DEN HEUVEL ,  Boogyeong Zoo

IPC: G03F7/20

CPC classification number: G03F7/70533 ,  G03F7/7085 ,  G03F7/70783

Abstract: A substrate support system is provided that includes: a support part configured to support a bottom surface of a substrate on a support plane; a moveable part moveable between a retracted position, in which a top end of the moveable part is below the support plane, and an extended position, in which the top end of the moveable part is above the support plane, such that the top end supports the bottom surface of the substrate above the support plane in the extended position; and a measurement system configured to measure a time taken for the moveable part to move from the retracted position to the extended position, to compare the measured time with a reference time, and to generate a signal when the measured time deviates from the reference time by more than a predetermined amount.

公开(公告)号：US20220171299A1

公开(公告)日：2022-06-02

申请号：US17599302

申请日：2020-01-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Ruud Hendrikus Martinus Johannes BLOKS ,  Hendrik Cornelis Anton BORGER ,  Frederik Eduard DE JONG ,  Johan Gertrudis Cornelis KUNNEN ,  Siebe LANDHEER ,  Chung-Hsun LI ,  Patricius Jacobus NEEFS ,  Georgios TSIROGIANNIS ,  Si-Han ZENG

IPC: G03F7/20

Abstract: A method of determining an overlay value of a substrate, the method including: obtaining temperature data that includes data on measured temperature at one or more positions on a substrate table after a substrate has been loaded onto the substrate table; and determining an overlay value of the substrate in dependence on the obtained temperature data. There is further disclosed a method of determining a performance of a clamping by a substrate table using a determined overlay value.

公开(公告)号：US20180356740A1

公开(公告)日：2018-12-13

申请号：US16061043

申请日：2016-11-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Laurentius Johannes Adrianus VAN BOKHOVEN ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Günes NAKIBOGLU ,  Marinus Jan REMIE ,  Johan Gertrudis Cornelis KUNNEN

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70716 ,  G03F7/70783 ,  G03F7/70858 ,  G03F7/70933

Abstract: An apparatus and method for controlling temperature of a patterning device in a lithographic apparatus, by flowing gas across the patterning device. A patterning apparatus includes: a patterning device support structure configured to support a patterning device; a patterning device conditioning system including a first gas outlet configured to provide a gas flow over a surface of the patterning device and a second gas outlet configured to provide a gas flow over a part of a surface of the patterning device support structure not supporting the patterning device; and a control system configured to separately control the temperature of the gas exiting the first and second gas outlets such that the gas exiting the second gas outlet is at a higher temperature than the gas exiting the first gas outlet and/or to separately control the temperature and gas flow rate of the gas exiting the first and second gas outlets.

公开(公告)号：US20170212429A1

公开(公告)日：2017-07-27

申请号：US15329536

申请日：2015-07-16

Applicant: ASML Netherlands B.V.

Inventor： Adrianus Hendrik KOEVOETS ,  Christianus Wilhelmus Johannes BERENDSEN ,  Rogier Hendrikus Magdalena CORTIE ,  Jim Vincent OVERKAMP ,  Patricius Jacobus NEEFS ,  Putra SAPUTRA ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Michael Johannes Hendrika Wilhelmina RENDERS ,  Johan Gertrudis Cornelis KUNNEN ,  Thibault Simon Mathieu LAURENT

IPC: G03F7/20

CPC classification number: G03F7/70725 ,  G03F7/70341 ,  G03F7/70783 ,  G03F7/70875

Abstract: A lithographic apparatus comprising an object table which carries an object. The lithographic apparatus may further comprise at least one sensor as part of a measurement system to measure a characteristic of the object table, the environment surrounding the lithographic apparatus or another component of the lithographic apparatus. The measured characteristic may be used to estimate the deformation of the object due to varying loads during operation of the lithographic apparatus, for example varying loads induced by a two- phase flow in a channel formed within the object table. Additionally, or alternatively, the lithographic apparatus comprises a predictor to estimate the deformation of the object based on a model. The positioning of the object table carrying the object can be controlled based on the estimated deformation. The positioning of a projection beam, used to pattern a substrate, can be controlled relative to the object, to alter the position of the pattern and/or the projection beam on the substrate, based on the estimated deformation.

公开(公告)号：US20160202618A1

公开(公告)日：2016-07-14

申请号：US15078814

申请日：2016-03-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Thibault Simon Mathieu LAURENT ,  Gerardus Adrianus Antonius Maria KUSTERS ,  Bastiaan Andreas Wilhelmus Hubertus KNARREN ,  Raymond Wilhelmus Louis LAFARRE ,  Koen STEFFENS ,  Takeshi KANEKO ,  Robbert Jan VOOGD ,  Gregory Martin Mason CORCORAN ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Johan Gertrudis Cornelis KUNNEN ,  Ramin BADIE

IPC: G03F7/20

CPC classification number: G03F7/70483 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/70875

Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.

Abstract translation: 一种用于支撑衬底支撑区域上的衬底的衬底台，所述衬底台具有至少在衬底支撑区域下方的传热流体通道，以及多个加热器和/或冷却器，以热控制通道中的传热流体 位于基板支撑区域下方的位置。