SCHOTTKY DEVICE
    15.
    发明申请
    SCHOTTKY DEVICE 有权
    肖特设备

    公开(公告)号:US20090283841A1

    公开(公告)日:2009-11-19

    申请号:US12329677

    申请日:2008-12-08

    CPC classification number: H01L27/0814 H01L29/0692 H01L29/417 H01L29/872

    Abstract: An integrated circuit structure has a metal silicide layer formed on an n-type well region, a p-type guard ring formed on the n-type well region and encircling the metal silicide layer. The outer portion of the metal silicide layer extends to overlap the inner edge of the guard ring, and a Schottky barrier is formed at the junction of the internal portion of the metal silicide layer and the well region. A conductive contact is in contact with the internal portion and the outer portion of the metal silicide layer.

    Abstract translation: 集成电路结构具有形成在n型阱区上的金属硅化物层,形成在n型阱区上并环绕金属硅化物层的p型保护环。 金属硅化物层的外部部分延伸成与保护环的内边缘重叠,并且在金属硅化物层的内部部分与阱区域的接合处形成肖特基势垒。 导电接触件与金属硅化物层的内部部分和外部部分接触。

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