公开(公告)号：US20230212739A1

公开(公告)日：2023-07-06

申请号：US18119506

申请日：2023-03-09

Applicant: Applied Materials, Inc.

Inventor： Jinrui GUO ,  Ludovic GODET ,  Rutger MEYER TIMMERMAN THIJSSEN

IPC: C23C16/455 ,  C23C16/32 ,  C23C16/04

CPC classification number: C23C16/45544 ,  C23C16/325 ,  C23C16/042

Abstract: Embodiments of the present disclosure generally relate to processing an optical workpiece containing grating structures on a substrate by deposition processes, such as atomic layer deposition (ALD). In one or more embodiments, a method for processing an optical workpiece includes positioning a substrate containing a first layer within a processing chamber, where the first layer contains grating structures separated by trenches formed in the first layer, and each of the grating structures has an initial critical dimension, and depositing a second layer on at least the sidewalls of the grating structures by ALD to produce corrected grating structures separated by the trenches, where each of the corrected grating structures has a corrected critical dimension greater than the initial critical dimension.

公开(公告)号：US20230194982A1

公开(公告)日：2023-06-22

申请号：US18091525

申请日：2022-12-30

Applicant: Applied Materials, Inc.

Inventor： Yingdong LUO ,  Yongan XU ,  Kang LUO ,  Ludovic GODET

IPC: G03F7/00

CPC classification number: G03F7/0015 ,  G03F7/0002

Abstract: Embodiments described herein provide method a method of forming optical devices using nanoimprint lithography that maintains the critical dimension of the optical device structures. The method described herein accounts for lateral shrinkage of the solvent based resist during the cure process to maintain the critical dimension. The method includes disposing a stamp coating on a stamp having an inverse optical device pattern of inverse structures. The coating is disposed on sidewalls, inverse structure bottom, and inverse structure top of the inverse structures. The method includes etching the inverse structures such that the stamp coating remains on the sidewalls and is removed from the inverse structure top and bottom. The method further includes imprinting the stamp into an optical device material disposed and subjecting the imprintable optical device material to a cure process which transfers the optical device critical dimension to the optical device structures of the optical device pattern.

公开(公告)号：US20230033741A1

公开(公告)日：2023-02-02

申请号：US17963983

申请日：2022-10-11

Applicant: Applied Materials, Inc.

Inventor： Tapashree ROY ,  Rutger MEYER TIMMERMAN THIJSSEN ,  Ludovic GODET ,  Jinxin FU

IPC: C23C16/02 ,  C23C16/40 ,  C23C16/04

Abstract: A method and apparatus for creating a flat optical structure is disclosed. The method includes etching at least one trench in a substrate, placing a dielectric material in at least one trench in the substrate and encapsulating the top of the substrate with a film.

公开(公告)号：US20220392053A1

公开(公告)日：2022-12-08

申请号：US17753555

申请日：2020-09-14

Applicant: Applied Materials, Inc.

Inventor： Yongan XU ,  Chan Juan XING ,  Jinxin FU ,  Yifei WANG ,  Wayne MCMILLAN ,  Ludovic GODET

IPC: G06T7/00 ,  G06T7/33

Abstract: Embodiments of the present disclosure include a die system and a method of comparing alignment vectors. The die system includes a plurality of dies arranged in a desired pattern. An alignment vector, such as a die vector, can be determined from edge features of the die. The alignment vectors can be compared to other dies or die patterns in the same system. A method of comparing dies and die patterns includes comparing die vectors and/or pattern vectors. The comparison between alignment vectors allows for fixing the die patterns for the next round of processing. The methods provided allow accurate comparisons between as-deposited edge features, such that accurate stitching of dies can be achieved.

公开(公告)号：US20220357668A1

公开(公告)日：2022-11-10

申请号：US17661927

申请日：2022-05-04

Applicant: Applied Materials, Inc.

Inventor： Ludovic GODET ,  Hao TANG ,  Nai-Wen PI ,  Yongan XU

IPC: G03F7/20

Abstract: An image projection system is provided. The system can be used for performing lithography. The system includes a deuterium light source, a converging lens coupled to the deuterium light source. The system includes an aperture configured to provide image tiling disposed adjacent to the converging lens. The system includes a movable stage disposed adjacent to the aperture. A method of fabricating an optical device is provided. The method includes depositing a resist over a substrate and determining an exposure pattern for the optical device. The method includes exposing a portion of the resist with a light beam based on the determined exposure pattern. Exposing the portion of the resist includes directing the light beam from a deuterium light source to the substrate and developing the resist.

公开(公告)号：US20220352002A1

公开(公告)日：2022-11-03

申请号：US17706319

申请日：2022-03-28

Applicant: Applied Materials, Inc.

Inventor： Ludovic GODET ,  Rutger MEYER TIMMERMAN THIJSSEN

IPC: H01L21/683 ,  B25B11/00 ,  H01L21/687

Abstract: Embodiments described herein relate to a substrate chucking apparatus having a plurality of cavities formed therein. The cavities are formed in a body of the chucking apparatus and a plurality of support elements extend from the body and separate each of the plurality of cavities. In one embodiment, a first plurality of ports are formed in a top surface of the body and extend to a bottom surface of the body through one or more of the plurality of support elements. In another embodiment, a second plurality of ports are formed in a bottom surface of the plurality of cavities and extend through the body to a bottom surface of the body. In yet another embodiment, a first electrode assembly is disposed adjacent the top surface of the body within each of the plurality of support elements and a second electrode assembly is disposed within the body adjacent each of the plurality of cavities.

公开(公告)号：US20220291082A1

公开(公告)日：2022-09-15

申请号：US17653785

申请日：2022-03-07

Applicant: Applied Materials, Inc.

Inventor： Jinxin FU ,  Yangyang SUN ,  Kazuya DAITO ,  Ludovic GODET

IPC: G01M11/02 ,  G01S17/89 ,  G01S7/481

Abstract: Embodiments of the present disclosure relate to measurement systems and methods of measuring efficiency of optical devices. In one example, the measurement systems include a light source, a mirror, an illumination source, and a sensor. The light source provides a light beam to the optical device to be diffracted into diffraction beams having diffraction orders. The diffractions beams form a diffraction pattern. The method includes positioning the optical device in the measurement system and directing the diffraction beams to the sensor. The sensor is operable to measure the efficiency of the optical device by measuring the diffraction pattern.

公开(公告)号：US20220276498A1

公开(公告)日：2022-09-01

申请号：US17745457

申请日：2022-05-16

Applicant: Applied Materials, Inc.

Inventor： Ludovic GODET ,  Wayne MCMILLAN ,  Rutger MEYER TIMMERMAN THIJSSEN

IPC: G02B27/09 ,  G02B5/18 ,  G03F1/80 ,  G03F7/00

Abstract: The systems and methods discussed herein are for the fabrication of diffraction gratings, such as those gratings used in waveguide combiners. The waveguide combiners discussed herein are fabricated using nanoimprint lithography (NIL) of high-index and low-index materials in combination with and directional etching high-index and low-index materials. The waveguide combiners can be additionally or alternatively formed by the directional etching of transparent substrates. The waveguide combiners that include diffraction gratings discussed herein can be formed directly on permanent transparent substrates. In other examples, the diffraction gratings can be formed on temporary substrates and transferred to a permanent, transparent substrate.

公开(公告)号：US20220155678A1

公开(公告)日：2022-05-19

申请号：US17527819

申请日：2021-11-16

Applicant: Applied Materials, Inc.

Inventor： Amita JOSHI ,  Andrew CEBALLOS ,  Kenichi OHNO ,  Rami HOURANI ,  Ludovic GODET

IPC: G03F7/00 ,  C09D7/40 ,  C09D7/62 ,  C09D7/65 ,  G03F7/16 ,  B05D1/00 ,  C23C16/40 ,  C23C16/455

Abstract: Embodiments of the present disclosure generally relate to imprint compositions and materials and related processes useful for nanoimprint lithography (NIL). In one or more embodiments, an imprint composition is provided and contains a plurality of passivated nanoparticles, one or more solvents, a surface ligand, an additive, and an acrylate. Each passivated nanoparticle contains a core and one or more shells, where the core contains one or more metal oxides and the shell contains one or more passivation materials. The passivation material of the shell contains one or more atomic layer deposition (ALD) materials, one or more block copolymers, or one or more silicon-containing compounds.

公开(公告)号：US20220100084A1

公开(公告)日：2022-03-31

申请号：US17545554

申请日：2021-12-08

Applicant: Applied Materials, Inc.

Inventor： Ludovic GODET ,  Chien-An CHEN ,  Brian Alexander COHEN ,  Wayne MCMILLAN ,  Ian Matthew MCMACKIN

IPC: G03F7/00 ,  G02B6/34

Abstract: Methods for patterning of multi-depth layers for the fabrication of optical devices are provided. In one embodiment, a method is provided that includes disposing a resist layer over a device layer disposed over a top surface of a substrate, the device layer having a first portion and a second portion, patterning the resist layer to form a first resist layer pattern having a plurality of first openings and a second resist layer pattern having a plurality of second openings, and etching exposed portions of the device layer defined by the plurality of first openings and the plurality of second openings, wherein the plurality of first openings are configured to form at least a portion of a plurality of first structures within the optical device, and the plurality of second openings are configured to form at least a portion of a plurality of second structures within the optical device.