公开(公告)号：US07498119B2

公开(公告)日：2009-03-03

申请号：US11336365

申请日：2006-01-20

Applicant: Scott Limb ,  William Wong ,  Steven Ready ,  Michael Chabinyc

Inventor： Scott Limb ,  William Wong ,  Steven Ready ,  Michael Chabinyc

IPC: G03F7/20 ,  G03F7/26 ,  G03F7/38

CPC classification number: G03F7/0007 ,  G02F1/133516 ,  G03F7/2018

Abstract: A print patterned mask is formed a digital lithographic process on the surface of a photoresist or similar material layer. The print patterned mask is then used as a development or etching mask, and the underlying layer overdeveloped or overetched to undercut the print patterned mask. The mask may be removed and the underlying structure used an etch mask or as a final structure. Fine feature widths, narrower the minimum width of the print patterned mask features, may be obtained while realizing the benefits of digital lithography in the manufacturing process.

Abstract translation: 打印图案化掩模在光致抗蚀剂或类似材料层的表面上形成数字平版印刷工艺。 然后将印刷图案化掩模用作显影或蚀刻掩模，并且底层被发展或过蚀刻以削去印刷图案掩模。 可以去除掩模，并且底层结构使用蚀刻掩模或作为最终结构。 可以在实现数字光刻在制造过程中的益处的同时获得细微的特征宽度，使印刷图案化掩模特征的最小宽度更窄。

公开(公告)号：US20080107878A1

公开(公告)日：2008-05-08

申请号：US11986155

申请日：2007-11-20

Applicant: Lyn Irving ,  David Levy ,  Mark Irving

Inventor： Lyn Irving ,  David Levy ,  Mark Irving

IPC: G03C5/56 ,  B32B3/00

CPC classification number: G03F7/2018 ,  G03F1/56 ,  G03F7/0035 ,  G03F7/027 ,  G03F7/2014 ,  Y10T428/24802 ,  Y10T428/24917

Abstract: The invention relates to a process for forming a stacked transparent structure comprising providing a support, coating one side of said support with a multicolored mask, coating the other side of the support with a layer curable by visible light, and exposing the light-curable layer through the mask with visible light to cure the layer curable by light in exposed portions to form a cured pattern.

Abstract translation: 本发明涉及一种用于形成层叠透明结构的方法，包括提供支撑体，用多色面罩涂覆所述支撑体的一侧，用可见光固化的层涂覆支撑体的另一侧，并将可光固化层 通过具有可见光的掩模来固化由暴露部分中的光可固化的层以形成固化图案。

公开(公告)号：US20070212647A1

公开(公告)日：2007-09-13

申请号：US11587506

申请日：2005-04-25

Applicant: Toshiya Takagi ,  Takashi Fujimoto ,  Tadahiko Tabe

Inventor： Toshiya Takagi ,  Takashi Fujimoto ,  Tadahiko Tabe

IPC: G03F7/00

CPC classification number: G03F7/2018

Abstract: Provided are an original printing plate for relief printing that solves both the problems of the prior-art negative film or its alternatives, and problems of mask pattern formation directly on the surface of the photosensitive resin layer by an ink composition, as well as a method for forming an relief printing plate using the same. Employing a photosensitive original printing plate for relief printing including a support substrate (A); a photosensitive resin layer (B) provided thereon and having a photosensitivity to light in a predetermined wavelength region; and an ink holding layer (C) provided thereon; wherein the layer (C) is capable of retaining a light-shielding ink, and capable of constituting a light-shielding pattern inside the layer (C), the light-shielding pattern being formed by applying the light-shielding ink to the (C) in accordance with the pattern; and wherein the (C) at the area to which the light-shielding ink is not applied is substantially transparent to the light in the predetermined wavelength region.

Abstract translation: 本发明提供一种用于浮雕印刷的原版印版，其解决了现有技术的负片或其替代品的问题，以及通过油墨组合物直接在感光性树脂层的表面上形成的掩模图案的问题，以及方法 用于形成使用其的凸版印刷版。 采用包括支撑基板（A）的凸版印刷的光敏原版印刷板; 其上设置有对预定波长区域的光敏感的感光性树脂层（B） 和设置在其上的墨水保持层（C） 其中，所述层（C）能够保持遮光油墨，并且能够在所述层（C）内部构成遮光图案，所述遮光图案是通过将遮光油墨施加到（C ）按照模式; 并且其中在未被施加遮光油墨的区域处的（C）对于预定波长区域中的光基本上是透明的。

公开(公告)号：US20060160016A1

公开(公告)日：2006-07-20

申请号：US11249168

申请日：2005-10-11

Applicant: Albert Deutsch ,  Eugene Langlais

Inventor： Albert Deutsch ,  Eugene Langlais

IPC: G03C1/76

CPC classification number: B41C1/1016 ,  B41C1/1041 ,  B41C1/1066 ,  B41C2201/04 ,  B41C2201/14 ,  B41C2210/02 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  G03F7/0042 ,  G03F7/0085 ,  G03F7/0166 ,  G03F7/027 ,  G03F7/038 ,  G03F7/095 ,  G03F7/16 ,  G03F7/2018

Abstract: Lithographic printing plates are imaged using an inkjet printer to imagewise apply a chemical agent onto the plate surface. The chemical causes a change that facilitates lithographic printing.

Abstract translation: 使用喷墨打印机对平版印刷版进行成像，以使化学试剂成像到板表面上。 该化学品导致促进平版印刷的变化。

公开(公告)号：US20050085385A1

公开(公告)日：2005-04-21

申请号：US10689468

申请日：2003-10-20

Applicant: Donald Swihart ,  Kevin Kidnie ,  Richard Buchholtz

Inventor： Donald Swihart ,  Kevin Kidnie ,  Richard Buchholtz

IPC: B41M5/382 ,  B41M5/385 ,  B41M5/392 ,  B41M5/42 ,  B41M5/46 ,  G03F1/00 ,  G03F3/10 ,  B41M5/20

CPC classification number: B41M5/42 ,  B41M5/38214 ,  B41M5/385 ,  B41M5/392 ,  B41M5/46 ,  G03F7/2018

Abstract: A UV-mask, a system and method for making the mask and a method of using the mask for producing an image a print medium are disclosed. The system includes a donor element having a substrate coated with a layer of IR-sensitive material and a layers of UV-absorbing material, and a receptor element. The IR-sensitive material is capable of detaching a significant portion of the itself and the UV-absorbing material from the donor element and transfer the detached materials to the receptor element when irradiated by an IR radiation. The method for making a UV-mask includes irradiating such a donor element with an IR radiation. The method of using includes overlaying a digital UV mask on a UV-sensitive medium, exposing the medium to a UV radiation through the UV mask, and developing the UV-sensitive medium.

公开(公告)号：US20050037293A1

公开(公告)日：2005-02-17

申请号：US10804871

申请日：2004-03-19

Applicant: Albert Deutsch

Inventor： Albert Deutsch

IPC: B41C1/10 ,  G03F1/00 ,  G03F7/20 ,  G03F7/38 ,  G03C5/18

CPC classification number: G03F7/2018 ,  B41C1/1066 ,  G03F7/2022 ,  G03F7/38

Abstract: A process for imaging a lithographic printing plate by ink jet printing imagewise a near infrared absorbing material onto a coated plate. The plate is then exposed to near infrared emitters followed by developing the coating.

Abstract translation: 用于通过将近红外吸收材料成像到涂布板上的喷墨印刷来成像平版印刷版的方法。 然后将板暴露于近红外发射器，随后显影涂层。

公开(公告)号：US20040038152A1

公开(公告)日：2004-02-26

申请号：US10617151

申请日：2003-07-10

Inventor： Jonathan W. Goodin ,  Brian J. Collister

IPC: G03F007/00

CPC classification number: G03F7/2018 ,  B41C1/1008 ,  B41C2210/02 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262

Abstract: An inkjet method is used to make a negative working offset lithographic printing master by imagewise application of liquid inkjet droplets that form a mask on a layer of positive-working radiation imageable material pre-coated on a hydrophilic lithographic base. The masked layer is then subjected to a developer and developed. After development, only the masked areas of the positive working imageable material remain. Since this material is hydrophobic the resulting imaged layer on the hydrophilic lithographic base may be employed as a wet offset lithographic master. Since the image that is printed by the printing master coincides directly with the image printed by the inkjetting process on the imageable material, the method is inherently negative-working. By the method of the present invention positive-working radiation imageable media is therefore employed to make a negative-working printing master. The combination of positive working radiation-imageable medium and masking fluid of this invention may be used in the fully on-press fabrication of a negative working lithographic master, which may optionally may also be made on a re-usable base.

Abstract translation: 使用喷墨方法通过在预先涂布在亲水性光刻基底上的正性可辐射成像材料层上形成掩模的液体喷墨液滴成像应用来制造负性胶印平版印刷母版。 然后将掩蔽层进行显影并显影。 开发后，仅保留正性可成像材料的掩蔽区域。 由于该材料是疏水性的，亲水平版印刷基底上的所得成像层可用作湿式胶版印刷母版。 由于由打印母版打印的图像与可成像材料上的喷墨处理打印的图像直接重合，所以该方法本来是负面的。 通过本发明的方法，因此使用正性辐射可成像介质来制造负性印刷母版。 本发明的正工作的可辐射成像介质和掩蔽流体的组合可以用于负工作光刻母版的完全压制制造，其可以任选地还可以在可再使用的基底上制成。

公开(公告)号：US20030027082A1

公开(公告)日：2003-02-06

申请号：US09838684

申请日：2001-04-19

Applicant: Xerox Corporation

Inventor： William S. Wong ,  Robert A. Street ,  Stephen D. White ,  Robert Matusiak ,  Raj B. Apte

IPC: G03F009/00 ,  B44C001/22 ,  C23F001/00 ,  C03C025/68 ,  G03C005/00 ,  C03C015/00

CPC classification number: G03F7/2018 ,  B41C1/025 ,  B41M3/006 ,  B41M5/0011 ,  G02F1/1303 ,  H01L27/1292

Abstract: A method and system for masking a surface to be etched is described. A droplet source ejects droplets of a masking material for deposit on a thin-film or other substrate surface to be etched. The temperature of the thin-film or substrate surface is controlled such that the droplets rapidly freeze upon contact with the thin-film or substrate surface. The thin-film or substrate is then etched. After etching the masking material is removed.

Abstract translation: 描述用于掩蔽待蚀刻表面的方法和系统。 液滴源喷射掩模材料的液滴以沉积在待蚀刻的薄膜或其它衬底表面上。 控制薄膜或基板表面的温度，使得液滴在与薄膜或基板表面接触时快速冷冻。 然后蚀刻薄膜或衬底。 蚀刻后，去除掩模材料。

公开(公告)号：US20020136983A1

公开(公告)日：2002-09-26

申请号：US10094785

申请日：2002-03-11

Applicant: AGFA-GEVAERT

Inventor： Eric Verschueren

IPC: G03F007/038

CPC classification number: B41C1/1066 ,  B41C1/1008 ,  B41C1/1075 ,  B41C2210/04 ,  B41C2210/08 ,  B41C2210/24 ,  G03F7/2018

Abstract: A method is disclosed for making a printing plate precursor by applying a coating solution onto a substrate by means of a valve-jet print head, thereby obtaining a heat- or light-sensitive image-recording layer. The method is preferably used for on-press coating and provides a high coating quality and yield.

Abstract translation: 公开了一种通过借助于阀喷射打印头将涂布溶液施加到基材上从而获得热敏感光图像记录层来制造印版前体的方法。 该方法优选用于压制涂布并提供高涂层质量和产率。

公开(公告)号：US06326124B1

公开(公告)日：2001-12-04

申请号：US09589845

申请日：2000-06-08

Applicant: Wolfgang Alince ,  Dietmar Dudek

Inventor： Wolfgang Alince ,  Dietmar Dudek

IPC: G03C176

CPC classification number: G03F7/2018 ,  G03F7/091

Abstract: An edge-covering material and a process for preventing undesirable ridges from exposure of laser-processible, photopolymerizable printing plates premounted on sleeves or cylinders is disclosed. The edge-covering material containing at least one soluble, film-forming polymer, at least one UV absorber, and a solvent or a solvent mixture is applied on the edges of the photo-polymerizable printing plate before imagewise exposure of the photopolymerizable printing plate.

Abstract translation: 公开了一种边缘覆盖材料和用于防止不期望的脊部暴露于预先安装在套筒或圆筒上的可激光加工的可光聚合印刷板的方法。 在光聚合印版的成像曝光之前，将包含至少一种可溶成膜聚合物，至少一种UV吸收剂和溶剂或溶剂混合物的边缘覆盖材料施加到可光聚合印版的边缘上。