Wien filter with integrated vacuum pump

    公开(公告)号:US11056313B1

    公开(公告)日:2021-07-06

    申请号:US16904910

    申请日:2020-06-18

    Abstract: An integral Wien filter and vacuum pump for separating charged particles or for orienting their spin direction while maintaining optimal beamline vacuum. The vacuum pump is an ion pump including one or more cylindrical Penning cells to trap and expel electrons. The Wien filter includes orthogonal electric and magnetic fields to direct particles with the desired speed through the device while deflecting particles at undesired speeds. The Wien filter includes two electrodes, one biased positive and one biased negative, a dipole magnet, and means for reversing polarity of the electrodes to flip the spin of the charged particles. Metal plates on either side of the Penning cells embed gas that is ionized by trapped electrons in the Penning cell thus creating vacuum by turning gas into solid. The two metal plates can be configured to obtain vacuum pumping via chemical gettering and for removal of noble gases.

    Charged particle detection system
    112.
    发明授权

    公开(公告)号:US11031210B2

    公开(公告)日:2021-06-08

    申请号:US16810879

    申请日:2020-03-06

    Abstract: A scintillator assembly including an entrance surface for receiving charged particles into the scintillator assembly, the charged particles including first charged particles at a first energy level and second charged particles at a second energy level. A first scintillator structure configured for receiving the first charged particles and generating a corresponding first signal formed of first photons with a first wavelength of λ1, a second scintillator structure configured for receiving the second charged particles and generating a corresponding second signal of second photons with a second wavelength of λ2, and an emitting surface for egress of a combined signal from the scintillator assembly, the combined signal including the first and second photons, and at least one beam splitter for receiving the combined signal and separating the combined signal to first and second photons.

    METHOD OF ENHANCING THE ENERGY AND BEAM CURRENT ON RF BASED IMPLANTER

    公开(公告)号:US20210057182A1

    公开(公告)日:2021-02-25

    申请号:US16544000

    申请日:2019-08-19

    Inventor: Shu Satoh

    Abstract: Methods and a system of an ion implantation system are configured for increasing beam current above a maximum kinetic energy of a first charge state from an ion source without changing the charge state at the ion source. Ions having a first charge state are provided from an ion source and are selected into a first RF accelerator and accelerated in to a first energy. The ions are stripped to convert them to ions having various charge states. A charge selector receives the ions of various charge states and selects a final charge state at the first energy. A second RF accelerator accelerates the ions to final energy spectrum. A final energy filter filters the ions to provide the ions at a final charge state at a final energy to a workpiece.

    Plasma processing apparatus and plasma processing method

    公开(公告)号:US10886097B2

    公开(公告)日:2021-01-05

    申请号:US15121075

    申请日:2015-02-20

    Abstract: Disclosed is a plasma processing apparatus including a processing container, an ion trapping member partitioning the inside of the processing container into a processing space and a non-processing space and transmitting radicals and trap ions, a placing table, a first gas supply unit supplying a first processing gas into the non-processing space, a second gas supply unit supplying a second processing gas into the processing space, a first high frequency power supply supplying a high frequency power to generate radicals and ions in the non-processing space, a second high frequency power supply supplying a high frequency power to generate radicals and ions in the processing space, and a third high frequency power supply supplying a high frequency power of a lower frequency than that of the high frequency power supplied from the second high frequency power supply to draw the ions generated in the processing space into the workpiece.

    Charged-Particle Beam Device
    116.
    发明申请

    公开(公告)号:US20200258713A1

    公开(公告)日:2020-08-13

    申请号:US16620065

    申请日:2017-07-28

    Abstract: The purpose of the present invention is to provide a charged-particle beam device capable of stable performance of processes such as a measurement or test, independent of fluctuations in sample electric electric potential or the like. To this end, this charged-particle beam device comprises an energy filter for filtering the energy of charged particles released from the sample and a deflector for deflecting the charged particles released from the sample toward the energy filter. A control device generates a first image on the basis of the output of a detector, adjusts the voltage applied to the energy filter so that the first image reaches a prescribed state, and calculates deflection conditions for the deflector on the basis of the post-adjustment voltage applied to the energy filter.

    Attomicroscopy: attosecond electron imaging and microscopy

    公开(公告)号:US10658148B2

    公开(公告)日:2020-05-19

    申请号:US16394920

    申请日:2019-04-25

    Abstract: System and method for Ultrafast Electron Diffraction (UED) and Microscopy (UEM) configured to image atomic motion in real time with sub-femtosecond temporal resolution. Presented methodology utilizes the interaction of the pump optical pulse with the initial electron pulse that has been gated with the gating optical pulse. The initial electron pulse is generated in the electron microscope by the pulse of auxiliary light. In one case, the pump and gating pulses have attosecond duration and are duplicates of one another. The use of attosecond optical pulse (with frequency spectrum extending over two octaves in the visible and flanking spectral ranges) for optical gating of a pulse of electrons.

    ION BEAM IRRADIATION APPARATUS
    118.
    发明申请

    公开(公告)号:US20190371563A1

    公开(公告)日:2019-12-05

    申请号:US16275663

    申请日:2019-02-14

    Inventor: Tetsuro YAMAMOTO

    Abstract: An apparatus is provided. The apparatus includes a beam current measuring device and a first electrode. The beam current measuring device is retractably movable into an ion beam trajectory so as to measure an ion beam current. The first electrode is disposed immediately upstream of the beam current measuring device in an ion beam transport channel. The first electrode serves both as a suppressor electrode for repelling secondary electrons released from the beam current measuring device, back toward the beam current measuring device, and as a beam optical element other than the suppressor electrode.

    Processing material with ion beams
    120.
    发明授权

    公开(公告)号:US10399059B2

    公开(公告)日:2019-09-03

    申请号:US16054243

    申请日:2018-08-03

    Applicant: Xyleco, Inc.

    Inventor: Marshall Medoff

    Abstract: Materials such as biomass (e.g., plant biomass, animal biomass, and municipal waste biomass) and hydrocarbon-containing materials are processed to produce useful products, such as fuels. For example, systems are described that can use feedstock materials, such as cellulosic and/or lignocellulosic materials and/or starchy materials, or oil sands, oil shale, tar sands, bitumen, and coal to produce altered materials such as fuels (e.g., ethanol and/or butanol). The processing includes exposing the materials to an ion beam.

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