公开(公告)号：US20160322267A1

公开(公告)日：2016-11-03

申请号：US15204461

申请日：2016-07-07

Applicant: KLA-Tencor Corporation

Inventor： In-Kyo Kim ,  Xin Li ,  Leonid Poslavsky ,  Liequan Lee ,  Meng Cao ,  Sungchul Yoo ,  Andrei V. Shchegrov ,  Sangbong Park

IPC: H01L21/66 ,  G06F17/50 ,  G03F7/20 ,  H01L21/67

CPC classification number: H01L22/20 ,  G03F7/70616 ,  G03F7/70625 ,  G06F17/5068 ,  H01L21/67288 ,  H01L22/12

Abstract: Disclosed are apparatus and methods for characterizing a plurality of structures of interest on a semiconductor wafer. A plurality of models having varying combinations of floating and fixed critical parameters and corresponding simulated spectra is generated. Each model is generated to determine one or more critical parameters for unknown structures based on spectra collected from such unknown structures. It is determined which one of the models best correlates with each critical parameter based on reference data that includes a plurality of known values for each of a plurality of critical parameters and corresponding known spectra. For spectra obtained from an unknown structure using a metrology tool, different ones of the models are selected and used to determine different ones of the critical parameters of the unknown structure based on determining which one of the models best correlates with each critical parameter based on the reference data.

公开(公告)号：US20160141193A1

公开(公告)日：2016-05-19

申请号：US14942738

申请日：2015-11-16

Applicant: KLA-Tencor Corporation

Inventor： Stilian Ivanov Pandev ,  Thaddeus Gerard Dziura ,  Andrei V. Shchegrov

IPC: H01L21/67 ,  G06N99/00

CPC classification number: G06N99/005

Abstract: A system, method and computer program product are provided for combining raw data from multiple metrology tools. Reference values are obtained for at least one parameter of a training component. Signals are collected for the at least one parameter of the training component, utilizing a first metrology tool and a different second metrology tool. Further, at least a portion the signals are transformed into a set of signals, and for each of the at least one parameter of the training component, a corresponding relationship between the set of signals and the reference values is determined and a corresponding training model is created therefrom. Signals from a target component are collected utilizing at least the first metrology tool and the second metrology tool, and each created training model is applied to the signals collected from the target component to measure parametric values for the target component.

Abstract translation: 提供了一种用于组合来自多个计量工具的原始数据的系统，方法和计算机程序产品。 针对训练部件的至少一个参数获得参考值。 利用第一计量工具和不同的第二计量工具，为训练组件的至少一个参数收集信号。 此外，信号的至少一部分被变换成一组信号，并且对于训练分量的至少一个参数中的每一个，确定信号组和参考值之间的对应关系，并且相应的训练模型是 由此创建。 使用至少第一计量工具和第二计量工具收集来自目标组件的信号，并且将每个创建的训练模型应用于从目标分量收集的信号以测量目标分量的参数值。

公开(公告)号：US20150323316A1

公开(公告)日：2015-11-12

申请号：US14704840

申请日：2015-05-05

Applicant: KLA-Tencor Corporation

Inventor： Andrei V. Shchegrov ,  Stilian Ivanov Pandev ,  Jonathan M. Madsen ,  Alexander Kuznetsov ,  Walter Dean Mieher

IPC: G01B11/27 ,  G06N99/00

CPC classification number: G01N21/9501 ,  G01B11/27 ,  G06N20/00

Abstract: Methods and systems for creating a measurement model based only on measured training data are presented. The trained measurement model is then used to calculate overlay values directly from measured scatterometry data. The measurement models receive scatterometry signals directly as input and provide overlay values as output. In some embodiments, overlay error is determined from measurements of design rule structures. In some other embodiments, overlay error is determined from measurements of specialized target structures. In a further aspect, the measurement model is trained and employed to measure additional parameters of interest, in addition to overlay, based on the same or different metrology targets. In some embodiments, measurement data from multiple targets, measurement data collected by multiple metrologies, or both, is used for model building, training, and measurement. In some embodiments, an optimization algorithm automates the measurement model building and training process.

Abstract translation: 提出了仅基于测量训练数据创建测量模型的方法和系统。 然后使用经过训练的测量模型直接从测量的散射测量数据计算覆盖值。 测量模型直接接收散射信号作为输入，并提供重叠值作为输出。 在一些实施例中，根据设计规则结构的测量确定覆盖误差。 在一些其它实施例中，通过专门的目标结构的测量来确定覆盖误差。 在另一方面，测量模型被训练并用于基于相同或不同的度量目标来测量除叠加之外的附加参数。 在一些实施例中，来自多个目标的测量数据，由多个计量学收集的测量数据或两者都用于建模，训练和测量。 在一些实施例中，优化算法使测量模型构建和训练过程自动化。

公开(公告)号：US20150032398A1

公开(公告)日：2015-01-29

申请号：US14074689

申请日：2013-11-07

Applicant: KLA-Tencor Corporation

Inventor： Kevin A. Peterlinz ,  Andrei V. Shchegrov ,  Michael S. Bakeman ,  Thaddeus Gerard Dziura

IPC: G01N23/203 ,  G01B15/00

CPC classification number: G01N23/203 ,  G01B15/00 ,  G01B2210/56 ,  G01N23/2206 ,  H01L22/12 ,  H01L22/20

Abstract: Structural parameters of a specimen are determined by fitting models of the response of the specimen to measurements collected by different measurement techniques in a combined analysis. X-ray measurement data of a specimen is analyzed to determine at least one specimen parameter value that is treated as a constant in a combined analysis of both optical measurements and x-ray measurements of the specimen. For example, a particular structural property or a particular material property, such as an elemental composition of the specimen, is determined based on x-ray measurement data. The parameter(s) determined from the x-ray measurement data are treated as constants in a subsequent, combined analysis of both optical measurements and x-ray measurements of the specimen. In a further aspect, the structure of the response models is altered based on the quality of the fit between the models and the corresponding measurement data.

Abstract translation: 样本的结构参数是通过将样本的响应拟合到通过不同测量技术在综合分析中收集的测量结果来确定的。 分析样本的X射线测量数据，以确定在样本的光学测量和x射线测量的组合分析中被视为常数的至少一个样本参数值。 例如，基于x射线测量数据确定特定结构性质或特定材料性质，例如样品的元素组成。 从x射线测量数据确定的参数在随后的样本的光学测量和x射线测量的组合分析中被视为常数。 在另一方面，响应模型的结构基于模型与相应测量数据之间的拟合质量而改变。

公开(公告)号：US20140172394A1

公开(公告)日：2014-06-19

申请号：US14107850

申请日：2013-12-16

Applicant: KLA-Tencor Corporation

Inventor： Alexander Kuznetsov ,  Andrei V. Shchegrov ,  Stilian Ivanov Pandev

IPC: G06F17/50

Abstract: Methods and systems for performing measurements based on a measurement model integrating a metrology-based target model with a process-based target model. Systems employing integrated measurement models may be used to measure structural and material characteristics of one or more targets and may also be used to measure process parameter values. A process-based target model may be integrated with a metrology-based target model in a number of different ways. In some examples, constraints on ranges of values of metrology model parameters are determined based on the process-based target model. In some other examples, the integrated measurement model includes the metrology-based target model constrained by the process-based target model. In some other examples, one or more metrology model parameters are expressed in terms of other metrology model parameters based on the process model. In some other examples, process parameters are substituted into the metrology model.

Abstract translation: 基于将基于计量的目标模型与基于过程的目标模型集成在一起的测量模型进行测量的方法和系统。 采用集成测量模型的系统可用于测量一个或多个目标的结构和材料特性，也可用于测量过程参数值。 基于过程的目标模型可以以多种不同的方式与基于度量的目标模型集成。 在一些示例中，基于基于过程的目标模型确定度量模型参数的值的范围的约束。 在其他一些示例中，综合测量模型包括由基于过程的目标模型所约束的基于计量的目标模型。 在一些其他示例中，基于过程模型，根据其他度量模型参数来表示一个或多个计量模型参数。 在其他一些示例中，过程参数被替换为计量模型。

公开(公告)号：US20130116978A1

公开(公告)日：2013-05-09

申请号：US13665436

申请日：2012-10-31

Applicant: KLA-TENCOR CORPORATION

Inventor： Sungchul Yoo ,  Andrei V. Shchegrov ,  Thaddeus G. Dziura ,  InKyo Kim ,  SeungHwan Lee ,  ByeoungSu Hwang ,  Leonid Poslavsky

IPC: G06F17/50 ,  G06F17/10

CPC classification number: G06F17/50 ,  G01N21/47 ,  G01N21/956 ,  G03F7/70625 ,  G03F7/70683 ,  G06F17/10 ,  G06F17/40 ,  G06F19/00

Abstract: The disclosure is directed to improving optical metrology for a sample with complex structural attributes utilizing custom designed secondary targets. At least one parameter of a secondary target may be controlled to improve sensitivity for a selected parameter of a primary target and/or to reduce correlation of the selected parameter with other parameters of the primary target. Parameters for the primary and secondary target may be collected. The parameters may be incorporated into scatterometry model. Simulations utilizing the scatterometry model may be conducted to determine a level of sensitivity or a level of correlation for the selected parameter of the primary target. The controlled parameter of the secondary target may be modified until a selected level of sensitivity or a selected level of correlation is achieved.

Abstract translation: 本公开旨在改进具有利用定制设计的次要目标的具有复杂结构属性的样本的光学计量学。 可以控制辅助目标的至少一个参数以提高对主要目标的选定参数的灵敏度和/或减少所选参数与主要目标的其他参数的相关性。 可以收集主要和次要目标的参数。 这些参数可以并入散射测量模型中。 可以进行利用散射测量模型的模拟来确定主要目标的选定参数的灵敏度水平或相关程度。 可以修改辅助目标的受控参数，直到达到所选择的灵敏度水平或所选择的相关水平。