公开(公告)号：US20130116978A1

公开(公告)日：2013-05-09

申请号：US13665436

申请日：2012-10-31

Applicant: KLA-TENCOR CORPORATION

Inventor： Sungchul Yoo ,  Andrei V. Shchegrov ,  Thaddeus G. Dziura ,  InKyo Kim ,  SeungHwan Lee ,  ByeoungSu Hwang ,  Leonid Poslavsky

IPC: G06F17/50 ,  G06F17/10

CPC classification number: G06F17/50 ,  G01N21/47 ,  G01N21/956 ,  G03F7/70625 ,  G03F7/70683 ,  G06F17/10 ,  G06F17/40 ,  G06F19/00

Abstract: The disclosure is directed to improving optical metrology for a sample with complex structural attributes utilizing custom designed secondary targets. At least one parameter of a secondary target may be controlled to improve sensitivity for a selected parameter of a primary target and/or to reduce correlation of the selected parameter with other parameters of the primary target. Parameters for the primary and secondary target may be collected. The parameters may be incorporated into scatterometry model. Simulations utilizing the scatterometry model may be conducted to determine a level of sensitivity or a level of correlation for the selected parameter of the primary target. The controlled parameter of the secondary target may be modified until a selected level of sensitivity or a selected level of correlation is achieved.

Abstract translation: 本公开旨在改进具有利用定制设计的次要目标的具有复杂结构属性的样本的光学计量学。 可以控制辅助目标的至少一个参数以提高对主要目标的选定参数的灵敏度和/或减少所选参数与主要目标的其他参数的相关性。 可以收集主要和次要目标的参数。 这些参数可以并入散射测量模型中。 可以进行利用散射测量模型的模拟来确定主要目标的选定参数的灵敏度水平或相关程度。 可以修改辅助目标的受控参数，直到达到所选择的灵敏度水平或所选择的相关水平。

公开(公告)号：US09311431B2

公开(公告)日：2016-04-12

申请号：US13665436

申请日：2012-10-31

Applicant: KLA-Tencor Corporation

Inventor： Sungchul Yoo ,  Andrei V. Shchegrov ,  Thaddeus G. Dziura ,  InKyo Kim ,  SeungHwan Lee ,  ByeoungSu Hwang ,  Leonid Poslavsky

IPC: G06F17/40 ,  G06F19/00 ,  G06F17/50 ,  G06F17/10 ,  G01N21/956 ,  G03F7/20 ,  G01N21/47

CPC classification number: G06F17/50 ,  G01N21/47 ,  G01N21/956 ,  G03F7/70625 ,  G03F7/70683 ,  G06F17/10 ,  G06F17/40 ,  G06F19/00

Abstract: The disclosure is directed to improving optical metrology for a sample with complex structural attributes utilizing custom designed secondary targets. At least one parameter of a secondary target may be controlled to improve sensitivity for a selected parameter of a primary target and/or to reduce correlation of the selected parameter with other parameters of the primary target. Parameters for the primary and secondary target may be collected. The parameters may be incorporated into a scatterometry model. Simulations utilizing the scatterometry model may be conducted to determine a level of sensitivity or a level of correlation for the selected parameter of the primary target. The controlled parameter of the secondary target may be modified until a selected level of sensitivity or a selected level of correlation is achieved.

Abstract translation: 本公开旨在改进具有利用定制设计的次要目标的具有复杂结构属性的样本的光学计量学。 可以控制辅助目标的至少一个参数以提高对主要目标的选定参数的灵敏度和/或减少所选参数与主要目标的其他参数的相关性。 可以收集主要和次要目标的参数。 这些参数可以并入散射测量模型中。 可以进行利用散射测量模型的模拟来确定主要目标的选定参数的灵敏度水平或相关程度。 可以修改辅助目标的受控参数，直到达到所选择的灵敏度水平或所选择的相关水平。