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    System, software application, and method for lithography stitching
    91.
    发明授权
    System, software application, and method for lithography stitching 有权

    公开(公告)号：US11237485B2

    公开(公告)日：2022-02-01

    申请号：US16748202

    申请日：2020-01-21

    Applicant: Applied Materials, Inc.

    Inventor： Yongan Xu ,  Christopher Dennis Bencher ,  Robert Jan Visser ,  Ludovic Godet

    IPC: G03F7/20 ,  G03F7/00

    Abstract: Embodiments of the present disclosure relate to methods for positioning masks in a propagation direction of a light source. The masks correspond to a pattern to be written into a photoresist layer of a substrate. The masks are positioned by stitching a first mask and a second mask. The first mask includes a set of first features having first feature extensions extending therefrom at first feature interfaces. The second mask includes a set of second features having second feature extensions extending therefrom at second feature interfaces. Each first feature extension stitches with each corresponding second feature extension to form each stitched portion of a first stitched portion of the first pair of masks. The stitched portion of the first pair of masks defines a portion of the pattern to be written into the photoresist layer.

    IN-LINE MONITORING OF OLED LAYER THICKNESS AND DOPANT CONCENTRATION
    95.
    发明申请
    IN-LINE MONITORING OF OLED LAYER THICKNESS AND DOPANT CONCENTRATION 有权

    公开(公告)号：US20210226183A1

    公开(公告)日：2021-07-22

    申请号：US17152689

    申请日：2021-01-19

    Applicant: Applied Materials, Inc.

    Inventor： Yeishin Tung ,  Byung Sung Kwak ,  Robert Jan Visser

    IPC: H01L51/56 ,  B05D1/00

    Abstract: An organic light-emitting diode (OLED) deposition system includes two deposition chambers, a transfer chamber between the two deposition chambers, a metrology system having one or more sensors to perform measurements of the workpiece within the transfer chamber, and a control system to cause the system to form an organic light-emitting diode layer stack on the workpiece. Vacuum is maintained around the workpiece while the workpiece is transferred between the two deposition chambers and while retaining the workpiece within the transfer chamber. The control system is configured to cause the two deposition chambers to deposit two layers of organic material onto the workpiece, and to receive a first plurality of measurements of the workpiece in the transfer chamber from the metrology system.

    Selectively deposited parylene masks and methods related thereto
    98.
    发明授权
    Selectively deposited parylene masks and methods related thereto 有权

    公开(公告)号：US10714339B2

    公开(公告)日：2020-07-14

    申请号：US16246776

    申请日：2019-01-14

    Applicant: Applied Materials, Inc.

    Inventor： Fei Wang ,  Miaojun Wang ,  Pramit Manna ,  Shishi Jiang ,  Abhijit Basu Mallick ,  Robert Jan Visser

    IPC: H01L21/027 ,  H01L21/02 ,  H01L21/3205 ,  H01L21/32 ,  H01L21/311

    Abstract: Methods of selectively depositing a mask layer on a surface of a patterned substrate and self-aligned patterned masks are provided herein. In one embodiment, a method of selectivity depositing a mask layer includes positioning the patterned substrate on a substrate support in a processing volume of a processing chamber, exposing the surface of the patterned substrate to a parylene monomer gas, forming a first layer on the patterned substrate, wherein the first layer comprises a patterned parylene layer, and depositing a second layer on the first layer. In another embodiment, a self-aligned patterned mask comprises a parylene layer comprising a plurality of parylene features and a plurality of openings, the parylene layer is disposed on a patterned substrate comprising a dielectric layer and a plurality of metal features, the plurality of metal feature comprise a parylene deposition inhibitor metal, and the plurality of parylene features are selectivity formed on dielectric surfaces of the dielectric layer.

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