Method and apparatus for assay based on light diffraction
    1.
    发明申请
    Method and apparatus for assay based on light diffraction 有权
    基于光衍射的测定方法和装置

    公开(公告)号:US20030049693A1

    公开(公告)日:2003-03-13

    申请号:US10242778

    申请日:2002-09-13

    CPC classification number: G01N33/54373 Y10S435/808 Y10S436/805

    Abstract: The present invention relates to a method and apparatus for detecting analytes in a medium, and more particularly the present invention relates to an assay based on light diffraction which appears or changes upon the binding of analytes to their specific receptors laid out in patterns on a substrate, which has high sensitivity due to the appropriate choice of such patterns. The present invention is based on the principle that the pattern of recognition elements, which gives rise to the diffraction of the incident light in a diffraction-based assay, can be chosen in such a way so as to facilitate detection, and to enhance the signal to be detected compared to known gratings such as parallel straight lines. In one aspect the substrate itself has a surface topography designed to enhance the diffraction pattern signals. In another aspect the substrate is a diffractive optic element having the analyte-specific receptors affixed to the optic element. In another aspect the diffractive optic element is used as a master stamp for producing patterns of analyte-specific receptors which give the signal enhancements.

    Abstract translation: 本发明涉及一种用于检测培养基中分析物的方法和装置,更具体地说,本发明涉及一种基于光衍射的测定法,其在分析物与其在基底上的图案中布置的特定受体结合时出现或改变 ,其由于适当选择这种图案而具有高灵敏度。 本发明基于这样的原理,即可以以这样的方式来选择在衍射测定中引起入射光的衍射的识别元件的图案,以便于检测,并增强信号 与已知的光栅例如平行直线相比被检测。 在一个方面,衬底本身具有设计用于增强衍射图案信号的表面形貌。 在另一方面,基底是具有附着于光学元件的分析物特异性受体的衍射光学元件。 在另一方面,衍射光学元件用作产生赋予信号增强的分析物特异性受体的图案的主印模。

    Thin-flim characteristic measuring method using spectroellipsometer
    2.
    发明申请
    Thin-flim characteristic measuring method using spectroellipsometer 失效
    使用分光光度计的薄膜特征测量方法

    公开(公告)号:US20040207844A1

    公开(公告)日:2004-10-21

    申请号:US10478499

    申请日:2004-06-12

    CPC classification number: G01N21/211 G01B11/0641 G01N21/8422

    Abstract: The present invention provides a thin film property measuring method using a spectroscopic ellipsometer. With the measuring method, a model including a combination of the film thickness, complex refractive index, or the like, of each layer is formed, and fitting is made for the measured spectra and the spectra calculated based upon the model, with the model and the incident angle being modified over a predetermined number of repetitions, thereby determining the structure, the wavelength dependency of the dielectric constant, and the composition ratio, of a thin film including a compound semiconductor layer on a substrate. Furthermore, new approximate calculation is employed in the present invention, thereby enabling the concentration of the atom of interest contained in polycrystalline compound semiconductor to be calculated.

    Abstract translation: 本发明提供一种使用光谱椭偏仪的薄膜性质测量方法。 通过测量方法,形成包括每层的膜厚度,复合折射率等的组合的模型,并且对于测量的光谱和基于模型计算的光谱进行拟合,其模型和 在预定数量的重复中改变入射角度,由此确定在衬底上包括化合物半导体层的薄膜的结构,介电常数的波长依赖性和组成比。 此外,在本发明中采用新的近似计算,从而能够计算包含在多晶化合物半导体中的感兴趣原子的浓度。

    Spectrometer module and applications thereof
    3.
    发明申请
    Spectrometer module and applications thereof 失效
    光谱仪模块及其应用

    公开(公告)号:US20030076493A1

    公开(公告)日:2003-04-24

    申请号:US09993661

    申请日:2001-11-27

    CPC classification number: H04B10/07955 G02B6/29302 G02B6/29385 H04B10/077

    Abstract: The present invention relates to a spectrometer module comprising an input, for receiving an incoming optical signal, a variable differential group delay (DGD) element, for applying a variable birefringence retardation to said incoming optical signal, and a detector unit for detecting the power of a signal exiting said variable DGD element, having a defined state of polarization. It also relates to a monitor module, a monitoring unit and a monitoring system, comprising such a spectrometer module for use in monitoring an optical network. Further, the invention relates to a spectrometer device, for spectrometry purposes, comprising a spectrometer module as stated above.

    Abstract translation: 本发明涉及一种光谱仪模块,包括用于接收输入光信号的输入,用于向所述输入光信号施加可变双折射延迟的可变差分群延迟(DGD)元件,以及检测器单元,用于检测 离开所述可变DGD元件的信号具有限定的极化状态。 它还涉及一种监视器模块,监视单元和监视系统,包括用于监视光网络的这种光谱仪模块。 此外,本发明涉及一种用于光谱测量目的的光谱仪装置,包括如上所述的光谱仪模块。

    Spectroscopic measurement system using an off-axis spherical mirror and refractive elements
    4.
    发明申请
    Spectroscopic measurement system using an off-axis spherical mirror and refractive elements 审中-公开
    光谱测量系统使用离轴球面镜和折射元件

    公开(公告)号:US20020030813A1

    公开(公告)日:2002-03-14

    申请号:US09960024

    申请日:2001-09-20

    Inventor: Adam E. Norton

    Abstract: Achromatic optics may be employed in spectroscopic measurement systems. The achromatic optics comprises a spherical mirror receiving a beam of radiation in a direction away from its axis and a pair of lenses: a positive lens and a negative meniscus lens. The negative meniscus lens corrects for the spherical aberration caused by off-axis reflection from the spherical mirror. The positive lens compensates for the achromatic aberration introduced by the negative lens so that the optics, as a whole, is achromatic over visible and ultraviolet wavelengths. Preferably, the two lenses combined have zero power or close to zero power. By employing a spherical mirror, it is unnecessary to employ ellipsoidal or paraboloidal mirrors with artifacts of diamond turning which limit the size of the spot of the sample that can be measured in ellipsometry, reflectometry or scatterometry.

    Abstract translation: 消色差光学器件可用于光谱测量系统。 消色差光学器件包括接收沿其轴线的方向的辐射束的球面镜和一对透镜:正透镜和负弯月形透镜。 负弯月透镜校正由球面镜的离轴反射引起的球面像差。 正透镜补偿由负透镜引入的消色差,使得光学元件作为整体在可见光和紫外波长上是消色差的。 优选地,组合的两个透镜具有零功率或接近零功率。 通过使用球面镜,不需要使用具有金刚石车削伪影的椭圆形或抛物面镜,这限制了可以椭偏仪,反射测量或散射测量法测量的样品点的尺寸。

    Apparatus for determining an overlay error and critical dimensions in a semiconductor structure by means of scatterometry
    5.
    发明申请
    Apparatus for determining an overlay error and critical dimensions in a semiconductor structure by means of scatterometry 失效
    用于通过散射法确定半导体结构中的重叠误差和临界尺寸的装置

    公开(公告)号:US20030043372A1

    公开(公告)日:2003-03-06

    申请号:US10134243

    申请日:2002-04-29

    Inventor: Bernd Schulz

    Abstract: An apparatus for obtaining information on critical dimensions and overlay accuracy of features in a semiconductor structure comprises a light source, a detector and an optical means defining a first optical path and a second optical path. The first optical path and the second optical path are oriented in correspondence with the respective orientations of diffracting patterns provided on the semiconductor structure to obtain the required information without the necessity of rotating the semiconductor structure. This insures a significantly higher throughput.

    Abstract translation: 用于获得关于半导体结构中的特征的关键尺寸和覆盖精度的信息的装置包括光源,检测器和限定第一光路和第二光路的光学装置。 第一光路和第二光路对应于设置在半导体结构上的衍射图案的各个取向,以获得所需信息,而不需要旋转半导体结构。 这确保了显着更高的吞吐量。

    Optical apparatus for testing liquid crystal (LC) devices
    6.
    发明申请
    Optical apparatus for testing liquid crystal (LC) devices 审中-公开
    用于液晶(LC)装置的光学装置

    公开(公告)号:US20020075479A1

    公开(公告)日:2002-06-20

    申请号:US10016637

    申请日:2001-10-30

    CPC classification number: G02F1/1309

    Abstract: An apparatus for testing critical design parameters in liquid crystal devices compensates for system-imposed influences on measured values, provides real-time correction for variations in spectral content of the source illumination and permits optimization of the values of control parameters.

    Abstract translation: 用于测量液晶装置中的关键设计参数的装置补偿系统对测量值的影响,为源照明的光谱含量变化提供实时校正,并允许优化控制参数的值。

    Determination of thickness and impurity profiles in thin membranes utilizing spectorscopic data obtained from ellipsometric investigation of both front and back surfaces
    7.
    发明申请
    Determination of thickness and impurity profiles in thin membranes utilizing spectorscopic data obtained from ellipsometric investigation of both front and back surfaces 有权
    利用从前表面和后表面的椭偏仪研究获得的切片数据,确定薄膜中的厚度和杂质分布

    公开(公告)号:US20010042832A1

    公开(公告)日:2001-11-22

    申请号:US09756515

    申请日:2001-01-09

    CPC classification number: G01N21/211

    Abstract: Disclosed is spectroscopic ellipsometer system mediated methodology for quantifying thickness and impurity profile defining parameters in mathematical models of impurity profile containing thin membranes having two substantially parallel surfaces which are separated by a thickness, wherein the spectroscopic ellipsometer system operates in near-IR and IR wavelength ranges.

    Abstract translation: 公开了用于量化厚度和杂质分布的方法,用于定量含有薄膜的杂质分布的数学模型中的参数,所述薄膜具有两个基本平行的表面,所述两个基本上平行的表面被厚度分隔开,其中分光椭偏仪系统在近红外和红外波长范围内工作 。

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