公开(公告)号：US12119210B2

公开(公告)日：2024-10-15

申请号：US17213017

申请日：2021-03-25

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Joohee Kim ,  Hyunjung Lee ,  Sungwook Jung ,  Sunho Kim ,  Sungjin Kim ,  Jungwook Kim ,  Hosun Yoo

IPC: H01J37/32

CPC classification number: H01J37/32532 ,  H01J37/32642

Abstract: A fastening automation apparatus for an upper electrode of an etching facility includes a ring, and a plurality of fastening modules movably secured to the ring and configured to be movable in a radial direction on the ring. Each fastening module includes a first frame that is movable in a radial direction on the ring, a driving source installed below the first frame, a driving shaft that transmits a driving force from the driving source, a power transmission unit connected to the driving shaft, and a fastening bit connected to the power transmission unit and configured to be rotated. The plurality of fastening modules are configured to operate simultaneously to install the upper electrode in the etching facility.

公开(公告)号：US12170233B2

公开(公告)日：2024-12-17

申请号：US17394471

申请日：2021-08-05

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Meehyun Lim ,  Sung-Yeol Kim ,  Sunghyup Kim ,  Hyung-Jung Yong ,  Hosun Yoo

IPC: H01J1/00 ,  G01N21/25 ,  G01N21/27 ,  G01N21/3504 ,  G01N21/3586 ,  H01J37/32 ,  H01L21/66 ,  H01L21/683

Abstract: A plasma treatment apparatus includes a light generator that generates light, a chamber that receives the light generated from the light generator, an optical element provided between the light generator and the chamber, a light detector that detects the light reflected in the chamber, and a controller connected to the light generator and the light detector. The chamber includes an electrostatic chuck provided in a lower portion of the chamber, an edge ring provided around the electrostatic chuck, an outer wall for sealing an inner space of the chamber, and a gas supply that injects a process gas into the chamber. The optical element branches the generated light to irradiate branched light to different regions of the chamber.

公开(公告)号：US20220068609A1

公开(公告)日：2022-03-03

申请号：US17213017

申请日：2021-03-25

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Joohee Kim ,  Hyunjung Lee ,  Sungwook Jung ,  Sunho Kim ,  Sungjin Kim ,  Jungwook Kim ,  Hosun Yoo

IPC: H01J37/32

Abstract: A fastening automation apparatus for an upper electrode of an etching facility includes a ring, and a plurality of fastening modules movably secured to the ring and configured to be movable in a radial direction on the ring. Each fastening module includes a first frame that is movable in a radial direction on the ring, a driving source installed below the first frame, a driving shaft that transmits a driving force from the driving source, a power transmission unit connected to the driving shaft, and a fastening bit connected to the power transmission unit and configured to be rotated. The plurality of fastening modules are configured to operate simultaneously to install the upper electrode in the etching facility.

公开(公告)号：US11720027B2

公开(公告)日：2023-08-08

申请号：US17409715

申请日：2021-08-23

Applicant: Samsung Electronics Co., Ltd.

Inventor： Injae Lee ,  Ohkug Kwon ,  Sunghyup Kim ,  Yongchan Kim ,  Ouiserg Kim ,  Jeonggil Kim ,  Junghwan Kim ,  Hosun Yoo ,  Daerim Choi ,  Dongkyeng Han

IPC: H05G2/00 ,  G03F7/20 ,  G03F7/00

CPC classification number: G03F7/70033 ,  G03F7/70166 ,  G03F7/70858 ,  G03F7/70916

Abstract: An extreme ultraviolet (EUV) light generating apparatus includes a vessel including a first end and a second end opposite to each other and providing an internal space extending from the first end to the second end, a concave mirror adjacent to the first end of the vessel, a droplet generator supplying a droplet to the internal space of the vessel, a laser light source irradiating a laser beam to cause the droplet to emit EUV light, and a gas jet receiving a flow control gas and spraying the received flow control gas into the internal space of the vessel. The gas jet includes a ring-shaped main body including nozzles spaced apart from one another in a circumferential direction. The nozzles spray the received flow control gas in a downward direction.

公开(公告)号：US20220082946A1

公开(公告)日：2022-03-17

申请号：US17409715

申请日：2021-08-23

Applicant: Samsung Electronics Co., Ltd.

Inventor： Injae Lee ,  Ohkug Kwon ,  Sunghyup Kim ,  Yongchan Kim ,  Ouiserg Kim ,  Jeonggil Kim ,  Junghwan Kim ,  Hosun Yoo ,  Daerim Choi ,  Dongkyeng Han

IPC: G03F7/20

Abstract: An extreme ultraviolet (EUV) light generating apparatus includes a vessel including a first end and a second end opposite to each other and providing an internal space extending from the first end to the second end, a concave mirror adjacent to the first end of the vessel, a droplet generator supplying a droplet to the internal space of the vessel, a laser light source irradiating a laser beam to cause the droplet to emit EUV light, and a gas jet receiving a flow control gas and spraying the received flow control gas into the internal space of the vessel. The gas jet includes a ring-shaped main body including nozzles spaced apart from one another in a circumferential direction. The nozzles spray the received flow control gas in a downward direction.