GE-BASED SHORT WAVELENGTH INFRARED SENSOR, METHOD OF MANUFACTURING THE SAME, AND ELECTRONIC APPARATUS INCLUDING GE-BASED SHORT WAVELENGTH INFRARED SENSOR

    公开(公告)号:US20250160008A1

    公开(公告)日:2025-05-15

    申请号:US18818187

    申请日:2024-08-28

    Abstract: A germanium-based short wavelength infrared sensor, a method of manufacturing the same, and an electronic apparatus including the germanium-based short wavelength infrared sensor are provided. The short wavelength infrared sensor according to an example embodiment includes a light absorption layer provided on the substrate layer and having a higher absorption rate for a short wavelength infrared light than an absorption rate for a visible light; a light absorption enhancement layer provided on the light absorption layer to enhance a light absorption rate of the light absorption layer, the light absorption enhancement layer including a plurality of nanostructures; and an upper insulating layer covering the plurality of nanostructures and having a refractive index greater than a refractive index of each of the plurality of nanostructures, wherein the light absorption layer includes germanium (Ge).

    Optoelectric device and electronic device including the same

    公开(公告)号:US12166052B2

    公开(公告)日:2024-12-10

    申请号:US17580145

    申请日:2022-01-20

    Abstract: Provided is an image sensor including a sensor array including a plurality of light-sensors respectively including an optoelectronic device, the optoelectronic device including a first electrode, a second electrode spaced apart from the first electrode, and an active layer provided between the first electrode and the second electrode, the active layer including a plurality of quantum dot layers having different energy bands, and a circuit including circuits respectively connected to the plurality of light-sensors and configured to readout an optoelectronic signal generated from each of the plurality of light-sensors.

    OPTO-ELECTRONIC DEVICE AND IMAGE SENSOR INCLUDING THE SAME

    公开(公告)号:US20210376190A1

    公开(公告)日:2021-12-02

    申请号:US17036962

    申请日:2020-09-29

    Abstract: Provided is an opto-electronic device including a semiconductor substrate doped with a first conductivity type impurity, a source region and a drain region provided on the semiconductor substrate spaced apart from each other and doped with a second conductivity type impurity which is electrically opposite to the first conductivity type impurity, a first electrode and a second electrode electrically connected to the source region and the drain region, respectively, a quantum dot layer provided between the source region and the drain region on the semiconductor substrate and including quantum dots, a first insulation layer configured to insulate the semiconductor substrate and the quantum dot layer from each other, and a transparent electrode layer provided on the quantum dot layer.

    Opto-electronic device and image sensor including the same

    公开(公告)号:US11646393B2

    公开(公告)日:2023-05-09

    申请号:US17036962

    申请日:2020-09-29

    CPC classification number: H01L33/06 H01L33/387 H01L33/42 H01L33/62

    Abstract: Provided is an opto-electronic device including a semiconductor substrate doped with a first conductivity type impurity, a source region and a drain region provided on the semiconductor substrate spaced apart from each other and doped with a second conductivity type impurity which is electrically opposite to the first conductivity type impurity, a first electrode and a second electrode electrically connected to the source region and the drain region, respectively, a quantum dot layer provided between the source region and the drain region on the semiconductor substrate and including quantum dots, a first insulation layer configured to insulate the semiconductor substrate and the quantum dot layer from each other, and a transparent electrode layer provided on the quantum dot layer.

Patent Agency Ranking