公开(公告)号：US20220016580A1

公开(公告)日：2022-01-20

申请号：US17239644

申请日：2021-04-25

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： WONGUK SEO ,  SUNGYONG PARK ,  HONGJU KIM ,  ANSOOK SUL ,  SEOK HEO ,  YINGHU XU

IPC: B01F3/02 ,  B01F3/04

Abstract: A chemical solution vaporization device includes a chemical solution tank including chemical solution vaporization rooms, a chemical solution sensing room, and a chemical solution supply room. A first internal wall separating the plurality of chemical solution vaporization rooms from each other includes a first opening at a lower portion thereof. A second internal wall separating at least one of the plurality of chemical solution vaporization rooms from the chemical solution supply room includes a second opening at a lower portion thereof. A third internal wall separating at least one of the plurality of chemical solution vaporization rooms from the chemical solution sensing room includes a third opening at a lower portion thereof. And a lower portion of a fourth internal wall separating the chemical solution sensing room from the chemical solution supply room is combined with the lower wall.

公开(公告)号：US20230360931A1

公开(公告)日：2023-11-09

申请号：US18059594

申请日：2022-11-29

Applicant: Samsung Electronics Co., Ltd.

Inventor： JUNGHYUN SONG ,  ANSOOK SUL ,  JEONGHUN KANG ,  DONOK CHOI ,  SUNG YONG PARK

IPC: H01L21/67 ,  C23C16/455 ,  C23C16/44

CPC classification number: H01L21/67057 ,  C23C16/45563 ,  C23C16/4412

Abstract: A substrate processing apparatus includes an outer bath, an inner bath in the outer bath, a chemical solution supply pipe in fluid communication with a portion of the outer bath, and an outer gas supply pipe in fluid communication with another portion of the outer bath. The outer bath includes an outer body providing an outer receiving space, and an outer door coupled to the outer body and configured to close the outer receiving space. An end of the outer gas supply pipe is located in the outer receiving space between the outer body and the inner bath, and a portion of the chemical solution supply pipe is located in the inner bath.

公开(公告)号：US20220388043A1

公开(公告)日：2022-12-08

申请号：US17570262

申请日：2022-01-06

Applicant: Samsung Electronics Co., Ltd.

Inventor： KYOUNGWHAN OH ,  Jubong LEE ,  ANSOOK SUL

IPC: B08B9/087 ,  G03F7/16 ,  B08B3/08

Abstract: An apparatus for cleaning a bowl includes a base plate, and a blade coupled to the base plate. The blade extends in a curve on a surface of the base plate in a direction receding from a center of the base plate in a plan view. An inner side surface of the blade includes a curved surface concavely recessed toward an inside of the blade in a cross-sectional view taken along a direction perpendicular to an extending direction of the blade.