公开(公告)号：US20250076775A1

公开(公告)日：2025-03-06

申请号：US18599673

申请日：2024-03-08

Applicant: SAMSUNG ELECTRONICS CO,. LTD.

Inventor： CHULMIN CHO ,  YOUNGDUK SUH ,  KYOUNGWHAN OH ,  SANGHYUN LIM ,  YOUNGHYUN IM ,  JAEHONG LIM ,  DOHYUN JUNG ,  SEOK HEO ,  YOUNGHO HWANG

IPC: G03F7/00

Abstract: A substrate processing method, comprising: using an exposure apparatus to process a substrate; and cleaning an extreme ultraviolet (EUV) source of the exposure apparatus, wherein cleaning an extreme ultraviolet (EUV) source comprising: spraying a cleaning solution on an inner surface of a housing of an EUV source; cleaning the inner surface of the housing; and aspirating a material produced from the cleaning of the inner surface of the housing, wherein the housing includes an internal space defined by the inner surface of the housing, wherein the internal space becoming narrower in a first direction, and wherein the cleaning solution includes sodium hydroxide (NaOH).

公开(公告)号：US20220388043A1

公开(公告)日：2022-12-08

申请号：US17570262

申请日：2022-01-06

Applicant: Samsung Electronics Co., Ltd.

Inventor： KYOUNGWHAN OH ,  Jubong LEE ,  ANSOOK SUL

IPC: B08B9/087 ,  G03F7/16 ,  B08B3/08

Abstract: An apparatus for cleaning a bowl includes a base plate, and a blade coupled to the base plate. The blade extends in a curve on a surface of the base plate in a direction receding from a center of the base plate in a plan view. An inner side surface of the blade includes a curved surface concavely recessed toward an inside of the blade in a cross-sectional view taken along a direction perpendicular to an extending direction of the blade.