公开(公告)号：US20220016580A1

公开(公告)日：2022-01-20

申请号：US17239644

申请日：2021-04-25

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： WONGUK SEO ,  SUNGYONG PARK ,  HONGJU KIM ,  ANSOOK SUL ,  SEOK HEO ,  YINGHU XU

IPC: B01F3/02 ,  B01F3/04

Abstract: A chemical solution vaporization device includes a chemical solution tank including chemical solution vaporization rooms, a chemical solution sensing room, and a chemical solution supply room. A first internal wall separating the plurality of chemical solution vaporization rooms from each other includes a first opening at a lower portion thereof. A second internal wall separating at least one of the plurality of chemical solution vaporization rooms from the chemical solution supply room includes a second opening at a lower portion thereof. A third internal wall separating at least one of the plurality of chemical solution vaporization rooms from the chemical solution sensing room includes a third opening at a lower portion thereof. And a lower portion of a fourth internal wall separating the chemical solution sensing room from the chemical solution supply room is combined with the lower wall.

公开(公告)号：US20250076775A1

公开(公告)日：2025-03-06

申请号：US18599673

申请日：2024-03-08

Applicant: SAMSUNG ELECTRONICS CO,. LTD.

Inventor： CHULMIN CHO ,  YOUNGDUK SUH ,  KYOUNGWHAN OH ,  SANGHYUN LIM ,  YOUNGHYUN IM ,  JAEHONG LIM ,  DOHYUN JUNG ,  SEOK HEO ,  YOUNGHO HWANG

IPC: G03F7/00

Abstract: A substrate processing method, comprising: using an exposure apparatus to process a substrate; and cleaning an extreme ultraviolet (EUV) source of the exposure apparatus, wherein cleaning an extreme ultraviolet (EUV) source comprising: spraying a cleaning solution on an inner surface of a housing of an EUV source; cleaning the inner surface of the housing; and aspirating a material produced from the cleaning of the inner surface of the housing, wherein the housing includes an internal space defined by the inner surface of the housing, wherein the internal space becoming narrower in a first direction, and wherein the cleaning solution includes sodium hydroxide (NaOH).

公开(公告)号：US20250138439A1

公开(公告)日：2025-05-01

申请号：US18793124

申请日：2024-08-02

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： YOUNG HO HWANG ,  JAE HONG LIM ,  CHUL MIN CHO ,  SANG HYUN LIM ,  YOUNG KYUN IM ,  SEOK HEO

IPC: G03F7/00 ,  G03F7/20

Abstract: A substrate processing apparatus includes a process chamber having a space in which a substrate is disposed and processed in the process chamber, a supporter disposed in the process chamber and configured to support and rotate the substrate, a heater disposed in the process chamber and configured to heat a first surface of the substrate, where the heater includes one or more irradiation modules for generating light pulses and directing the light pulses to the first surface of the substrate, a controller configured to control an intensity of the light pulse generated by each of the one or more irradiation modules of the heater, and a fluid supplier configured to supply fluid to the first surface of the substrate.