公开(公告)号：US20220241906A1

公开(公告)日：2022-08-04

申请号：US17545982

申请日：2021-12-08

Applicant: Samsung Display Co., Ltd.

Inventor： Kyu-Bum Kim ,  Jaeseok Park ,  Jungseob Lee ,  Kyongho Hong ,  Inho Lee ,  Bosuck Jeon

IPC: B23K37/04 ,  B23K26/02 ,  B23K26/362

Abstract: A laser processing apparatus includes a stage configured to transfer a target substrate and including an opening, an electrostatic chuck disposed on the stage and including a plurality of holes, and a laser irradiation unit disposed above the stage and spaced apart from the stage and configured to irradiate a laser beam on the target substrate. A surface of the electrostatic. chuck is in contact with the target substrate, the target substrate includes a plurality of etching regions to be etched by the laser beam and a non-etching region surrounding the plurality of etching regions of the target substrate, and the plurality of holes of the electrostatic chuck overlap the opening of the stage and the plurality of etching regions of the target substrate.

公开(公告)号：US12202078B2

公开(公告)日：2025-01-21

申请号：US17545982

申请日：2021-12-08

Applicant: Samsung Display Co., Ltd.

Inventor： Kyu-Bum Kim ,  Jaeseok Park ,  Jungseob Lee ,  Kyongho Hong ,  Inho Lee ,  Bosuck Jeon

IPC: B23K37/04 ,  B23K26/02 ,  B23K26/362

Abstract: A laser processing apparatus includes a stage configured to transfer a target substrate and including an opening, an electrostatic chuck disposed on the stage and including a plurality of holes, and a laser irradiation unit disposed above the stage and spaced apart from the stage and configured to irradiate a laser beam on the target substrate. A surface of the electrostatic chuck is in contact with the target substrate, the target substrate includes a plurality of etching regions to be etched by the laser beam and a non-etching region surrounding the plurality of etching regions of the target substrate, and the plurality of holes of the electrostatic chuck overlap the opening of the stage and the plurality of etching regions of the target substrate.

公开(公告)号：US09194624B2

公开(公告)日：2015-11-24

申请号：US13952533

申请日：2013-07-26

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Kyu-Bum Kim ,  Jae-Seok Park

IPC: F26B21/00 ,  F26B3/30 ,  F26B9/06 ,  F26B25/00

CPC classification number: F26B3/30 ,  F26B9/06 ,  F26B25/003 ,  F26B2200/00

Abstract: A film drying device includes a chamber, a film fixing unit in the chamber and configured to fix a film, and a heater in the chamber and configured to apply heat to the film.

Abstract translation: 一种胶片干燥装置，包括：室，膜固定单元，其构造成将膜固定;以及加热器，其构造成对膜施加热量。

公开(公告)号：US20140308871A1

公开(公告)日：2014-10-16

申请号：US13952533

申请日：2013-07-26

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Kyu-Bum Kim ,  Jae-Seok Park

IPC: H01J9/20

CPC classification number: F26B3/30 ,  F26B9/06 ,  F26B25/003 ,  F26B2200/00

Abstract: A film drying device includes a chamber, a film fixing unit in the chamber and configured to fix a film, and a heater in the chamber and configured to apply heat to the film.

Abstract translation: 一种胶片干燥装置，包括：室，膜固定单元，其构造成将膜固定;以及加热器，其构造成对膜施加热量。

公开(公告)号：US20140076501A1

公开(公告)日：2014-03-20

申请号：US13791578

申请日：2013-03-08

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Kyu-Bum Kim ,  Jae-Seok Park ,  Jin-Han Park ,  Dong-Sul Kim

IPC: B32B43/00

CPC classification number: B32B43/006 ,  B32B2457/206 ,  H01L51/003 ,  H01L51/56 ,  Y10T156/1132 ,  Y10T156/1174 ,  Y10T156/19 ,  Y10T156/195 ,  Y10T156/1956 ,  Y10T156/1978

Abstract: A film peeling device for peeling a film from a substrate including a transfer module configured to transfer the substrate that is arranged in a vertical direction with respect to a bottom surface of the substrate, and a peeling module configured to peel the film from the substrate transferred by the transfer module.

Abstract translation: 一种膜剥离装置，用于从包括转印模块的基板剥离膜，所述转印模块被配置为转移相对于所述基板的底表面在垂直方向上布置的所述基板;以及剥离模块，被配置为从所述基板转印所述膜剥离 由传输模块。