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公开(公告)号：US11660563B2
公开(公告)日：2023-05-30
申请号：US17380109
申请日：2021-07-20
Applicant: Samsung Electronics Co., Ltd.
Inventor： Seoyoung Maeng , Iljun Jeon , Suji Gim , Youngseok Roh , Jongyong Bae , Jungjoon Pyeon
CPC classification number: B01D50/20 , B01D45/08 , B01D45/16 , B01D46/4263 , B01D46/48 , B01D2279/51
Abstract: An apparatus for collecting a by-product, includes: a chamber provided with a gas inlet and a gas outlet and having an internal space; a heater disposed on the gas inlet side of the internal space within the chamber and varying a heating temperature in time series; a vortex forming member disposed around the heater; a plurality of first collecting members disposed below the heater; a second collecting member disposed below the first collecting member so that a plurality of second collecting members intersect each other; and a third collecting member disposed on the gas outlet side of the internal space within the chamber.
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公开(公告)号：US11738299B2
公开(公告)日：2023-08-29
申请号：US17372855
申请日：2021-07-12
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Suji Gim , Sunwoo Yook , Youngduk Ko , Youngseok Roh , Seoyoung Maeng , Jongyong Bae , Jihnkoo Lee , Jungjoon Pyeon , Jongha Hwang
CPC classification number: B01D53/0454 , B01D53/0438 , B01D2253/102 , B01D2253/112 , B01D2257/204 , B01D2258/0216 , H01L21/67017
Abstract: An exhaust gas processing system including a process chamber in which an exhaust gas is produced; an exhaust gas measurer receiving the exhaust gas and measuring a concentration of the exhaust gas; a solid producing gas processor receiving the exhaust gas and removing a solid producing gas contained in the exhaust gas; a gas supply supplying dilution and cooling gases to the solid producing gas processor; a processed gas measurer receiving, as a processed gas, the exhaust gas free of the solid producing gas and measuring a temperature of the processed gas and ingredients of the processed gas; and a controller receiving results of measurement of the concentration of the exhaust gas from the exhaust gas measurer and results of measurement of the temperature of the processed gas and the ingredients of the processed gas from the exhaust gas measurer and controlling the gas supply based on the measurement results.
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3.发明授权公开(公告)号：US11549178B2
公开(公告)日：2023-01-10
申请号：US17510532
申请日：2021-10-26
Applicant: Samsung Electronics Co., Ltd.
Inventor： Suji Gim , Sunwoo Yook , Youngduk Ko , Youngseok Roh , Seoyoung Maeng , Jongyong Bae , Jihnkoo Lee , Jungjoon Pyeon , Jongha Hwang
IPC: C23C16/455 , B01J35/00 , B01J35/04 , B01D53/94 , B01J37/08
Abstract: An apparatus and method for treating a semiconductor process gas comprises a gas inlet allowing a treatment target gas (or gas to be treated) to flow therethrough; a catalytic reaction portion including a catalyst and configured to allow the treatment target gas to be brought into contact with the catalyst; a space velocity controller between the gas inlet and the catalytic reaction portion, the space velocity controller extending from the gas inlet in a diagonal direction in relation to the gas inlet; a differential pressure buffer portion between the space velocity controller and the catalytic reaction portion and including a filter; and a gas outlet configured to externally discharge a product formed as the treatment target gas comes into contact with the catalyst.
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公开(公告)号：US20220143543A1
公开(公告)日：2022-05-12
申请号：US17380109
申请日：2021-07-20
Applicant: Samsung Electronics Co., Ltd.
Inventor： Seoyoung Maeng , Iljun Jeon , Suji Gim , Youngseok Roh , Jongyong Bae , Jungjoon Pyeon
Abstract: An apparatus for collecting a by-product, includes: a chamber provided with a gas inlet and a gas outlet and having an internal space; a heater disposed on the gas inlet side of the internal space within the chamber and varying a heating temperature in time series; a vortex forming member disposed around the heater; a plurality of first collecting members disposed below the heater; a second collecting member disposed below the first collecting member so that a plurality of second collecting members intersect each other; and a third collecting member disposed on the gas outlet side of the internal space within the chamber.
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