公开(公告)号：US20240213062A1

公开(公告)日：2024-06-27

申请号：US18534223

申请日：2023-12-08

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jongha Hwang ,  Yusung Jang

IPC: H01L21/67 ,  H01L33/50

CPC classification number: H01L21/67271 ,  H01L33/50 ,  H01L2933/0041

Abstract: A light-emitting diode (LED)-chip sorting device includes a wafer stage configured to load a wafer including a plurality of LED chips thereon, a film stage configured to load a film thereon, a pick-up unit configured to arrange, on the film loaded on the film stage, the plurality of LED chips loaded on the wafer stage, and a controller configured to control the pick-up unit to sequentially pick up the plurality of LED chips from the wafer stage in a preset pick-up direction. The preset pick-up direction is one of a first pick-up direction defined from a center portion of the wafer toward an edge of the wafer, and a second pick-up direction defined from the edge of the wafer toward the center portion of the wafer.

公开(公告)号：US11738299B2

公开(公告)日：2023-08-29

申请号：US17372855

申请日：2021-07-12

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Suji Gim ,  Sunwoo Yook ,  Youngduk Ko ,  Youngseok Roh ,  Seoyoung Maeng ,  Jongyong Bae ,  Jihnkoo Lee ,  Jungjoon Pyeon ,  Jongha Hwang

IPC: B01D53/04 ,  H01L21/67

CPC classification number: B01D53/0454 ,  B01D53/0438 ,  B01D2253/102 ,  B01D2253/112 ,  B01D2257/204 ,  B01D2258/0216 ,  H01L21/67017

Abstract: An exhaust gas processing system including a process chamber in which an exhaust gas is produced; an exhaust gas measurer receiving the exhaust gas and measuring a concentration of the exhaust gas; a solid producing gas processor receiving the exhaust gas and removing a solid producing gas contained in the exhaust gas; a gas supply supplying dilution and cooling gases to the solid producing gas processor; a processed gas measurer receiving, as a processed gas, the exhaust gas free of the solid producing gas and measuring a temperature of the processed gas and ingredients of the processed gas; and a controller receiving results of measurement of the concentration of the exhaust gas from the exhaust gas measurer and results of measurement of the temperature of the processed gas and the ingredients of the processed gas from the exhaust gas measurer and controlling the gas supply based on the measurement results.

公开(公告)号：US11549178B2

公开(公告)日：2023-01-10

申请号：US17510532

申请日：2021-10-26

Applicant: Samsung Electronics Co., Ltd.

Inventor： Suji Gim ,  Sunwoo Yook ,  Youngduk Ko ,  Youngseok Roh ,  Seoyoung Maeng ,  Jongyong Bae ,  Jihnkoo Lee ,  Jungjoon Pyeon ,  Jongha Hwang

IPC: C23C16/455 ,  B01J35/00 ,  B01J35/04 ,  B01D53/94 ,  B01J37/08

Abstract: An apparatus and method for treating a semiconductor process gas comprises a gas inlet allowing a treatment target gas (or gas to be treated) to flow therethrough; a catalytic reaction portion including a catalyst and configured to allow the treatment target gas to be brought into contact with the catalyst; a space velocity controller between the gas inlet and the catalytic reaction portion, the space velocity controller extending from the gas inlet in a diagonal direction in relation to the gas inlet; a differential pressure buffer portion between the space velocity controller and the catalytic reaction portion and including a filter; and a gas outlet configured to externally discharge a product formed as the treatment target gas comes into contact with the catalyst.