公开(公告)号：US20180128753A1

公开(公告)日：2018-05-10

申请号：US15866768

申请日：2018-01-10

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Gilad BARAK ,  Dror SHAFIR ,  Yanir HAINICK ,  Shahar GOV

IPC: G01N21/956 ,  G01N21/95 ,  G03F7/20

CPC classification number: G01N21/956 ,  G01B2210/56 ,  G01N21/9501 ,  G03F7/70616 ,  G03F7/70625

Abstract: A method and system are presented for use in optical measurements on patterned structures. The method comprises performing a number of optical measurements on a structure with a measurement spot configured to provide detection of light reflected from an illuminating spot at least partially covering at least two different regions of the structure. The measurements include detection of light reflected from said at least part of the at least two different regions comprising interference of at least two complex electric fields reflected from said at least part of the at least two different regions, and being therefore indicative of a phase response of the structure, carrying information about properties of the structure.

公开(公告)号：US20180052119A1

公开(公告)日：2018-02-22

申请号：US15523896

申请日：2015-11-02

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Boris LEVANT ,  Yanir HAINICK ,  Vladimir MACHAVARIANI ,  Roy KORET ,  Gilad BARAK

IPC: G01N21/956 ,  G01N21/95 ,  G01B11/02

CPC classification number: G01N21/956 ,  G01B11/02 ,  G01B2210/56 ,  G01N21/9501 ,  G01N2201/12

Abstract: A data analysis method and system are presented for use in determining one or more parameters of a patterned structure located on top of an underneath layered structure. According to this technique, input data is provided which includes first measured data PMD being a function ƒ of spectral intensity Iλ and phase φ, PMD=ƒ(Iλ;φ), corresponding to a complex spectral response of the underneath layered structure, and second measured data Smeas indicative of specular reflection spectral response of a sample formed by the patterned structure and the underneath layered structure. Also provided is a general function F describing a relation between a theoretical optical response Stheor of the sample and a modeled optical response Smodel of the patterned structure and the complex spectral response PMD of the underneath layered structure, such that Stheor=F(Smodel; PMD). The general function is then utilized for comparing the second measured data Smeas and the theoretical optical response Stheor, and determining parameter(s) of interest of the top structure.

公开(公告)号：US20210364451A1

公开(公告)日：2021-11-25

申请号：US17303723

申请日：2021-06-06

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Gilad BARAK ,  Danny GROSSMAN ,  Dror SHAFIR ,  Yoav BERLATZKY ,  Yanir HAINICK

IPC: G01N21/956 ,  G01B9/02 ,  G01B11/06 ,  G01N21/88

Abstract: A measurement system for use in measuring parameters of a patterned sample, the system including a broadband light source, an optical system configured as an interferometric system, a detection unit, and a control unit, where the interferometric system defines illumination and detection channels having a sample arm and a reference arm having a reference reflector, and is configured for inducing an optical path difference between the sample and reference arms, the detection unit for detecting a combined light beam formed by a light beam reflected from the reflector and a light beam propagating from a sample's support, and generating measured data indicative of spectral interference pattern formed by spectral interference signatures, and the control unit for receiving the measured data and applying a model-based processing to the spectral interference pattern for determining one or more parameters of the pattern in the sample.

公开(公告)号：US20170016835A1

公开(公告)日：2017-01-19

申请号：US15300768

申请日：2015-04-12

Applicant: Nova Measuring Instruments Ltd.

Inventor： Gilad BARAK ,  Danny GROSSMAN ,  Dror SHAFIR ,  Yoav BERLATZKY ,  Yanir HAINICK

IPC: G01N21/956 ,  G01B9/02 ,  G01B11/06 ,  G01N21/88

CPC classification number: G01N21/956 ,  G01B9/02007 ,  G01B9/02032 ,  G01B9/02072 ,  G01B9/0209 ,  G01B11/0675 ,  G01B2210/56 ,  G01B2290/70 ,  G01N21/8806 ,  G01N2021/8848

Abstract: A measurement system for use in measuring parameters of a patterned sample is presented. The system comprises: a broadband light source; an optical system configured as an interferometric system; a detection unit; and a control unit. The interferometric system defines illumination and detection channels having a sample arm and a reference arm comprising a reference reflector, and is configured for inducing an optical path difference between the sample and reference arms; the detection unit comprises a configured and operable for detecting a combined light beam formed by a light beam reflected from said reflector and a light beam propagating from a sample's support, and generating measured data indicative of spectral interference pattern formed by at least two spectral interference signatures. The control unit is configured and operable for receiving the measured data and applying a model-based processing to the spectral interference pattern for determining one or more parameters of the pattern in the sample.

Abstract translation: 提出了一种用于测量图案样品参数的测量系统。 该系统包括：宽带光源; 配置为干涉系统的光学系统; 检测单元; 和控制单元。 所述干涉仪系统定义具有采样臂和参考臂的照明和检测通道，所述参考臂包括参考反射器，并且被配置为用于诱导所述样本和参考臂之间的光程差; 检测单元包括被配置和可操作以检测由从所述反射器反射的光束形成的组合光束和从样本支架传播的光束，并且生成指示由至少两个光谱干涉特征形成的光谱干涉图案的测量数据 。 控制单元被配置和操作用于接收测量数据，并将基于模型的处理应用于频谱干涉图案，以确定样本中的图案的一个或多个参数。

公开(公告)号：US20150377799A1

公开(公告)日：2015-12-31

申请号：US14769170

申请日：2014-02-20

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Gilad BARAK ,  Dror SHAFIR ,  Yanir HAINICK ,  Shahar GOV

IPC: G01N21/956 ,  G01N21/95

CPC classification number: G01N21/956 ,  G01B2210/56 ,  G01N21/9501 ,  G03F7/70625

Abstract: A method and system are presented for use in optical measurements on patterned structures. The method comprises performing a number of optical measurements on a structure with a measurement spot configured to provide detection of light reflected from an illuminating spot at least partially covering at least two different regions of the structure. The measurements include detection of light reflected from said at least part of the at least two different regions comprising interference of at least two complex electric fields reflected from said at least part of the at least two different regions, and being therefore indicative of a phase response of the structure, carrying information about properties of the structure.

Abstract translation: 提出了一种用于图案化结构的光学测量的方法和系统。 该方法包括对具有测量点的结构执行多个光学测量，所述测量点被配置为提供对从至少部分地覆盖结构的至少两个不同区域的照明点反射的光的检测。 所述测量包括从所述至少两个不同区域的所述至少一部分反射的光的检测，包括从所述至少两个不同区域的所述至少一部分反射的至少两个复电场的干涉，并因此指示相位响应 的结构，携带关于结构的属性的信息。