OPTICAL PHASE MEASUREMENT METHOD AND SYSTEM

    公开(公告)号:US20210364451A1

    公开(公告)日:2021-11-25

    申请号:US17303723

    申请日:2021-06-06

    Abstract: A measurement system for use in measuring parameters of a patterned sample, the system including a broadband light source, an optical system configured as an interferometric system, a detection unit, and a control unit, where the interferometric system defines illumination and detection channels having a sample arm and a reference arm having a reference reflector, and is configured for inducing an optical path difference between the sample and reference arms, the detection unit for detecting a combined light beam formed by a light beam reflected from the reflector and a light beam propagating from a sample's support, and generating measured data indicative of spectral interference pattern formed by spectral interference signatures, and the control unit for receiving the measured data and applying a model-based processing to the spectral interference pattern for determining one or more parameters of the pattern in the sample.

    OPTICAL PHASE MEASUREMENT METHOD AND SYSTEM
    2.
    发明申请
    OPTICAL PHASE MEASUREMENT METHOD AND SYSTEM 审中-公开
    光学相位测量方法与系统

    公开(公告)号:US20170016835A1

    公开(公告)日:2017-01-19

    申请号:US15300768

    申请日:2015-04-12

    Abstract: A measurement system for use in measuring parameters of a patterned sample is presented. The system comprises: a broadband light source; an optical system configured as an interferometric system; a detection unit; and a control unit. The interferometric system defines illumination and detection channels having a sample arm and a reference arm comprising a reference reflector, and is configured for inducing an optical path difference between the sample and reference arms; the detection unit comprises a configured and operable for detecting a combined light beam formed by a light beam reflected from said reflector and a light beam propagating from a sample's support, and generating measured data indicative of spectral interference pattern formed by at least two spectral interference signatures. The control unit is configured and operable for receiving the measured data and applying a model-based processing to the spectral interference pattern for determining one or more parameters of the pattern in the sample.

    Abstract translation: 提出了一种用于测量图案样品参数的测量系统。 该系统包括:宽带光源; 配置为干涉系统的光学系统; 检测单元; 和控制单元。 所述干涉仪系统定义具有采样臂和参考臂的照明和检测通道,所述参考臂包括参考反射器,并且被配置为用于诱导所述样本和参考臂之间的光程差; 检测单元包括被配置和可操作以检测由从所述反射器反射的光束形成的组合光束和从样本支架传播的光束,并且生成指示由至少两个光谱干涉特征形成的光谱干涉图案的测量数据 。 控制单元被配置和操作用于接收测量数据,并将基于模型的处理应用于频谱干涉图案,以确定样本中的图案的一个或多个参数。

    OPTICAL SYSTEM AND METHOD FOR MEASUREMENTS OF SAMPLES

    公开(公告)号:US20190128823A1

    公开(公告)日:2019-05-02

    申请号:US16094547

    申请日:2016-04-21

    Abstract: A measurement system is presented for use in metrology measurements on patterned samples. The system comprises: at least one light source device configured to generate broadband light, at least one detection device configured to provide spectral information of detected light, and an optical system. The optical system comprises at least an oblique channel system for directing incident light generated by the light source(s) along an oblique illumination channel onto a measurement plane, on which a sample is to be located, and directing broadband light specularly reflected from the sample along a collection channel to the detection device(s). The optical system further comprises an interferometric unit comprising a beam splitting/combining device and a reference reflector device. The beam splitting/combining device is accommodated in the illumination and collection channels and divides light propagating in the illumination channel into sample and reference light beams propagating in sample and reference paths, and combines reflected

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