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公开(公告)号：US10473839B2
公开(公告)日：2019-11-12
申请号：US15442082
申请日：2017-02-24
Applicant: Lumentum Operations LLC
Inventor： Keith Anderson , John Michael Miller , Hery Djie , Lu Tian
IPC: G02B5/30 , G02F1/13363 , G02F1/1335 , G02F1/1343
Abstract: A sub-wavelength thin-film metal grating is placed inside a liquid crystal variable optical retarder at a selected distance from a reflective electrode to form a reflective half wave plate, thereby reducing polarization dependence of the optical retardation generated by the variable optical retarder. The approach enables to form within the device the reflective half wave plate that is suitably thin without modifying the reflective electrode of the device.
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公开(公告)号：US09964668B2
公开(公告)日：2018-05-08
申请号：US15495265
申请日：2017-04-24
Applicant: Lumentum Operations LLC
Inventor： John Michael Miller , Joel Milgram , Karen Denise Hendrix , Michael O'Leary , Hery Djie , Lu Tian , Paul Colbourne
CPC classification number: G02B1/12 , G02B1/11 , G02B5/1809 , G02B5/3083 , G02B27/286 , G03F7/0005
Abstract: A zoned waveplate has a series of transversely stacked birefringent zones alternating with non-birefringent zones. The birefringent and non-birefringent zones are integrally formed upon an AR-coated face of a single substrate by patterning the AR coated face of the substrate with zero-order sub-wavelength form-birefringent gratings configured to have a target retardance. The layer structure of the AR coating is designed to provide the target birefringence in the patterned zones and the reflection suppression.
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公开(公告)号：US11619770B2
公开(公告)日：2023-04-04
申请号：US16594138
申请日：2019-10-07
Applicant: Lumentum Operations LLC
Inventor： John Michael Miller , Joel Milgram , Karen Denise Hendrix , Michael O'Leary , Hery Djie , Lu Tian , Paul Colbourne
Abstract: A zoned waveplate has a series of transversely stacked birefringent zones alternating with non-birefringent zones. The birefringent and non-birefringent zones are integrally formed upon an AR-coated face of a single substrate by patterning the AR coated face of the substrate with zero-order sub-wavelength form-birefringent gratings configured to have a target retardance. The layer structure of the AR coating is designed to provide the target birefringence in the patterned zones and the reflection suppression.
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公开(公告)号：US10436947B2
公开(公告)日：2019-10-08
申请号：US15973109
申请日：2018-05-07
Applicant: Lumentum Operations LLC
Inventor： John Michael Miller , Joel Milgram , Karen Denise Hendrix , Michael O'Leary , Hery Djie , Lu Tian , Paul Colbourne
Abstract: A zoned waveplate has a series of transversely stacked birefringent zones alternating with non-birefringent zones. The birefringent and non-birefringent zones are integrally formed upon an AR-coated face of a single substrate by patterning the AR coated face of the substrate with zero-order sub-wavelength form-birefringent gratings configured to have a target retardance. The layer structure of the AR coating is designed to provide the target birefringence in the patterned zones and the reflection suppression.
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公开(公告)号：US10768349B2
公开(公告)日：2020-09-08
申请号：US15638981
申请日：2017-06-30
Applicant: Lumentum Operations LLC
Inventor： John Michael Miller , Hery Djie , Patrick Lu , Xiaowei Guo , Qinghong Du , Eddie Chiu , Chester Murley
Abstract: A reflective diffraction grating and a fabrication method are provided. The reflective diffraction grating includes a substrate, a UV-absorbing layer, a grating layer having a binary surface-relief pattern formed therein, and a conforming reflective layer. Advantageously, the UV-absorbing layer absorbs light at a UV recording wavelength to minimize reflection thereof by the substrate during holographic patterning at the UV recording wavelength.
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Patent Agency Ranking
公开(公告)号：US20200033509A1
公开(公告)日：2020-01-30
申请号：US16594138
申请日：2019-10-07
Applicant: Lumentum Operations LLC
Inventor： John Michael Miller , Joel Milgram , Karen Denise Hendrix , Michael O'Leary , Hery Djie , Lu Tian , Paul Colbourne
Abstract: A zoned waveplate has a series of transversely stacked birefringent zones alternating with non-birefringent zones. The birefringent and non-birefringent zones are integrally formed upon an AR-coated face of a single substrate by patterning the AR coated face of the substrate with zero-order sub-wavelength form-birefringent gratings configured to have a target retardance. The layer structure of the AR coating is designed to provide the target birefringence in the patterned zones and the reflection suppression.
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公开(公告)号：US20180252845A1
公开(公告)日：2018-09-06
申请号：US15973109
申请日：2018-05-07
Applicant: Lumentum Operations LLC
Inventor： John Michael Miller , Joel Milgram , Karen Denise Hendrix , Michael O'Leary , Hery Djie , Lu Tian , Paul Colbourne
CPC classification number: G02B1/12 , G02B1/11 , G02B5/1809 , G02B5/3083 , G02B27/286 , G03F7/0005
Abstract: A zoned waveplate has a series of transversely stacked birefringent zones alternating with non-birefringent zones. The birefringent and non-birefringent zones are integrally formed upon an AR-coated face of a single substrate by patterning the AR coated face of the substrate with zero-order sub-wavelength form-birefringent gratings configured to have a target retardance. The layer structure of the AR coating is designed to provide the target birefringence in the patterned zones and the reflection suppression.
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公开(公告)号：US12034277B2
公开(公告)日：2024-07-09
申请号：US18326465
申请日：2023-05-31
Applicant: Lumentum Operations LLC
IPC: H01S5/34
CPC classification number: H01S5/3407 , H01S5/3425
Abstract: A semiconductor layer structure may include a substrate, a blocking layer disposed over the substrate, and one or more epitaxial layers disposed over the blocking layer. The blocking layer may have a thickness of between 50 nanometers (nm) and 4000 nm. The blocking layer may be configured to suppress defects from the substrate propagating to the one or more epitaxial layers. The one or more epitaxial layers may include a quantum-well layer that includes a quantum-well intermixing region formed using a high temperature treatment.
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公开(公告)号：US11670913B2
公开(公告)日：2023-06-06
申请号：US16947876
申请日：2020-08-21
Applicant: Lumentum Operations LLC
IPC: H01S5/34
CPC classification number: H01S5/3407 , H01S5/3425
Abstract: A semiconductor layer structure may include a substrate, a blocking layer disposed over the substrate, and one or more epitaxial layers disposed over the blocking layer. The blocking layer may have a thickness of between 50 nanometers (nm) and 4000 nm. The blocking layer may be configured to suppress defects from the substrate propagating to the one or more epitaxial layers. The one or more epitaxial layers may include a quantum-well layer that includes a quantum-well intermixing region formed using a high temperature treatment.
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公开(公告)号：US09720147B2
公开(公告)日：2017-08-01
申请号：US14229399
申请日：2014-03-28
Applicant: Lumentum Operations LLC
Inventor： John Michael Miller , Hery Djie , Patrick Lu , Xiaowei Guo , Qinghong Du , Eddie Chiu , Chester Murley
CPC classification number: G02B5/1861 , B29D11/00769 , G02B1/10 , G02B5/1814 , G02B5/1857 , G02B5/208 , G03F7/001
Abstract: A reflective diffraction grating and a fabrication method are provided. The reflective diffraction grating includes a substrate, a UV-absorbing layer, a grating layer having a binary surface-relief pattern formed therein, and a conforming reflective layer. Advantageously, the UV-absorbing layer absorbs light at a UV recording wavelength to minimize reflection thereof by the substrate during holographic patterning at the UV recording wavelength.
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