公开(公告)号：US10768349B2

公开(公告)日：2020-09-08

申请号：US15638981

申请日：2017-06-30

Applicant: Lumentum Operations LLC

Inventor： John Michael Miller ,  Hery Djie ,  Patrick Lu ,  Xiaowei Guo ,  Qinghong Du ,  Eddie Chiu ,  Chester Murley

IPC: G02B5/18 ,  G02B5/20 ,  G02B1/10 ,  B29D11/00 ,  G03F7/00

Abstract: A reflective diffraction grating and a fabrication method are provided. The reflective diffraction grating includes a substrate, a UV-absorbing layer, a grating layer having a binary surface-relief pattern formed therein, and a conforming reflective layer. Advantageously, the UV-absorbing layer absorbs light at a UV recording wavelength to minimize reflection thereof by the substrate during holographic patterning at the UV recording wavelength.

公开(公告)号：US09720147B2

公开(公告)日：2017-08-01

申请号：US14229399

申请日：2014-03-28

Applicant: Lumentum Operations LLC

Inventor： John Michael Miller ,  Hery Djie ,  Patrick Lu ,  Xiaowei Guo ,  Qinghong Du ,  Eddie Chiu ,  Chester Murley

IPC: G02B5/18 ,  G02B1/10 ,  B29D11/00 ,  G03F7/00

CPC classification number: G02B5/1861 ,  B29D11/00769 ,  G02B1/10 ,  G02B5/1814 ,  G02B5/1857 ,  G02B5/208 ,  G03F7/001

Abstract: A reflective diffraction grating and a fabrication method are provided. The reflective diffraction grating includes a substrate, a UV-absorbing layer, a grating layer having a binary surface-relief pattern formed therein, and a conforming reflective layer. Advantageously, the UV-absorbing layer absorbs light at a UV recording wavelength to minimize reflection thereof by the substrate during holographic patterning at the UV recording wavelength.