公开(公告)号：US10060884B2

公开(公告)日：2018-08-28

申请号：US15184590

申请日：2016-06-16

Applicant: KLA-Tencor Corporation

Inventor： Jamie Sullivan ,  Wenjian Cai ,  Yevgeniy Churin ,  Ralph Johnson ,  Meier Yitzhak Brender ,  Mark Shi Wang ,  Rex Runyon ,  Kai Cao

IPC: G01N21/88 ,  G01N21/95 ,  G01N29/24 ,  G01N21/956

CPC classification number: G01N29/2418 ,  G01N21/8806 ,  G01N21/9501 ,  G01N21/956 ,  G01N2291/2697

Abstract: A method of scanning a sample includes simultaneously forming a plurality of co-linear scans. Each scan is formed by a sweep of a spot by an acousto-optical device (AOD). The co-linear scans are separated by a predetermined spacing. A first plurality of swaths are formed by repeating the simultaneous forming of the plurality of co-linear scans in a direction perpendicular to the co-linear scans. The first plurality of swaths have an inter-swath spacing that is the same as the predetermined spacing. The predetermined spacing can be a scan length or an integral number of scan lengths. A second plurality of swaths can be formed adjacent to the first plurality of swaths. Forming the second plurality of swaths can be performed in an opposite direction to that of the first plurality of swaths or in a same direction. An inspection system can implement this method by including a diffractive optical element (DOE) path after a magnification changer.

公开(公告)号：US09423357B2

公开(公告)日：2016-08-23

申请号：US14288622

申请日：2014-05-28

Applicant: KLA-Tencor Corporation

Inventor： Shiyu Zhang ,  Charles N. Wang ,  Yevgeniy Churin ,  Yong-Mo Moon ,  Hyoseok Daniel Yang ,  Mark S. Wang

IPC: F21V7/09 ,  G01N21/88 ,  G01N21/95

CPC classification number: G01N21/8806 ,  G01N21/9501

Abstract: One embodiment relates to an oblique illuminator. The oblique illuminator includes a light source emitting a light beam, a first reflective surface, and a second reflective surface. The first reflective surface has a convex cylindrical shape with a projected parabolic profile along the non-powered direction which is configured to reflect the light beam from the light source and which defines a focal line. The second reflective surface has a concave cylindrical shape with a projected elliptical profile which is configured to reflect the light beam from the first reflective surface and which defines first and second focal lines. The focal line of the first reflective surface is coincident with the first focal line of the second reflective surface. The first and second focal lines of the second reflective surface may be a same line in which case the elliptical curvature is a projected spherical profile. Other embodiments, aspects and features are also disclosed.

Abstract translation: 一个实施例涉及一种倾斜照明器。 倾斜照明器包括发射光束的光源，第一反射表面和第二反射表面。 第一反射表面具有凸起的圆柱形形状，具有沿着非供电方向的投影抛物线轮廓，其被配置为反射来自光源的光束并且限定焦线。 第二反射表面具有凹入的圆柱形形状，其具有突出的椭圆形轮廓，其被配置为反射来自第一反射表面的光束并且限定第一和第二焦线。 第一反射面的焦线与第二反射面的第一焦线重合。 第二反射表面的第一和第二焦线可以是相同的线，在这种情况下，椭圆曲率是投影的球形轮廓。 还公开了其它实施例，方面和特征。

公开(公告)号：US20160327493A1

公开(公告)日：2016-11-10

申请号：US14982747

申请日：2015-12-29

Applicant: KLA-Tencor Corporation

Inventor： Jamie M. Sullivan ,  Yevgeniy Churin

IPC: G01N21/88 ,  G02B5/32 ,  G02B27/12 ,  G02F1/33 ,  G02B27/10 ,  G01N21/95 ,  G02B26/12

CPC classification number: G01N21/8806 ,  G01N21/9501 ,  G01N2201/0635 ,  G01N2201/104 ,  G01N2201/105 ,  G01N2201/106 ,  G02B26/101 ,  G02B27/1086 ,  G02B27/123 ,  G02F1/33

Abstract: A system to generate multiple beam lines in an oblique angle multi-beam spot scanning wafer inspection system includes a beam scanning device configured to scan a beam of illumination, an objective lens oriented at an oblique angle relative to the surface of a sample and with an optical axis perpendicular to a first scanning direction on the sample, and one or more optical elements positioned between the objective lens and the beam scanning device. The one or more optical elements split the beam into two or more offset beams such that the two or more offset beams are separated in a least a second direction perpendicular to the first direction. The one or more optical elements further modify the phase characteristics of the two or more offset beams such that the two or more offset beams are simultaneously in focus on the sample during a scan.

Abstract translation: 在斜角多光束点扫描晶片检查系统中产生多个光束线的系统包括：束扫描装置，被配置为扫描照射束;物镜相对于样品的表面以倾斜角度定向;以及 垂直于样品上的第一扫描方向的光轴和位于物镜和束扫描装置之间的一个或多个光学元件。 一个或多个光学元件将光束分成两个或更多个偏移光束，使得两个或更多个偏移光束在垂直于第一方向的至少第二方向上分离。 一个或多个光学元件进一步修改两个或多个偏移光束的相位特性，使得两个或更多个偏移光束在扫描期间同时聚焦在样本上。

公开(公告)号：US20140260640A1

公开(公告)日：2014-09-18

申请号：US13844576

申请日：2013-03-15

Applicant: KLA-Tencor Corporation

Inventor： Jamie Sullivan ,  Wenjian Cai ,  Yevgeniy Churin ,  Ralph Johnson ,  Meier Yitzhak Brender ,  Mark Shi Wang ,  Rex Runyon ,  Kai Cao

IPC: G01N29/24

CPC classification number: G01N29/2418 ,  G01N21/8806 ,  G01N21/9501 ,  G01N21/956 ,  G01N2291/2697

Abstract: A method of scanning a sample includes simultaneously forming a plurality of co-linear scans. Each scan is formed by a sweep of a spot by an acousto-optical device (AOD). The co-linear scans are separated by a predetermined spacing. A first plurality of swaths are formed by repeating the simultaneous forming of the plurality of co-linear scans in a direction perpendicular to the co-linear scans. The first plurality of swaths have an inter-swath spacing that is the same as the predetermined spacing. A second plurality of swaths can be formed adjacent to the first plurality of swaths. Forming the second plurality of swaths can be performed in an opposite direction to that of the first plurality of swaths or in a same direction. An inspection system can implement this method by including a diffractive optical element (DOE) path after a magnification changer.

Abstract translation: 扫描样本的方法同时形成多个共线扫描。 通过声光装置（AOD）的扫描形成每个扫描。 共线扫描以预定间隔分开。 通过在垂直于共线扫描的方向上重复同时形成多个共线扫描来形成第一多个条带。 第一多个条带具有与预定间隔相同的跨幅间距。 可以在第一多个条带附近形成第二多个条带。 形成第二多个条可以沿与第一多个条的方向相反的方向或在相同的方向上执行。 检查系统可以通过在放大倍率变换器之后包括衍射光学元件（DOE）路径来实现该方法。

公开(公告)号：US11119384B2

公开(公告)日：2021-09-14

申请号：US16133611

申请日：2018-09-17

Applicant: KLA-Tencor Corporation

Inventor： Rajeev Patil ,  David Ramirez ,  Yevgeniy Churin ,  William Replogle

IPC: G02F1/35 ,  H01L21/67 ,  H01S3/00

Abstract: Disclosed are methods and apparatus for hermetically sealing a nonlinear optical (NLO) crystal for use in a laser system. A mounted NLO crystal, an enclosure base, a lid, and a plurality of window components are moved into an oven. A vacuum bake process is then performed on the mounted NLO crystal, enclosure base, lid, and plurality of window components until a humidity level that is less than a predefined amount is reached. The mounted NLO crystal, enclosure base, lid, and plurality of window components are moved from the oven onto a stage of a glove box that includes a sealing tool. In the glove box, the mounted NLO crystal is hermetically sealed into the enclosure base by sealing the lid and plurality of window components into openings of the enclosure base.

公开(公告)号：US09891175B2

公开(公告)日：2018-02-13

申请号：US14982747

申请日：2015-12-29

Applicant: KLA-Tencor Corporation

Inventor： Jamie M. Sullivan ,  Yevgeniy Churin

IPC: G01N21/00 ,  G01N21/88 ,  G01N21/95 ,  G02F1/33 ,  G02B27/10 ,  G02B27/12 ,  G02B26/10

CPC classification number: G01N21/8806 ,  G01N21/9501 ,  G01N2201/0635 ,  G01N2201/104 ,  G01N2201/105 ,  G01N2201/106 ,  G02B26/101 ,  G02B27/1086 ,  G02B27/123 ,  G02F1/33

Abstract: A system to generate multiple beam lines in an oblique angle multi-beam spot scanning wafer inspection system includes a beam scanning device configured to scan a beam of illumination, an objective lens oriented at an oblique angle relative to the surface of a sample and with an optical axis perpendicular to a first scanning direction on the sample, and one or more optical elements positioned between the objective lens and the beam scanning device. The one or more optical elements split the beam into two or more offset beams such that the two or more offset beams are separated in a least a second direction perpendicular to the first direction. The one or more optical elements further modify the phase characteristics of the two or more offset beams such that the two or more offset beams are simultaneously in focus on the sample during a scan.

公开(公告)号：US09395340B2

公开(公告)日：2016-07-19

申请号：US13844576

申请日：2013-03-15

Applicant: KLA-Tencor Corporation

Inventor： Jamie Sullivan ,  Wenjian Cai ,  Yevgeniy Churin ,  Ralph Johnson ,  Meier Yitzhak Brender ,  Mark Shi Wang ,  Rex Runyon ,  Kai Cao

IPC: G01N21/88 ,  G01N21/95 ,  G01N29/24 ,  G01N21/956

CPC classification number: G01N29/2418 ,  G01N21/8806 ,  G01N21/9501 ,  G01N21/956 ,  G01N2291/2697

Abstract: A method of scanning a sample includes simultaneously forming a plurality of co-linear scans. Each scan is formed by a sweep of a spot by an acousto-optical device (AOD). The co-linear scans are separated by a predetermined spacing. A first plurality of swaths are formed by repeating the simultaneous forming of the plurality of co-linear scans in a direction perpendicular to the co-linear scans. The first plurality of swaths have an inter-swath spacing that is the same as the predetermined spacing. A second plurality of swaths can be formed adjacent to the first plurality of swaths. Forming the second plurality of swaths can be performed in an opposite direction to that of the first plurality of swaths or in a same direction. An inspection system can implement this method by including a diffractive optical element (DOE) path after a magnification changer.

Abstract translation: 扫描样本的方法同时形成多个共线扫描。 通过声光装置（AOD）的扫描形成每个扫描。 共线扫描以预定间隔分开。 通过在垂直于共线扫描的方向上重复同时形成多个共线扫描来形成第一多个条带。 第一多个条带具有与预定间隔相同的跨幅间距。 可以在第一多个条带附近形成第二多个条带。 形成第二多个条可以沿与第一多个条的方向相反的方向或在相同的方向上执行。 检查系统可以通过在放大倍率变换器之后包括衍射光学元件（DOE）路径来实现该方法。

公开(公告)号：US20190094653A1

公开(公告)日：2019-03-28

申请号：US16133611

申请日：2018-09-17

Applicant: KLA-Tencor Corporation

Inventor： Rajeev Patil ,  David Ramirez ,  Yevgeniy Churin ,  William Replogle

IPC: G02F1/35 ,  H01L21/67 ,  H01S3/00

Abstract: Disclosed are methods and apparatus for hermetically sealing a nonlinear optical (NLO) crystal for use in a laser system. A mounted NLO crystal, an enclosure base, a lid, and a plurality of window components are moved into an oven. A vacuum bake process is then performed on the mounted NLO crystal, enclosure base, lid, and plurality of window components until a humidity level that is less than a predefined amount is reached. The mounted NLO crystal, enclosure base, lid, and plurality of window components are moved from the oven onto a stage of a glove box that includes a sealing tool. In the glove box, the mounted NLO crystal is hermetically sealed into the enclosure base by sealing the lid and plurality of window components into openings of the enclosure base.

公开(公告)号：US20160290971A1

公开(公告)日：2016-10-06

申请号：US15184590

申请日：2016-06-16

Applicant: KLA-Tencor Corporation

Inventor： Jamie Sullivan ,  Wenjian Cai ,  Yevgeniy Churin ,  Ralph Johnson ,  Meier Yitzhak Brender ,  Mark Shi Wang ,  Rex Runyon ,  Kai Cao

IPC: G01N29/24 ,  G01N21/95 ,  G01N21/956 ,  G01N21/88

CPC classification number: G01N29/2418 ,  G01N21/8806 ,  G01N21/9501 ,  G01N21/956 ,  G01N2291/2697

Abstract: A method of scanning a sample includes simultaneously forming a plurality of co-linear scans. Each scan is formed by a sweep of a spot by an acousto-optical device (AOD). The co-linear scans are separated by a predetermined spacing. A first plurality of swaths are formed by repeating the simultaneous forming of the plurality of co-linear scans in a direction perpendicular to the co-linear scans. The first plurality of swaths have an inter-swath spacing that is the same as the predetermined spacing. The predetermined spacing can be a scan length or an integral number of scan lengths. A second plurality of swaths can be formed adjacent to the first plurality of swaths. Forming the second plurality of swaths can be performed in an opposite direction to that of the first plurality of swaths or in a same direction. An inspection system can implement this method by including a diffractive optical element (DOE) path after a magnification changer.

Abstract translation: 扫描样本的方法同时形成多个共线扫描。 通过声光装置（AOD）的扫描形成每个扫描。 共线扫描以预定间隔分开。 通过在垂直于共线扫描的方向上重复同时形成多个共线扫描来形成第一多个条带。 第一多个条带具有与预定间隔相同的跨幅间距。 预定间隔可以是扫描长度或整数倍的扫描长度。 可以在第一多个条带附近形成第二多个条带。 形成第二多个条可以沿与第一多个条的方向相反的方向或在相同的方向上执行。 检查系统可以通过在放大倍率变换器之后包括衍射光学元件（DOE）路径来实现该方法。