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公开(公告)号：US10607119B2
公开(公告)日：2020-03-31
申请号：US15697426
申请日：2017-09-06
Applicant: KLA-Tencor Corporation
Inventor： Li He , Mohan Mahadevan , Sankar Venkataraman , Huajun Ying , Hedong Yang
Abstract: Methods and systems for detecting and classifying defects on a specimen are provided. One system includes one or more components executed by one or more computer subsystems. The one or more components include a neural network configured for detecting defects on a specimen and classifying the defects detected on the specimen. The neural network includes a first portion configured for determining features of images of the specimen generated by an imaging subsystem. The neural network also includes a second portion configured for detecting defects on the specimen based on the determined features of the images and classifying the defects detected on the specimen based on the determined features of the images.
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公开(公告)号：US10395362B2
公开(公告)日：2019-08-27
申请号：US15896060
申请日：2018-02-14
Applicant: KLA-Tencor Corporation
Inventor： Ajay Gupta , Mohan Mahadevan , Sankar Venkataraman , Hedong Yang , Laurent Karsenti , Yair Carmon , Noga Bullkich , Udy Danino
IPC: G06T7/00 , G06T7/564 , G01N21/95 , G01N21/88 , G01N21/956
Abstract: Methods and systems for detecting defects in patterns formed on a specimen are provided. One system includes one or more components executed by one or more computer subsystems, and the component(s) include first and second learning based models. The first learning based model generates simulated contours for the patterns based on a design for the specimen, and the simulated contours are expected contours of a defect free version of the patterns in images of the specimen generated by an imaging subsystem. The second learning based model is configured for generating actual contours for the patterns in at least one acquired image of the patterns formed on the specimen. The computer subsystem(s) are configured for comparing the actual contours to the simulated contours and detecting defects in the patterns formed on the specimen based on results of the comparing.
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Patent Agency Ranking
公开(公告)号：US20190004298A1
公开(公告)日：2019-01-03
申请号：US15672797
申请日：2017-08-09
Applicant: KLA-Tencor Corporation
Inventor： Ichiro Honjo , Christopher Sears , Hedong Yang , Thanh Ha , Jianwei Wang , Huina Xu
Abstract: Objective lens alignment of a scanning electron microscope review tool with fewer image acquisitions can be obtained using the disclosed techniques and systems. Two different X-Y voltage pairs for the scanning electron microscope can be determined based on images. A second image based on the first X-Y voltage pair can be used to determine a second X-Y voltage pair. The X-Y voltage pairs can be applied at the Q4 lens or other optical components of the scanning electron microscope.
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公开(公告)号：US20180293721A1
公开(公告)日：2018-10-11
申请号：US15896060
申请日：2018-02-14
Applicant: KLA-Tencor Corporation
Inventor： Ajay Gupta , Mohan Mahadevan , Sankar Venkataraman , Hedong Yang , Laurent Karsenti , Yair Carmon , Noga Bullkich , Udy Danino
IPC: G06T7/00 , G06T7/564 , G01N21/95 , G01N21/956 , G01N21/88
CPC classification number: G06T7/001 , G01N21/8851 , G01N21/9501 , G01N21/956 , G01N21/95607 , G01N2021/8867 , G01N2021/8887 , G05B19/41875 , G06N20/00 , G06T7/564 , G06T2207/10061 , G06T2207/20081 , G06T2207/20084 , G06T2207/30148 , H01L22/12 , H01L22/20
Abstract: Methods and systems for detecting defects in patterns formed on a specimen are provided. One system includes one or more components executed by one or more computer subsystems, and the component(s) include first and second learning based models. The first learning based model generates simulated contours for the patterns based on a design for the specimen, and the simulated contours are expected contours of a defect free version of the patterns in images of the specimen generated by an imaging subsystem. The second learning based model is configured for generating actual contours for the patterns in at least one acquired image of the patterns formed on the specimen. The computer subsystem(s) are configured for comparing the actual contours to the simulated contours and detecting defects in the patterns formed on the specimen based on results of the comparing.
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公开(公告)号：US10790114B2
公开(公告)日：2020-09-29
申请号：US15672797
申请日：2017-08-09
Applicant: KLA-Tencor Corporation
Inventor： Ichiro Honjo , Christopher Sears , Hedong Yang , Thanh Ha , Jianwei Wang , Huina Xu
Abstract: Objective lens alignment of a scanning electron microscope review tool with fewer image acquisitions can be obtained using the disclosed techniques and systems. Two different X-Y voltage pairs for the scanning electron microscope can be determined based on images. A second image based on the first X-Y voltage pair can be used to determine a second X-Y voltage pair. The X-Y voltage pairs can be applied at the Q4 lens or other optical components of the scanning electron microscope.
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公开(公告)号：US20190073568A1
公开(公告)日：2019-03-07
申请号：US15697426
申请日：2017-09-06
Applicant: KLA-Tencor Corporation
Inventor： Li He , Mohan Mahadevan , Sankar Venkataraman , Huajun Ying , Hedong Yang
Abstract: Methods and systems for detecting and classifying defects on a specimen are provided. One system includes one or more components executed by one or more computer subsystems. The one or more components include a neural network configured for detecting defects on a specimen and classifying the defects detected on the specimen. The neural network includes a first portion configured for determining features of images of the specimen generated by an imaging subsystem. The neural network also includes a second portion configured for detecting defects on the specimen based on the determined features of the images and classifying the defects detected on the specimen based on the determined features of the images.
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公开(公告)号：US09483819B2
公开(公告)日：2016-11-01
申请号：US14062761
申请日：2013-10-24
Applicant: KLA-Tencor Corporation
Inventor： Chien-Huei Chen , Ajay Gupta , Thanh Huy Ha , Jianwei Wang , Hedong Yang , Christopher Michael Maher , Michael J. Van Riet
IPC: G06T7/00 , G01N23/225 , H01L21/66
CPC classification number: G06T7/001 , G01N23/2251 , G01N2223/6116 , G06T2207/10061 , G06T2207/30148 , H01L22/12
Abstract: One embodiment relates to a method of inspecting an array of cells on a substrate. A reference image is generated using a cell image that was previously determined to be defect free. A reference contour image which includes contours of the reference image is also generated. The reference contour image is used to detect defects in the array of cells on the substrate. Another embodiment relates to a system for detecting defects in an array on a substrate. Other embodiments, aspects and features are also disclosed.
Abstract translation: 一个实施例涉及一种检查衬底上的单元阵列的方法。 使用先前确定为无缺陷的单元图像来生成参考图像。 还生成包括参考图像的轮廓的参考轮廓图像。 参考轮廓图像用于检测基板上的单元阵列中的缺陷。 另一个实施例涉及用于检测衬底上的阵列中的缺陷的系统。 还公开了其它实施例，方面和特征。
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