公开(公告)号：US09483819B2

公开(公告)日：2016-11-01

申请号：US14062761

申请日：2013-10-24

Applicant: KLA-Tencor Corporation

Inventor： Chien-Huei Chen ,  Ajay Gupta ,  Thanh Huy Ha ,  Jianwei Wang ,  Hedong Yang ,  Christopher Michael Maher ,  Michael J. Van Riet

IPC: G06T7/00 ,  G01N23/225 ,  H01L21/66

CPC classification number: G06T7/001 ,  G01N23/2251 ,  G01N2223/6116 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01L22/12

Abstract: One embodiment relates to a method of inspecting an array of cells on a substrate. A reference image is generated using a cell image that was previously determined to be defect free. A reference contour image which includes contours of the reference image is also generated. The reference contour image is used to detect defects in the array of cells on the substrate. Another embodiment relates to a system for detecting defects in an array on a substrate. Other embodiments, aspects and features are also disclosed.

Abstract translation: 一个实施例涉及一种检查衬底上的单元阵列的方法。 使用先前确定为无缺陷的单元图像来生成参考图像。 还生成包括参考图像的轮廓的参考轮廓图像。 参考轮廓图像用于检测基板上的单元阵列中的缺陷。 另一个实施例涉及用于检测衬底上的阵列中的缺陷的系统。 还公开了其它实施例，方面和特征。