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公开(公告)号：US20230213875A1
公开(公告)日：2023-07-06
申请号：US17709104
申请日：2022-03-30
Applicant: KLA Corporation
Inventor： Yuval Lubashevsky , Itay Gdor , Daria Negri , Eitan Hajaj
CPC classification number: G03F7/70633 , G01B9/02041
Abstract: An overlay metrology system may include an illumination source and illumination optics to illuminate an overlay target on a sample with illumination from the illumination source as the sample is in motion with respect to the illumination from the illumination source in accordance with a measurement recipe. The overlay target may include one or more cells, where a single cell is suitable for measurement along a particular direction. Such a cell may include two or more gratings with different pitches. Further, the system may include two or more photodetectors, each configured to capture three diffraction lobes from the two or more grating structures. The system may further include a controller to determine an overlay measurement associated with each cell of the overlay target.
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2.发明公开公开(公告)号：US20230314344A1
公开(公告)日：2023-10-05
申请号：US17709200
申请日：2022-03-30
Applicant: KLA Corporation
Inventor： Yuri Paskover , Itay Gdor , Yuval Lubashevsky , Vladimir Levinski , Alexander Volfman , Yoram Uziel , Yevgeniy Men
IPC: G01N21/956 , G01N21/88 , G01N21/47 , G01B11/27
CPC classification number: G01N21/956 , G01N21/8806 , G01N21/4788 , G01B11/272 , G01B2210/56
Abstract: A system includes an illumination source configured to generate an illumination beam, and a collection sub-system that includes an objective lens, one or more detectors located at a collection pupil plane, a light modulator, and a controller. The light modulator is configured to direct one or more selected portions of measurement light to the one or more detectors. The controller includes one or more processors configured to execute program instructions causing the one or more processors to execute a metrology recipe by: receiving detection signals from the one or more detectors, wherein the detection signals are associated with the one or more selected portions of the measurement light directed to the one or more detectors; and generating an overlay measurement associated with at least two layers of a sample based on the detection signals.
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公开(公告)号：US20220187062A1
公开(公告)日：2022-06-16
申请号：US17119536
申请日：2020-12-11
Applicant: KLA Corporation
Inventor： Yuri Paskover , Itay Gdor , Yuval Lubashevksy , Vladimir Levinski , Alexander Volfman , Yoram Uziel
IPC: G01B11/27
Abstract: A metrology target is disclosed, in accordance with one or more embodiments of the present disclosure. The metrology target includes a first set of pattern elements having a first pitch, where the first set of pattern elements includes segmented pattern elements. The metrology target includes a second set of pattern elements having a second pitch, where the second set of pattern elements includes segmented pattern elements. The metrology target includes a third set of pattern elements having a third pitch, where the third set of pattern elements includes segmented pattern elements.
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公开(公告)号：US20240167813A1
公开(公告)日：2024-05-23
申请号：US18099798
申请日：2023-01-20
Applicant: KLA Corporation
Inventor： Itay Gdor , Yuval Lubashevsky , Vladimir Levinski , Daria Negri , Alon Yagil , Nickolai Isakovich
IPC: G01B11/27 , G01N21/47 , G01N21/956
CPC classification number: G01B11/272 , G01N21/4788 , G01N21/956 , G01B2210/56
Abstract: An overlay metrology system and method are disclosed for generating an overlay measurement of an overlay target including cells with structures in reversed orders. The overlay metrology system may include an illumination sub-system and a collection sub-system. The collection sub-system may include one or more detectors to collect measurement light from a sample. The sample, according to a metrology recipe, may include an overlay target having a first cell of a first cell type and a second cell of a second cell type, where the second cell type includes structures in a reverse order relative to the first cell type. The metrology recipe may include receiving detection signals, generating an overlay measurement of each cell based on the detection signals, and generating an overlay measurement associated with the overlay target based on a value indicative of an average of the overlay measurements of each cell.
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公开(公告)号：US11796925B2
公开(公告)日：2023-10-24
申请号：US17709104
申请日：2022-03-30
Applicant: KLA Corporation
Inventor： Yuval Lubashevsky , Itay Gdor , Daria Negri , Eitan Hajaj
CPC classification number: G03F7/70633 , G01B9/02041
Abstract: An overlay metrology system may include an illumination source and illumination optics to illuminate an overlay target on a sample with illumination from the illumination source as the sample is in motion with respect to the illumination from the illumination source in accordance with a measurement recipe. The overlay target may include one or more cells, where a single cell is suitable for measurement along a particular direction. Such a cell may include two or more gratings with different pitches. Further, the system may include two or more photodetectors, each configured to capture three diffraction lobes from the two or more grating structures. The system may further include a controller to determine an overlay measurement associated with each cell of the overlay target.
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Patent Agency Ranking
公开(公告)号：US20210364935A1
公开(公告)日：2021-11-25
申请号：US16964734
申请日：2020-06-25
Applicant: KLA CORPORATION
Inventor： Itay Gdor , Yuval Lubashevsky , Yuri Paskover , Yoram Uziel , Nadav Gutman
Abstract: A target for use in the measurement of misregistration between layers formed on a wafer in the manufacture of semiconductor devices, the target including a first pair of periodic structures (FPPS) and a second pair of periodic structures (SPPS), each of the FPPS and the SPPS including a first edge, a second edge, a plurality of first periodic structures formed in a first area as part of a first layer and having a first pitch along a first pitch axis, the first pitch axis not being parallel to either of the first edge or second edge, and a plurality of second periodic structures formed in a second area as part of a second layer and having the first pitch along a second pitch axis, the second pitch axis being generally parallel to the first pitch axis.
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公开(公告)号：US20240068804A1
公开(公告)日：2024-02-29
申请号：US18234773
申请日：2023-08-16
Applicant: KLA Corporation
Inventor： Yuval Lubashevsky , Itay Gdor , Daria Negri , Eitan Hajaj
CPC classification number: G01B11/272 , G01B9/02043 , H01L21/682
Abstract: An overlay metrology system with pitches in multiple directions in a single cell is disclosed. The overlay target may, according to a metrology recipe, include a multi-layer structure on two or more layers of a cell of the sample. The multi-layer structure may include structures in each layer having one or more pitches in one or more directions of periodicity. The multi-layer structure may include structures with a first pitch in a first direction, a second pitch in a second direction, a third pitch in the first direction, and a fourth pitch in the second direction. At least one of the first pitch or the third pitch may be different than at least one of the second pitch or the fourth pitch.
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公开(公告)号：US20230314319A1
公开(公告)日：2023-10-05
申请号：US17708958
申请日：2022-03-30
Applicant: KLA Corporation
Inventor： Amnon Manassen , Andrew V. Hill , Yuri Paskover , Itay Gdor , Yonatan Vaknin , Yuval Lubashevsky
IPC: G01N21/47 , G01B11/27 , G01N21/956
CPC classification number: G01N21/4788 , G01B11/272 , G01N21/956 , G01B2210/56
Abstract: An overlay metrology system may include an illumination an illumination source to generate an illumination beam, one or more illumination optics to direct the illumination beam to an overlay target on a sample as the sample is scanned relative to the illumination beam along a scan direction, the target including one or more cells having Moiré structures. The system may also include two photodetectors at locations of a pupil plane associated with Moiré or overlapping diffraction orders from the Moiré structures. The system may then generate overlay measurements based on time-varying interference signals captured by the detector as the sample is scanned.
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公开(公告)号：US11409205B2
公开(公告)日：2022-08-09
申请号：US16964734
申请日：2020-06-25
Applicant: KLA CORPORATION
Inventor： Itay Gdor , Yuval Lubashevsky , Yuri Paskover , Yoram Uziel , Nadav Gutman
Abstract: A target for use in the measurement of misregistration between layers formed on a wafer in the manufacture of semiconductor devices, the target including a first pair of periodic structures (FPPS) and a second pair of periodic structures (SPPS), each of the FPPS and the SPPS including a first edge, a second edge, a plurality of first periodic structures formed in a first area as part of a first layer and having a first pitch along a first pitch axis, the first pitch axis not being parallel to either of the first edge or second edge, and a plurality of second periodic structures formed in a second area as part of a second layer and having the first pitch along a second pitch axis, the second pitch axis being generally parallel to the first pitch axis.
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公开(公告)号：US11378394B1
公开(公告)日：2022-07-05
申请号：US17119536
申请日：2020-12-11
Applicant: KLA Corporation
Inventor： Yuri Paskover , Itay Gdor , Yuval Lubashevksy , Vladimir Levinski , Alexander Volfman , Yoram Uziel
IPC: G01B11/27
Abstract: A metrology target is disclosed, in accordance with one or more embodiments of the present disclosure. The metrology target includes a first set of pattern elements having a first pitch, where the first set of pattern elements includes segmented pattern elements. The metrology target includes a second set of pattern elements having a second pitch, where the second set of pattern elements includes segmented pattern elements. The metrology target includes a third set of pattern elements having a third pitch, where the third set of pattern elements includes segmented pattern elements.
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