公开(公告)号：US20190096920A1

公开(公告)日：2019-03-28

申请号：US16134201

申请日：2018-09-18

Applicant: BOE Technology Group Co., Ltd.

Inventor： Tianmin Zhou ,  Wei Yang ,  Lizhong Wang ,  Jipeng Song

IPC: H01L27/12

CPC classification number: H01L27/1225 ,  H01L21/3003 ,  H01L27/1222 ,  H01L27/1248 ,  H01L27/1251 ,  H01L27/1262 ,  H01L27/127 ,  H01L27/1296 ,  H01L29/78609 ,  H01L29/78675 ,  H01L29/7869

Abstract: an array substrate, a method of manufacturing the array substrate, and a display device are provided. The array substrate includes: a base substrate; a first thin film transistor and a second thin film transistor on the base substrate, wherein the first thin film transistor comprises a first active layer, the second thin film transistor comprises a second active layer, and the second active layer is on a side of the first active layer away from the base substrate; and an interlayer dielectric layer and a first buffer layer between the first active layer and the second active layer, wherein the interlayer dielectric layer is capable of supplying hydrogen and the first buffer layer is capable of blocking hydrogen.

公开(公告)号：US12230683B2

公开(公告)日：2025-02-18

申请号：US17755380

申请日：2021-05-19

Applicant: BOE Technology Group Co., Ltd.

Inventor： Lizhong Wang ,  Ce Ning ,  Hehe Hu ,  Tianmin Zhou ,  Jipeng Song

IPC: H01L29/786 ,  H01L29/417

Abstract: The present disclosure provides a thin film transistor, a GOA circuit and an array substrate, the thin film transistor including a source electrode, including a source electrode wiring and a plurality of source electrode branches; a drain electrode, including a drain electrode wiring and a plurality of drain electrode branches; a gate; a semiconductor layer including a plurality of semiconductor branches; a plurality of source electrode branches. The plurality of drain electrode branches are in contact with the plurality of semiconductor branches and are divided into a plurality of cells; the source electrode wiring and the drain electrode wiring are arranged in a parallel and spaced apart, and the number m of one of the source electrode wiring and the drain electrode wiring is an integer greater than or equal to 2, and the number n of the other is an integer greater than or equal to 1.

公开(公告)号：US11239263B2

公开(公告)日：2022-02-01

申请号：US16074283

申请日：2018-01-23

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Tianmin Zhou ,  Wei Yang ,  Lizhong Wang ,  Xiaming Zhu ,  Jipeng Song

IPC: H01L27/12 ,  H01L29/786 ,  H01L33/44

Abstract: A thin film transistor, a method for manufacturing the same and a display device are disclosed. The thin film transistor includes source-drain electrodes and a passivation layer; an isolation layer is disposed between the source-drain electrodes and the passivation layer, and the isolation layer overlays the source-drain electrodes.

公开(公告)号：US20210050469A1

公开(公告)日：2021-02-18

申请号：US16812764

申请日：2020-03-09

Applicant: BOE Technology Group Co.,Ltd.

Inventor： Tianmin Zhou ,  Rui Huang ,  Lizhong Wang ,  Jipeng Song ,  Tao Yang ,  Zhaohui Qiang

IPC: H01L31/11 ,  H01L31/0224 ,  H01L31/0236 ,  H01L31/0392

Abstract: A photosensitive device, a manufacturing method thereof, a detection substrate and an array substrate are provided. The photosensitive device is formed on a substrate, and it includes a photosensitive element and a thin film transistor. The photosensitive element includes a first electrode layer on the substrate; a second electrode layer on a side of the first electrode layer distal to the substrate; and a photoelectric conversion layer between the first electrode layer and the second electrode layer. The thin film transistor is electrically connected to the photosensitive element, and it includes a first gate electrode on the substrate; an active layer on a side of the first gate electrode distal to the substrate; and a second gate electrode on a side of the active layer distal to the substrate. The first electrode layer and the second gate electrode are located in the same layer.

公开(公告)号：US10748938B2

公开(公告)日：2020-08-18

申请号：US16134201

申请日：2018-09-18

Applicant: BOE Technology Group Co., Ltd.

Inventor： Tianmin Zhou ,  Wei Yang ,  Lizhong Wang ,  Jipeng Song

IPC: H01L21/00 ,  H01L27/12 ,  H01L21/30 ,  H01L29/786

Abstract: an array substrate, a method of manufacturing the array substrate, and a display device are provided. The array substrate includes: a base substrate; a first thin film transistor and a second thin film transistor on the base substrate, wherein the first thin film transistor comprises a first active layer, the second thin film transistor comprises a second active layer, and the second active layer is on a side of the first active layer away from the base substrate; and an interlayer dielectric layer and a first buffer layer between the first active layer and the second active layer, wherein the interlayer dielectric layer is capable of supplying hydrogen and the first buffer layer is capable of blocking hydrogen.

公开(公告)号：US20220344480A1

公开(公告)日：2022-10-27

申请号：US17755380

申请日：2021-05-19

Applicant: BOE Technology Group Co., Ltd.

Inventor： Lizhong Wang ,  Ce Ning ,  Hehe Hu ,  Tianmin Zhou ,  Jipeng Song

IPC: H01L29/417 ,  H01L29/786

Abstract: The present disclosure provides a thin film transistor, a GOA circuit and an array substrate, the thin film transistor including a source electrode, including a source electrode wiring and a plurality of source electrode branches; a drain electrode, including a drain electrode wiring and a plurality of drain electrode branches; a gate; a semiconductor layer including a plurality of semiconductor branches; a plurality of source electrode branches. The plurality of drain electrode branches are in contact with the plurality of semiconductor branches and are divided into a plurality of cells; the source electrode wiring and the drain electrode wiring are arranged in a parallel and spaced apart, and the number m of one of the source electrode wiring and the drain electrode wiring is an integer greater than or equal to 2, and the number n of the other is an integer greater than or equal to 1.

公开(公告)号：US11296249B2

公开(公告)日：2022-04-05

申请号：US16812764

申请日：2020-03-09

Applicant: BOE Technology Group Co., Ltd.

Inventor： Tianmin Zhou ,  Rui Huang ,  Lizhong Wang ,  Jipeng Song ,  Tao Yang ,  Zhaohui Qiang

IPC: H01L31/101 ,  H01L31/11 ,  H01L31/0224 ,  H01L31/0236 ,  H01L31/0392

Abstract: A photosensitive device, a manufacturing method thereof, a detection substrate and an array substrate are provided. The photosensitive device is formed on a substrate, and it includes a photosensitive element and a thin film transistor. The photosensitive element includes a first electrode layer on the substrate; a second electrode layer on a side of the first electrode layer distal to the substrate; and a photoelectric conversion layer between the first electrode layer and the second electrode layer. The thin film transistor is electrically connected to the photosensitive element, and it includes a first gate electrode on the substrate; an active layer on a side of the first gate electrode distal to the substrate; and a second gate electrode on a side of the active layer distal to the substrate. The first electrode layer and the second gate electrode are located in the same layer.