公开(公告)号：US20230047451A1

公开(公告)日：2023-02-16

申请号：US17974408

申请日：2022-10-26

Applicant: Applied Materials, Inc.

Inventor： Nitin PATHAK ,  Amit Kumar BANSAL ,  Tuan Anh NGUYEN ,  Thomas RUBIO ,  Badri N. RAMAMURTHI ,  Juan Carlos ROCHA-ALVAREZ

IPC: C23C16/458 ,  C23C16/455 ,  C23C16/44

Abstract: Aspects of the present disclosure relate generally to isolator devices, components thereof, and methods associated therewith for substrate processing chambers. In one implementation, a substrate processing chamber includes an isolator ring disposed between a pedestal and a pumping liner. The isolator ring includes a first surface that faces the pedestal, the first surface being disposed at a gap from an outer circumferential surface of the pedestal. The isolator ring also includes a second surface that faces the pumping liner and a protrusion that protrudes from the first surface of the isolator ring and towards the outer circumferential surface of the pedestal. The protrusion defines a necked portion of the gap between the pedestal and the isolator ring.

公开(公告)号：US20220064797A1

公开(公告)日：2022-03-03

申请号：US17403056

申请日：2021-08-16

Applicant: Applied Materials, Inc.

Inventor： Akshay DHANAKSHIRUR ,  Juan Carlos ROCHA-ALVAREZ ,  Kaushik Comandoor ALAYAVALLI ,  Jay D. PINSON, II ,  Rick KUSTRA ,  Badri N. RAMAMURTHI ,  Anup Kumar SINGH ,  Ganesh BALASUBRAMANIAN ,  Bhaskar KUMAR ,  Vinayak Vishwanath HASSAN ,  Canfeng LAI ,  Kallol BERA ,  Sathya Swaroop GANTA

IPC: C23C16/455 ,  H01J37/32

Abstract: A lid for a process chamber includes a plate having a first surface and a second surface opposite the first surface. The first surface has a recess and a seal groove formed in the first surface and surrounding the recess. The lid further includes an array of holes extending from the recess to the second surface.

公开(公告)号：US20240368756A1

公开(公告)日：2024-11-07

申请号：US18744079

申请日：2024-06-14

Applicant: Applied Materials, Inc.

Inventor： Yuxing ZHANG ,  Tuan Anh (Mike) NGUYEN ,  Amit Kumar BANSAL ,  Nitin PATHAK ,  Saket RATHI ,  Thomas RUBIO ,  Udit Suryakant KOTAGI ,  Badri N. RAMAMURTHI ,  Dharma Ratnam SRICHURNAM

IPC: C23C16/44 ,  C23C16/455

Abstract: The present disclosure relates to cleaning assemblies, components thereof, and methods associated therewith for substrate processing chambers. In one example, a method includes positioning a pedestal disposed in a substrate processing chamber in a first vertical position for a first time period, directing cleaning fluid into the internal volume of the substrate processing chamber located above the faceplate, diverting a portion of the cleaning fluid to the distribution ring and into the internal volume located below the faceplate by opening up the isolation valve, and positioning the pedestal in one or more additional vertical positions while the isolation valve is opened, the one or more additional vertical positions being different than the first vertical position.

公开(公告)号：US20210002763A1

公开(公告)日：2021-01-07

申请号：US16896982

申请日：2020-06-09

Applicant: Applied Materials, Inc.

Inventor： Nitin PATHAK ,  Amit Kumar BANSAL ,  Tuan Anh NGUYEN ,  Thomas RUBIO ,  Badri N. RAMAMURTHI ,  Juan Carlos ROCHA-ALVAREZ

IPC: C23C16/458 ,  C23C16/455

Abstract: Aspects of the present disclosure relate generally to isolator devices, components thereof, and methods associated therewith for substrate processing chambers. In one implementation, a substrate processing chamber includes an isolator ring disposed between a pedestal and a pumping liner. The isolator ring includes a first surface that faces the pedestal, the first surface being disposed at a gap from an outer circumferential surface of the pedestal. The isolator ring also includes a second surface that faces the pumping liner and a protrusion that protrudes from the first surface of the isolator ring and towards the outer circumferential surface of the pedestal. The protrusion defines a necked portion of the gap between the pedestal and the isolator ring.