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公开(公告)号：US10095128B2
公开(公告)日：2018-10-09
申请号：US15528187
申请日：2015-11-24
Applicant: ASML NETHERLANDS B.V.
Inventor： Theodorus Petrus Maria Cadee , Benjamin Joseph De Smet , Sjoerd Nicolaas Lambertus Donders , Adrianus Marinus Verdonck
Abstract: A method of thermally conditioning a physical object, includes guiding a two-phase cooling medium through a cooling duct of the physical object, wherein the guiding includes: guiding the two-phase cooling medium in a liquid phase via a pre-heating duct of the physical object from a supply side of the physical object at least partly towards a discharging side of the physical object, the two-phase cooling medium being pre-heated in the pre-heating duct; guiding the two-phase cooling medium from the pre-heating duct to a phase transitioning duct of the physical object, the two-phase cooling medium at least partly transitioning from the liquid phase towards a gas phase in the phase transitioning duct; guiding the two-phase cooling medium from the phase transitioning duct to a discharging duct of the physical object; and discharging at the discharging side the two-phase cooling medium from the discharging duct.
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2.发明授权公开(公告)号：US10012914B2
公开(公告)日：2018-07-03
申请号：US15505885
申请日：2015-07-20
Applicant: ASML NETHERLANDS B.V.
Inventor： Johannes Antonius Gerardus Akkermans , Ruud Antonius Catharina Maria Beerens , Sander Christiaan Broers , Jeroen Johannes Theodorus Hendrikus De Best , Adrianus Marinus Wouter Heeren , George Alois Leonie Leenknegt , Bo Lenssen , Hendrikus Johannes Schellens , Peter Van Der Krieken , Theodorus Petrus Maria Cadee , Jan Van Eijk , Richard Henricus Adrianus Van Lieshout
Abstract: A sensor includes two shear-mode piezoelectric transducers, wherein each piezoelectric transducer has a bottom surface and a top surface, wherein the top surfaces of the piezoelectric transducers are rigidly connected to each other, and wherein the bottom surfaces of the piezoelectric transducers are configured to be attached to an object to be measured.
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公开(公告)号：US09470969B2
公开(公告)日：2016-10-18
申请号：US13686186
申请日：2012-11-27
Applicant: ASML Netherlands B.V.
IPC: G03B27/58 , H01L21/683 , G03F7/20
CPC classification number: G03B27/58 , G03F7/2051 , G03F7/707 , G03F7/70708 , H01L21/683
Abstract: A support for an object, e.g., a semiconductor substrate, includes a main body having a surface configured and arranged to have a plurality of projections. Each of the projections has an associated electrostatic actuator for displacing a free end of the associated projection relative to the main body at least in a direction in a plane parallel to a main surface of the object.
Abstract translation: 对象（例如半导体衬底）的支撑件包括主体，该主体具有被配置和布置成具有多个突起的表面。 每个突起具有相关联的静电致动器，用于至少沿平行于物体的主表面的平面中的方向相对于主体移动相关联的突起的自由端。
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4.发明授权Lithographic apparatus comprising a support for holding an object, and a support for use therein 有权光刻设备包括用于保持物体的支撑件和用于其中的支撑件公开(公告)号：US09195150B2
公开(公告)日：2015-11-24
申请号：US14377141
申请日：2013-02-04
Applicant: ASML Netherlands B.V.
Inventor： Theodorus Petrus Maria Cadee , Vadim Yevgenyevich Banine , Koen Jacobus Johannes Maria Zaal , Ramin Badie , Harmeet Singh
IPC: G03B27/58 , G03F7/20 , H01L21/687
CPC classification number: G03F7/70725 , G03F7/70708 , G03F7/70733 , H01L21/6875
Abstract: A lithographic apparatus has a support that is provided with burls for holding an object. The support has been fabricated with a lithographic manufacturing method, e.g., a MEMS-technology, so as to create burls whose orientations or positions are individually electrically controllable.
Abstract translation: 光刻设备具有一个支撑件，该支撑件设置有用于保持物体的毛刺。 已经利用诸如MEMS技术的光刻制造方法来制造支撑件，以便产生其取向或位置可单独地电可控制的孔。
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5.发明申请LITHOGRAPHIC APPARATUS COMPRISING AN ACTUATOR, AND METHOD FOR PROTECTING SUCH ACTUATOR 有权包括执行器的平面设备和用于保护执行器的方法公开(公告)号：US20150070678A1
公开(公告)日：2015-03-12
申请号：US14395454
申请日：2013-04-12
Applicant: ASML NETHERLANDS B.V.
Inventor： Theodorus Petrus Maria Cadee , Sander Christiaan Broers , Sven Antoin Johan Hol , Yang-Shan Huang , Antonius Franciscus Johannes De Groot , Bastiaan Lambertus Wilhelmus Marinus Van De Ven
IPC: G03F7/20
CPC classification number: G03F7/70766 , G03F7/70533 , G03F7/70758 , G03F7/709
Abstract: A lithographic apparatus comprises a system. The system comprises a first part, a second part and an energy absorbing element. The second part is configured to move relatively to the first part. The system has a gap located between the first part and the second part during an operation mode of the system. The energy absorbing element is for absorbing energy between the first part and the second part when the first part and the second part crash onto each other in a failure mode of the system. The energy absorbing element is outside the gap.
Abstract translation: 光刻设备包括一个系统。 该系统包括第一部分，第二部分和能量吸收元件。 第二部分被配置为相对于第一部分移动。 该系统在系统的操作模式期间具有位于第一部分和第二部分之间的间隙。 当第一部分和第二部分在系统的故障模式下彼此碰撞时，能量吸收元件用于在第一部分和第二部分之间吸收能量。 能量吸收元件在间隙之外。
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Patent Agency Ranking
公开(公告)号：US20140340666A1
公开(公告)日：2014-11-20
申请号：US14357530
申请日：2012-12-05
Applicant: ASML NETHERLANDS B.V.
Inventor： Hans Butler , Arno Jan Bleeker , Pieter Renaat Marie Hennus , Martinus Hendricus Henricus Hoeks , Sven Antoin Johan Hol , Harmen Klaas Van Der Schoot , Bernardus Antonius Slaghekke , Patricius Aloysius Jacobus Tinnemans , Marc Wilhelmus Maria Van Der Wijst , Koen Jacobus Johannes Maria Zaal , Theodorus Petrus Maria Cadee , Ruud Antonius Catharina Maria Beerens , Olof Martinus Josephus Fischer , Wilhelmus Henricus Theodorus Maria Aangenent , Niels Johannes Maria Bosch
IPC: G03F7/20
CPC classification number: G03F7/70258 , G03F7/70275 , G03F7/70366 , G03F7/70391 , G03F7/704 , G03F7/70558 , G03F7/70816 , G03F7/709
Abstract: An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.
Abstract translation: 一种曝光装置，包括被配置为将多个辐射束投影到目标上的投影系统; 至少可绕轴旋转的可移动框架; 以及致动器系统，其构造成将可移动框架移动到远离与可移动框架的几何中心对应的轴线的轴线上，并使框架围绕通过框架的质心的轴线旋转。
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公开(公告)号：US09726985B2
公开(公告)日：2017-08-08
申请号：US14376210
申请日：2013-01-25
Inventor： Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Antonius Franciscus Johannes De Groot , Johannes Petrus Martinus Bernardus Vermeulen , Theodorus Petrus Maria Cadee , Robertus Mathijs Gerardus Rijs , Richard Henricus Adrianus Van Lieshout
CPC classification number: G03F7/70716 , G03F7/70758 , G03F7/709 , H02K41/02
Abstract: A movable stage system is configured to support an object subjected to a lithography process. A short stroke part (SS) is configured to support the object (W) and a long stroke part (LS) is configured to support the short stroke part. The short stroke part is movable over a relative small range of movement with respect to the long stroke part. The long stroke part is movable over a relative large range of movement with respect to a base support arranged to support the long stroke part. A shielding element (SE) is arranged between the short and long stroke parts. A position control system (PCS) maintains a substantially constant distance between the shielding element and the short stroke part.
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公开(公告)号：US20140375975A1
公开(公告)日：2014-12-25
申请号：US14376210
申请日：2013-01-25
Inventor： Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Antonius Franciscus Johannes De Groot , Johannes Petrus Martinus Bernardus Vermeulen , Theodorus Petrus Maria Cadee , Robertus Mathijs Gerardus Rijs , Richard Henricus Adrianus Van Lieshout
CPC classification number: G03F7/70716 , G03F7/70758 , G03F7/709 , H02K41/02
Abstract: A movable stage system is configured to support an object subjected to a lithography process. A short stroke part (SS) is configured to support the object (W) and a long stroke part (LS) is configured to support the short stroke part. The short stroke part is movable over a relative small range of movement with respect to the long stroke part. The long stroke part is movable over a relative large range of movement with respect to a base support arranged to support the long stroke part. A shielding element (SE) is arranged between the short and long stroke parts. A position control system (PCS) maintains a substantially constant distance between the shielding element and the short stroke part.
Abstract translation: 可移动台系统被配置为支撑经受光刻处理的物体。 短行程部件（SS）被配置为支撑物体（W），并且长行程部件（LS）被配置为支撑短行程部件。 短行程部分可以相对于长行程部分在相对较小的移动范围内移动。 长行程部件可相对于布置成支撑长行程部件的基座支撑件在相对较大的运动范围内移动。 屏蔽元件（SE）设置在短行程部件和长行程部件之间。 位置控制系统（PCS）在屏蔽元件和短行程部件之间保持基本恒定的距离。
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公开(公告)号：US20140340659A1
公开(公告)日：2014-11-20
申请号：US14375457
申请日：2013-01-25
Applicant: ASML Netherlands B.V.
Inventor： Jan Bernard Plechelmus Van Schoot , Adrianus Hendrik Koevoets , Theodorus Petrus Maria Cadee , Sjoerd Nicolaas Lambertus Donders , Koen Jacobus Johannes Maria Zaal
IPC: G03F7/20
CPC classification number: G03F7/70891 , G03F7/70266 , G03F7/70775 , G03F7/70833 , G03F7/7085 , G03F7/70858
Abstract: A lithographic apparatus component, such as a metrology system or an optical element (e.g., a mirror) is provided with a temperature control system for controlling deformation of the component. The control system includes channels provided close to a surface of the component through which a two phase cooling medium is supplied. The metrology system measures a position of at least a moveable item with respect to a reference position and includes a metrology frame connected to the reference position. An encoder is connected to the moveable item and constructed and arranged to measure a relative position of the encoder with respect to a reference grid. The reference grid may be provided directly on a surface of the metrology frame. A lithographic projection apparatus may have the metrology system for measuring a position of the substrate table with respect to the projection system.
Abstract translation: 光刻设备部件如测量系统或光学元件（例如，反射镜）设置有用于控制部件变形的温度控制系统。 控制系统包括靠近组件的表面设置的通道，通过该通道提供两相冷却介质。 计量系统测量相对于参考位置的至少可移动项目的位置，并且包括连接到参考位置的计量框架。 编码器连接到可移动项目，并被构造和布置成测量编码器相对于参考网格的相对位置。 参考网格可以直接设置在计量框架的表面上。 平版印刷设备可以具有用于测量衬底台相对于投影系统的位置的计量系统。
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公开(公告)号：US20130162966A1
公开(公告)日：2013-06-27
申请号：US13687524
申请日：2012-11-28
Applicant: ASML Netherlands B.V.
Inventor： Ruud Antonius Catharina Maria BEERENS , Engelbertus Antonius Fransiscus Van Der Pasch , Johannes Petrus Martinus Bernardus Vermeulen , Theodorus Petrus Maria Cadee , Raymond Wilhelmus Louis Lafarre
CPC classification number: G01B11/14 , G03F7/70008 , G03F7/70775
Abstract: A displacement measurement system comprising at least one retro reflector and a diffraction grating. Said displacement measurement system is constructed and arranged to measure a displacement by providing a first beam of radiation to the measurement system, wherein the diffraction grating is arranged to diffract the first beam of radiation a first time to form diffracted beams. The at least one retro reflector is arranged to subsequently redirect the diffracted beams to diffract a second time on the diffraction grating. The at least one retro reflector is arranged to redirect the diffraction beams to diffract at least a third time on the diffraction grating before the diffracted beams are being recombined to form a second beam. And the displacement system is provided with a sensor configured to receive the second beam and determine the displacement from an intensity of the second beam.
Abstract translation: 一种位移测量系统，包括至少一个回射反射器和衍射光栅。 所述位移测量系统被构造和布置成通过向测量系统提供第一辐射束来测量位移，其中衍射光栅被布置成第一次衍射第一辐射束以形成衍射光束。 所述至少一个回射反射器被布置成随后重定向衍射光束以在衍射光栅上第二次衍射。 所述至少一个回射反射器被布置成在衍射光束被重新组合以形成第二光束之前将衍射光束重定向至少在衍射光栅上衍射至少三次。 并且位移系统设置有被配置为接收第二光束并且从第二光束的强度确定位移的传感器。
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