公开(公告)号：US20160033860A1

公开(公告)日：2016-02-04

申请号：US14775249

申请日：2014-03-04

Applicant: ASML NETHERLANDS B.V.

Inventor： James Norman WILEY ,  Juan Diego ARIAS ESPINOZA ,  Derk Servatius Gertruda BROUNS ,  Laurentius Cornelius DE WINTER ,  Florian Didier Albin DHALLUIN ,  Pedro Julian RIZO DIAGO ,  Luigi SCACCABAROZZI

IPC: G03F1/64

CPC classification number: G03F1/64 ,  G03F1/62 ,  G03F7/70908 ,  G03F7/70983

Abstract: The present invention is concerned with an apparatus for shielding a reticle for EUV lithography. The apparatus comprises a pellicle, and at least one actuator in communication with the pellicle, the actuator being configured to induce, in use, movement of the pellicle with respect to a reticle.

Abstract translation: 本发明涉及用于屏蔽用于EUV光刻的掩模版的装置。 该装置包括防护薄膜组件和至少一个与防护薄膜组件连通的致动器，所述致动器构造成在使用中诱导防护薄膜相对于掩模版的运动。

公开(公告)号：US20190146332A1

公开(公告)日：2019-05-16

申请号：US16247179

申请日：2019-01-14

Applicant: ASML Netherlands B.V.

Inventor： Pieter-Jan VAN ZWOL ,  Vadim Yevgenyevich BANINE ,  Jozef Petrus Henricus BENSCHOP ,  Florian Didier Albin DHALLUIN ,  Mária PÉTER ,  Luigi SCACCABAROZZI ,  Willem Joan VAN DER ZANDE

IPC: G03F1/62 ,  G03F1/38 ,  G03F1/24 ,  G02B5/18 ,  G03F7/20 ,  G02B5/20

Abstract: A membrane transmissive to EUV radiation, which may be used as a pellicle or spectral filter in a lithographic apparatus. The membrane has one or more high doped regions wherein the membrane is doped with a dopant concentration greater than 1017 cm−3, and one or more regions with low (or no) doping. The membrane may have a main substrate having low doping and one or more additional layers, wherein the high doped regions are within some or all of the additional layers.

公开(公告)号：US20180246414A1

公开(公告)日：2018-08-30

申请号：US15753811

申请日：2016-08-02

Applicant: ASML Netherlands B.V.

Inventor： Vadim Yevgenyevich BANINE ,  Han-Kwang NIENHUYS ,  Luigi SCACCABAROZZI

IPC: G03F7/20 ,  H05G2/00 ,  G02B27/42 ,  G02B5/18

Abstract: Disclosed is a suppression filter having a profile defining at least two reflective surface levels, each reflected surface level being separated by a separation distance. The separation distance is such that the reflective suppression filter is operable to substantially prevent specular reflection of radiation at a first wavelength and at a second wavelength incident on said reflective suppression filter. Also disclosed is a radiation collector, radiation source and lithographic apparatus comprising such a suppression filter, and to a method of determining a separation distance between at least two reflective surface levels of a suppression filter.

公开(公告)号：US20170205704A1

公开(公告)日：2017-07-20

申请号：US15320749

申请日：2015-07-02

Applicant: ASML Netherlands B.V.

Inventor： Andrey Alexandrovich NIKIPELOV ,  Vadim Yevgenyevich BANINE ,  Jozef Petrus Henricus BENSCHOP ,  Arjen BOOGAARD ,  Florian Didier Albin DHALLUIN ,  Alexey Sergeevich KUZNETSOV ,  Mária PÉTER ,  Luigi SCACCABAROZZI ,  Willem Joan VAN DER ZANDE ,  Pieter-Jan VAN ZWOL ,  Andrei Mikhailovich YAKUNIN

IPC: G03F1/62 ,  G02B5/20 ,  G03F1/38 ,  G02B5/18 ,  G03F1/24 ,  G03F7/20

CPC classification number: G03F1/62 ,  G02B5/1838 ,  G02B5/208 ,  G03F1/24 ,  G03F1/38 ,  G03F7/70191 ,  G03F7/70316 ,  G03F7/70575 ,  G03F7/70891 ,  G03F7/70916 ,  G03F7/70958 ,  G03F7/70983

Abstract: A membrane transmissive to EUV radiation, which may be used as a pellicle or spectral filter in a lithographic apparatus. The membrane includes one or more high doped regions wherein the membrane is doped with a dopant concentration greater than 1017 cm−3, and one or more regions with low (or no) doping. The membrane may have a main substrate having low doping and one or more additional layers, wherein the high doped regions are comprised within some or all of the additional layers.