公开(公告)号：US20160033860A1

公开(公告)日：2016-02-04

申请号：US14775249

申请日：2014-03-04

Applicant: ASML NETHERLANDS B.V.

Inventor： James Norman WILEY ,  Juan Diego ARIAS ESPINOZA ,  Derk Servatius Gertruda BROUNS ,  Laurentius Cornelius DE WINTER ,  Florian Didier Albin DHALLUIN ,  Pedro Julian RIZO DIAGO ,  Luigi SCACCABAROZZI

IPC: G03F1/64

CPC classification number: G03F1/64 ,  G03F1/62 ,  G03F7/70908 ,  G03F7/70983

Abstract: The present invention is concerned with an apparatus for shielding a reticle for EUV lithography. The apparatus comprises a pellicle, and at least one actuator in communication with the pellicle, the actuator being configured to induce, in use, movement of the pellicle with respect to a reticle.

Abstract translation: 本发明涉及用于屏蔽用于EUV光刻的掩模版的装置。 该装置包括防护薄膜组件和至少一个与防护薄膜组件连通的致动器，所述致动器构造成在使用中诱导防护薄膜相对于掩模版的运动。