- 专利标题: Layout pattern for static random access memory
-
申请号: US15233961申请日: 2016-08-11
-
公开(公告)号: US09780099B1公开(公告)日: 2017-10-03
- 发明人: Shu-Wei Yeh , Tsung-Hsun Wu , Chih-Ming Su , Zhi-Xian Chou
- 申请人: UNITED MICROELECTRONICS CORP.
- 申请人地址: TW Hsin-Chu
- 专利权人: UNITED MICROELECTRONICS CORP.
- 当前专利权人: UNITED MICROELECTRONICS CORP.
- 当前专利权人地址: TW Hsin-Chu
- 代理商 Winston Hsu
- 优先权: TW105121078A 20160704
- 主分类号: G11C11/04
- IPC分类号: G11C11/04 ; H01L27/11 ; H01L29/78 ; H01L27/02 ; G11C11/412
摘要:
A layout pattern of a static random access memory includes a pull-up device, a first pull-down device, a second pull-up device, a second pull-down device, a first pass gate device, a second pass gate device, a third pass gate device and a fourth pass gate device disposed on a substrate. A plurality of fin structures is disposed on the substrate, the fin structures including at least one first fin structure and at least one second fin structure. A step-shaped structure is disposed on the substrate, including a first part, a second part and a bridge part. A first extending contact feature crosses over the at least one first fin structure and the at least one second fin structure.
信息查询