发明授权
- 专利标题: Metal material for electronic component and method for manufacturing the same
- 专利标题(中): 电子元件用金属材料及其制造方法
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申请号: US14346025申请日: 2012-09-10
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公开(公告)号: US09576693B2公开(公告)日: 2017-02-21
- 发明人: Yoshitaka Shibuya , Kazuhiko Fukamachi , Atsushi Kodama
- 申请人: Yoshitaka Shibuya , Kazuhiko Fukamachi , Atsushi Kodama
- 申请人地址: JP Tokyo
- 专利权人: JX Nippon Mining & Metals Corporation
- 当前专利权人: JX Nippon Mining & Metals Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Drinker Biddle & Reath LLP
- 优先权: JP2011-205371 20110920; JP2012-033265 20120217
- 国际申请: PCT/JP2012/073095 WO 20120910
- 国际公布: WO2013/042572 WO 20130328
- 主分类号: B32B15/00
- IPC分类号: B32B15/00 ; H01B1/02 ; B32B15/01 ; C25D5/10 ; C22C5/06 ; C22C5/08 ; C22C5/10 ; C22C9/00 ; C22C9/02 ; C22C9/04 ; C22C13/00 ; C22C19/03 ; C22C19/07 ; C22C22/00 ; C22C27/06 ; C22C38/00 ; C22C13/02 ; H05K3/24 ; C25D5/50 ; C25D5/12 ; C23C18/16 ; H05K1/11 ; H01R13/03 ; C25D3/12 ; C25D3/20 ; C25D3/30 ; C25D3/38 ; C25D3/46 ; C25D3/50 ; C25D3/56 ; C25D3/62 ; C25D3/64
摘要:
There are provided a metal material for electronic component which has low insertability/extractability, low whisker formability, and high durability, and a method for manufacturing the metal material. The metal material 10 for electronic components has a base material 11, an A layer 14 constituting a surface layer on the base material 11 and formed of Sn, In or an alloy thereof, and a B layer 13 constituting a middle layer provided between the base material 11 and the A layer 14 and formed of Ag, Au, Pt, Pd, Ru, Rh, Os, Ir or an alloy thereof, wherein the surface layer (A layer) 14 has a thickness of 0.002 to 0.2 μm, and the middle layer (B layer) 13 has a thickness of 0.001 to 0.3 μm.
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