Invention Application
- Patent Title: ELECTRON BEAM PLASMA SOURCE WITH REDUCED METAL CONTAMINATION
- Patent Title (中): 具有减少金属污染的电子束等离子体源
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Application No.: US13912488Application Date: 2013-06-07
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Publication No.: US20140338835A1Publication Date: 2014-11-20
- Inventor: Leonid Dorf , Shahid Rauf , Kenneth S. Collins , Kartik Ramaswamy , Nipun Misra , Gonzalo Antonio Monroy , James D. Carducci , Steven Lane
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Main IPC: H05H1/02
- IPC: H05H1/02
Abstract:
In a plasma reactor for processing a workpiece, an electron beam is employed as the plasma source, and sputtered metal atoms are removed from the electron beam to reduce contamination.
Public/Granted literature
- US09721760B2 Electron beam plasma source with reduced metal contamination Public/Granted day:2017-08-01
Information query
IPC分类:
