- 专利标题: Lateral fin static induction transistor
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申请号: US17061459申请日: 2020-10-01
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公开(公告)号: US11978789B2公开(公告)日: 2024-05-07
- 发明人: Biqin Huang
- 申请人: HRL Laboratories, LLC
- 申请人地址: US CA Malibu
- 专利权人: HRL LABORATORIES, LLC
- 当前专利权人: HRL LABORATORIES, LLC
- 当前专利权人地址: US CA Malibu
- 代理机构: Ladas & Parry, LLP
- 分案原申请号: US15896048 2018.02.13
- 主分类号: H01L21/761
- IPC分类号: H01L21/761 ; H01L29/06 ; H01L29/08 ; H01L29/10 ; H01L29/16 ; H01L29/165 ; H01L29/167 ; H01L29/66 ; H01L29/772 ; H01L29/812 ; H01L29/78
摘要:
Presented is a lateral fin static induction transistor including a semi conductive substrate, source and drain regions extending from an optional buffer layer of same or varied thickness supported by the semi conductive substrate, a semi conductive channel electrically coupling the source region to the drain region of the transistor, a portion of the semi conductive channel being a fin and having a face covered by a gated structure, thereby defining a gated channel within the semi conductive channel, the semi conductive channel further including a drift region electrically coupling the gated channel to the drain region of the transistor.
公开/授权文献
- US20210028302A1 LATERAL FIN STATIC INDUCTION TRANSISTOR 公开/授权日:2021-01-28
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