Invention Grant
- Patent Title: Physical vapor deposition (PVD) chamber with in situ chamber cleaning capability
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Application No.: US16438560Application Date: 2019-06-12
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Publication No.: US11289312B2Publication Date: 2022-03-29
- Inventor: Adolph M. Allen , Vanessa Faune , Zhong Qiang Hua , Kirankumar Neelasandra Savandaiah , Anantha K. Subramani , Philip A. Kraus , Tza-Jing Gung , Lei Zhou , Halbert Chong , Vaibhav Soni , Kishor Kalathiparambil
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Moser Taboada
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H01J37/34 ; C23C16/455 ; C23C14/54

Abstract:
Embodiments of process kit shields and process chambers incorporating same are provided herein. In some embodiments a process kit configured for use in a process chamber for processing a substrate includes a shield having a cylindrical body having an upper portion and a lower portion; an adapter section configured to be supported on walls of the process chamber and having a resting surface to support the shield; and a heater coupled to the adapter section and configured to be electrically coupled to at least one power source of the processes chamber to heat the shield.
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