Invention Grant
- Patent Title: Graphene channel silicon carbide power semiconductor transistor
-
Application No.: US16486494Application Date: 2018-09-25
-
Publication No.: US11158708B1Publication Date: 2021-10-26
- Inventor: Weifeng Sun , Siyang Liu , Lizhi Tang , Sheng Li , Chi Zhang , Jiaxing Wei , Shengli Lu , Longxing Shi
- Applicant: SOUTHEAST UNIVERSITY
- Applicant Address: CN Jiangsu
- Assignee: SOUTHEAST UNIVERSITY
- Current Assignee: SOUTHEAST UNIVERSITY
- Current Assignee Address: CN Jiangsu
- Agency: JCIPRNET
- Priority: CN201810682926.1 20180627
- International Application: PCT/CN2018/107329 WO 20180925
- International Announcement: WO2020/000713 WO 20200102
- Main IPC: H01L29/16
- IPC: H01L29/16 ; H01L29/78 ; H01L29/06

Abstract:
The invention provides a graphene channel silicon carbide power semiconductor transistor, and its cellular structure thereof. Characterized in that, a graphene strip serving as a channel is embedded in a surface of the P-type body region and two ends of the graphene strip are respectively contacted with a boundary between the N+-type source region and the P-type body region and a boundary between the P-type body region and the N-type drift region, and the graphene strip is distributed in a cellular manner in a gate width direction, a conducting channel of a device is still made of graphene; in the case of maintaining basically invariable on-resistance and current transmission capacity, the P-type body regions are separated by the graphene strip, thus enhancing a function of assisting depletion, which further reduces an overall off-state leakage current of the device, and improves a breakdown voltage.
Public/Granted literature
- US20210336009A1 GRAPHENE CHANNEL SILICON CARBIDE POWER SEMICONDUCTOR TRANSISTOR Public/Granted day:2021-10-28
Information query
IPC分类: