- 专利标题： Plasma processing reactor with a magnetic electron-blocking filter external of the chamber and uniform field within the chamber
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申请号： US14832280申请日： 2015-08-21
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公开(公告)号： US10784085B2公开(公告)日： 2020-09-22
- 发明人: Kartik Ramaswamy , Kenneth S. Collins , Steven Lane , Yang Yang , Lawrence Wong
- 申请人： APPLIED MATERIALS, INC.
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 代理机构： Fish & Richardson P.C.
- 主分类号： H05H1/12
- IPC分类号： H05H1/12 ; H01J37/32
摘要：
An external magnetic filter to trap electrons surrounds a reactor chamber and has multiple magnets arranged in a circle, the magnetic orientation of each individual magnet being rotated relative to the orientation of the adjacent individual magnet by a difference angle that is a function of the arc subtended by the individual magnet.
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