- 专利标题: Semiconductor device
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申请号: US15792772申请日: 2017-10-25
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公开(公告)号: US10128345B2公开(公告)日: 2018-11-13
- 发明人: Ryoichi Kato , Hiromichi Gohara , Takafumi Yamada , Kohei Yamauchi , Tatsuhiko Asai , Yoshitaka Nishimura , Akio Kitamura , Hajime Masubuchi , Souichi Yoshida
- 申请人: FUJI ELECTRIC CO., LTD.
- 申请人地址: JP Kanagawa
- 专利权人: FUJI ELECTRIC CO., LTD.
- 当前专利权人: FUJI ELECTRIC CO., LTD.
- 当前专利权人地址: JP Kanagawa
- 优先权: JP2016-239144 20161209
- 主分类号: H01L29/423
- IPC分类号: H01L29/423 ; H01L23/492 ; H01L23/367 ; H01L23/28 ; H01L29/739 ; H01L23/00
摘要:
A semiconductor device including a semiconductor element, an upper-surface electrode provided on an upper surface of the semiconductor element, a plated layer provided on an upper surface of the upper-surface electrode, one or more gate runners penetrating the plated layer and provided to extend in a predetermined direction on the upper surface of the semiconductor element, and a metal connecting plate that is arranged above the plated layer and is electrically connected to the upper-surface electrode, wherein the metal connecting plate has a joint portion parallel to the upper surface of the semiconductor element and has a rising portion that is connected to a first end of the joint portion and extends in a direction away from the upper surface of the semiconductor element, and in a plane parallel to the upper surface of the semiconductor element, the rising portion and the gate runner do not overlap with each other.
公开/授权文献
- US20180166549A1 SEMICONDUCTOR DEVICE 公开/授权日:2018-06-14
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