A lithographic apparatus comprising: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a liquid supply system configured to at least partly fill a space between a final element of said projection system and said substrate with liquid; a seal member arranged substantially to contain said liquid within said space between said final element of the projection system and said substrate; and elements to control and/or compensate for evaporation of immersion liquid from said substrate.