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公开(公告)号：US12070347B2
公开(公告)日：2024-08-27
申请号：US18228236
申请日：2023-07-31
IPC分类号： A61B6/00 , G21K1/10 , H05G1/58 , H05G1/60 , A61B6/04 , A61B6/50 , G01N23/00 , G01N23/04 , H01J35/04
CPC分类号： A61B6/484 , A61B6/482 , G21K1/10 , H05G1/58 , H05G1/60 , A61B6/04 , A61B6/50 , A61B6/54 , G01N23/00 , G01N23/04 , H01J35/045
摘要： A system can have an x-ray source that generates a series of individual x-ray pulses for multi-energy imaging. A first x-ray pulse can have a first energy level and a subsequent second x-ray pulse in the series can have a second energy level different from the first energy level. An x-ray imager can receive the x-rays from the x-ray source and can detect the received x-rays for image generation. A generator interface box (GIB) controls the x-ray source to provide the series of individual x-ray pulses and synchronizes detection by the x-ray imager with generation of the individual x-ray pulses. The GIB can control x-ray pulse generation and synchronization to optimize image generation while minimizing unnecessary x-ray irradiation.
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2.发明公开公开(公告)号：US20240221970A1
公开(公告)日：2024-07-04
申请号：US18004864
申请日：2021-07-01
申请人： UNIVERSITE D’AIX MARSEILLE , CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE , UNIVERSITE DE TOULON
发明人： Wilfried Vervisch
IPC分类号： G21K5/04 , G21K1/10 , H01J37/304
CPC分类号： G21K5/04 , G21K1/10 , H01J37/304 , H01J2237/24507
摘要： This method for manufacturing an irradiating head includes:—providing a gun emitting a primary beam of charged particles along a propagation axis, this primary beam having a spatial distribution of charged particles having a median density Dmed1 of charged particles located at a distance d1 from the propagation axis,—the design and manufacture of a sensor capable of measuring the intensity of a beam of charged particles, this sensor comprising:—an outlet face by means of which a secondary beam of charged particles results having a spatial distribution having a median density Dmed2 of charged particles, this median density Dmed2 being located at a distance d2 from the propagation axis, and—a semiconductor layer. The design of the sensor includes selecting a thickness for the semiconductor layer, wherein the distance d2 is twice as large as the distance d1.
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3.发明授权公开(公告)号：US11998372B2
公开(公告)日：2024-06-04
申请号：US17591099
申请日：2022-02-02
摘要： A pre-patient collimator for a CT imaging system is provided. The pre-patient collimator includes an additively manufactured housing having a plurality of walls having a variable thickness along each wall of the plurality of walls. The pre-patient collimator also includes an additively manufactured aperture carrier plate having variable thickness and a plurality of apertures configured to determine a size of an X-ray beam received from an X-ray source of the CT imaging system.
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公开(公告)号：US20230371914A1
公开(公告)日：2023-11-23
申请号：US18228236
申请日：2023-07-31
摘要： A system can have an x-ray source that generates a series of individual x-ray pulses for multi-energy imaging. A first x-ray pulse can have a first energy level and a subsequent second x-ray pulse in the series can have a second energy level different from the first energy level. An x-ray imager can receive the x-rays from the x-ray source and can detect the received x-rays for image generation. A generator interface box (GIB) controls the x-ray source to provide the series of individual x-ray pulses and synchronizes detection by the x-ray imager with generation of the individual x-ray pulses. The GIB can control x-ray pulse generation and synchronization to optimize image generation while minimizing unnecessary x-ray irradiation.
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公开(公告)号：US11676738B2
公开(公告)日：2023-06-13
申请号：US17678035
申请日：2022-02-23
发明人： Tomoya Ishikawa
IPC分类号： G21K1/10 , G02F1/1337 , G02F1/1339
CPC分类号： G21K1/10 , G02F1/1337 , G02F1/1339 , G02F1/133715 , G02F1/133719 , G02F1/133726 , G02F1/133734 , G02F1/133738 , G02F1/133742 , G02F1/133761
摘要： A liquid crystal device includes: an element substrate; a counter substrate disposed opposite to the element substrate; a sealing material disposed between the element substrate and the counter substrate; and a liquid crystal layer disposed on an inner side of the sealing material and containing liquid crystal. The element substrate includes an alignment film configured to align the liquid crystal and an ion-adsorbing first adsorption film disposed in contact with the sealing material. The alignment film includes a first vapor-deposited film and a second vapor-deposited film disposed between the first vapor-deposited film and the liquid crystal layer. The second vapor-deposited film and the first adsorption film include a column of which a long axis direction intersects a thickness direction of the liquid crystal layer. A thickness of the first adsorption film is thicker than a thickness of the second vapor-deposited film.
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公开(公告)号：US20230165549A1
公开(公告)日：2023-06-01
申请号：US18057940
申请日：2022-11-22
发明人： Daisuke SATO , Tomio MAEHAMA
CPC分类号： A61B6/4035 , G21K1/10 , A61B6/5258
摘要： A structure according to an embodiment is disposed between an X-ray emitter and a subject, and includes a scatterer configured to scatter X-rays emitted from the X-ray emitter, and a transmitter configured to transmit X-rays at a predetermined angle, among the X-rays scattered by the scatterer.
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公开(公告)号：US11660359B2
公开(公告)日：2023-05-30
申请号：US17234714
申请日：2021-04-19
发明人： Daniel Shedlock , David Nisius , Gregory Andrews , Jeff Adams
CPC分类号： A61L2/082 , G21K1/10 , G21K5/08 , G21K5/10 , A61L2202/21
摘要： Technology is described to uniformly apply doses of radiation to a target material. An irradiation device may comprise an enclosure configured to receive a target material and a source configured to emit primary radiation within the enclosure. The primary radiation may be configured to irradiate at least a first portion of the target material. The irradiation device may further comprise a scattering medium disposed within the enclosure. The scattering medium may be configured to produce secondary radiation through scatter interactions in response to the primary radiation, the secondary radiation configured to irradiate at least a second portion of the target material. A thickness of the scattering medium relative to the primary radiation may have a thickness of at least 3 millimeters).
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公开(公告)号：US11656188B2
公开(公告)日：2023-05-23
申请号：US16731743
申请日：2019-12-31
发明人： Wendie Patricia Hayler , Mark Rutherford , Marcus A. Jones , Anthony David Kirk , Gilbert Walter Vanorder , Roy Douglas Hudson , Paul Mason , James Termini
IPC分类号： G01N23/04 , G01V5/00 , G21K1/10 , G06F8/61 , G06F9/455 , H04L9/08 , H04L9/30 , H04L9/32 , G01N23/10
CPC分类号： G01N23/04 , G01V5/0016 , G06F8/63 , G06F9/45558 , G21K1/10 , H04L9/0897 , H04L9/30 , H04L9/3234 , G01N23/10 , G01N2223/30 , G01N2223/3307 , G01N2223/643 , G06F2009/45587 , G06F2009/45595
摘要： Systems and methods are provided for scanning an item utilizing an X-ray scanner in order to facilitate a determination of whether the X-ray radiation penetrated through the entirety of the scanned item. Various embodiments comprise a conveying mechanism, an X-ray emitter, a detector, and an X-ray penetration grid (XPG). The XPG may comprise a radiopaque grid that may serve as a reference for determining whether radiation passes through the scanned item, the grid oriented such that the grid members are neither parallel nor perpendicular to the direction of travel. Such orientation may minimize or eliminate “ghosted” radiation signals included in a visual display of the radiation received by the detector. A scanned item may be oriented with the XPG such that radiation emitted by the X-ray emitter that passes through a portion of the scanned item must also pass through the XPG before being received by the detector.
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公开(公告)号：US20220392660A1
公开(公告)日：2022-12-08
申请号：US17760684
申请日：2020-09-15
发明人： Rainer LEBERT , Christoph Sebastian PHIESEL , Thomas MISSALLA , Andreas BIERMANNS-FOETH , Christian PIEL
摘要： A microscope system for flexibly, efficiently and quickly inspecting patterns and defects on extreme ultraviolet (EUV) lithography photomasks. The system includes a stand-alone plasma-based EUV radiation source with an emission spectrum with a freestanding line emission in the spectral range from 12.5 nm to 14.5 nm has a relative bandwidth of λ/Δλ>1000, means for the broadband spectral filtering λ/Δλ
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公开(公告)号：US20220331462A1
公开(公告)日：2022-10-20
申请号：US17234714
申请日：2021-04-19
发明人： Daniel Shedlock , David Nisius , Gregory Andrews , Jeff Adams
摘要： Technology is described to uniformly apply doses of radiation to a target material. An irradiation device may comprise an enclosure configured to receive a target material and a source configured to emit primary radiation within the enclosure. The primary radiation may be configured to irradiate at least a first portion of the target material. The irradiation device may further comprise a scattering medium disposed within the enclosure. The scattering medium may be configured to produce secondary radiation through scatter interactions in response to the primary radiation, the secondary radiation configured to irradiate at least a second portion of the target material. A thickness of the scattering medium relative to the primary radiation may have a thickness of at least 3 millimeters).
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