公开(公告)号：US20220392660A1

公开(公告)日：2022-12-08

申请号：US17760684

申请日：2020-09-15

申请人： RI Research Instruments GmbH

发明人： Rainer LEBERT ,  Christoph Sebastian PHIESEL ,  Thomas MISSALLA ,  Andreas BIERMANNS-FOETH ,  Christian PIEL

IPC分类号： G21K1/06 ,  G03F7/20 ,  G21K7/00 ,  G21K1/10 ,  G03F1/84

摘要： A microscope system for flexibly, efficiently and quickly inspecting patterns and defects on extreme ultraviolet (EUV) lithography photomasks. The system includes a stand-alone plasma-based EUV radiation source with an emission spectrum with a freestanding line emission in the spectral range from 12.5 nm to 14.5 nm has a relative bandwidth of λ/Δλ>1000, means for the broadband spectral filtering λ/Δλ