公开(公告)号：US20230407517A1

公开(公告)日：2023-12-21

申请号：US17843286

申请日：2022-06-17

申请人： General Electric Company

发明人： Andrew Lee Trimmer ,  John Malott Cottrill ,  Douglas Carl Hofer ,  Bugra Han Ertas

IPC分类号： C25F7/00 ,  C25F3/14 ,  C25F3/04 ,  C25F3/08

CPC分类号： C25F7/00 ,  C25F3/14 ,  C25F3/04 ,  C25F3/08

摘要： Methods and systems of electrochemically machining a component are provided. The method may include applying two or more potentials to a tool electrode comprising an array of two or more individual electrodes to generate two or more electric fields in between the tool electrode and a workpiece opposite of the tool electrode, wherein each of the two or more electric fields is generated by one of the array of two or more individual electrodes.

公开(公告)号：US10570011B1

公开(公告)日：2020-02-25

申请号：US16117456

申请日：2018-08-30

申请人： The United States of America as represented by the Secretary of the Navy

发明人： Paul D. Swanson ,  Andrew Wang

IPC分类号： B81C1/00 ,  H01L29/84 ,  B81C99/00 ,  C25F3/08

摘要： A method for fabricating a microelectromechanical system device. Submerging a microelectromechanical system device in water. The microelectromechanical system devices include a sacrificial layer deposited on the surface of a substrate between the portion of a structural layer to be freed for movement and a base. Anodically etching the sacrificial layer from the microelectromechanical device to free the portion of the structural layer for movement. A system comprising a solution of water, a microelectromechanical system device including a sacrificial layer of chromium deposited on the surface of a substrate between a portion of a structural layer and a base. The microelectromechanical system device is submerged in the solution of water. An electrode is submerged in the water. The electrode provides a negative bias. A voltage source provides a positive bias to the sacrificial layer of chromium, anodically etching the sacrificial layer of chromium and freeing the portion of the structural layer.

公开(公告)号：US20190119823A1

公开(公告)日：2019-04-25

申请号：US16230264

申请日：2018-12-21

申请人： Kings Mountain International, Inc.

发明人： Jordi Reichert

IPC分类号： C25D5/14 ,  C25D5/48 ,  C25F3/08 ,  C25D21/12 ,  C25D3/04 ,  C25F7/00 ,  C25D5/02 ,  C25D17/00

摘要： A method for creating a chrome-plated surface having a matte finish that typically includes: controlling a resistance of a current bridge circuit; depositing a first chromium layer on a substrate positioned in a chromium bath, wherein the first chromium layer is deposited by supplying current from a power source that is electrically connected to the substrate and to anodes positioned in the chromium bath; etching the first chromium layer by engaging a current bridge that closes the current bridge circuit; depositing a first intermediate chromium layer, wherein the first intermediate chromium layer is deposited by supplying current from the power source; etching the first intermediate chromium layer, wherein the first intermediate chromium layer is etched by engaging the current bridge; and depositing a final chromium layer, wherein the final chromium layer is deposited by supplying current from the power source.

公开(公告)号：US10202703B2

公开(公告)日：2019-02-12

申请号：US15685736

申请日：2017-08-24

申请人： BOE Technology Group Co., Ltd. ,  Hefei Xinsheng Optoelectronics Technology Co., Ltd.

发明人： Yongxian Xie ,  Chuanfeng Deng ,  Youlu Li ,  Zhiyang He

IPC分类号： C02F1/46 ,  C25F3/08 ,  C02F1/461 ,  C02F9/00 ,  C02F1/04 ,  C02F1/467 ,  C02F1/52 ,  C02F1/66 ,  C02F103/34

摘要： This disclosure provides a method for treating an etching waste liquid from an etching process of indium tin oxide comprising hydrochloric acid, acetic acid, tin ions, indium ions and water, comprising the steps of: distilling the etching waste liquid to obtain a distillate comprising hydrochloric acid and acetic acid and a post-distillation liquid comprising tin ions and indium ions; generating a precipitate by reacting tin ions in the post-distillation liquid with sulfide ions to remove tin ions from the solution so as to obtain a post-precipitation solution containing indium ions; and electrolyzing the post-precipitation solution to obtain crude indium.

公开(公告)号：US20160356739A1

公开(公告)日：2016-12-08

申请号：US15238795

申请日：2016-08-17

申请人： Mohammad Abdolahad ,  Ali Saeidi ,  Milad Gharooni

发明人： Mohammad Abdolahad ,  Ali Saeidi ,  Milad Gharooni

IPC分类号： G01N27/327 ,  G01N27/28 ,  C23C28/00 ,  C23C14/30 ,  C23C14/14 ,  C23C16/24 ,  G01N33/483 ,  C25F3/08

摘要： An electrical probe configured to measure an electrical response from a biological cell includes a microwire having a sharpened tip, a catalyst layer formed on the sharpened tip of the microwire, and an array of nanotube electrodes vertically aligned on the catalyst layer.

摘要翻译： 构造成测量来自生物细胞的电响应的电探针包括具有尖锐尖端的微线，形成在微线的尖锐尖端上的催化剂层和在催化剂层上垂直对准的纳米管电极阵列。

公开(公告)号：US5993638A

公开(公告)日：1999-11-30

申请号：US862242

申请日：1997-05-23

申请人： Ulf Rolander

发明人： Ulf Rolander

IPC分类号： B23H1/08 ,  B23H9/02 ,  C25F3/08 ,  B23H3/00

CPC分类号： B23H9/02 ,  B23H1/08 ,  C25F3/08

摘要： There is disclosed a method for edge rounding of cutting tool inserts, in combination with a high surface finish over the whole insert, of cemented carbide or titanium-based carbonitride alloys. An electrolytic method is used with an electrolyte which provides an even removal of both binder phase and hard constituent phases. The electrolyte comprises perchloric (HClO.sub.4) or sulphuric (H.sub.2 SO.sub.4) acid, in amounts >15 and

摘要翻译： 公开了一种用于在硬质合金或钛基碳氮化物合金上切削刀具刀片的边缘圆化与整个刀片上的高表面光洁度相结合的方法。 电解方法与电解质一起使用，其提供粘结相和硬组分相的均匀去除。 在甲醇或其它合适的有机液体中，电解质包含量大于15和<50体积％的高氯酸（HClO4）或硫酸（H 2 SO 4）酸。 该方法比常规机械方法更容易控制，并且特别适用于提供非常小的边缘半径约10微米，并且在整个插入件上结合高表面光洁度，这不能通过机械或其它电解方法来制造。

公开(公告)号：US4452677A

公开(公告)日：1984-06-05

申请号：US462836

申请日：1983-02-02

申请人： Donald A. Richardson

发明人： Donald A. Richardson

IPC分类号： C25F3/08 ,  H01J9/32

CPC分类号： H01J9/323 ,  C25F3/08

摘要： Tungsten-to-quartz seals are improved by electrochemically etching drawn, ground tungsten rod until some of the original draw lines appear and then using the so treated rod in the seal formation. The etching is carried out in a solution of NaNO.sub.2 ; NaOH; and H.sub.2 O.

摘要翻译： 通过电化学蚀刻拉制的钨丝杆直到出现一些原始的拉丝线，然后在密封结构中使用如此处理的棒来改善钨 - 石英密封。 蚀刻在NaNO 2溶液中进行; NaOH; 和H2O。

公开(公告)号：US4169027A

公开(公告)日：1979-09-25

申请号：US921263

申请日：1978-07-03

申请人： Jerzy Malinowski

发明人： Jerzy Malinowski

IPC分类号： C25F3/08 ,  C25F3/26 ,  C25F3/16

CPC分类号： C25F3/08 ,  C25F3/26

摘要： A method of electrochemically processing the surface of a workpiece of modenum or of an alloy containing a high proportion of molybdenum. The workpiece is connected as an anode in an electrolytic solution comprising 70 to 90% by volume of 2-propanol and 30 to 10% by volume of concentrated sulfuric acid.

摘要翻译： 一种电化学处理钼或含有高比例钼的合金的工件表面的方法。 将工件作为阳极连接在包含70〜90体积％的2-丙醇和30〜10体积％的浓硫酸的电解液中。

公开(公告)号：US3883410A

公开(公告)日：1975-05-13

申请号：US16817371

申请日：1971-08-02

申请人： INOUE K

发明人： INOUE KIYOSHI

IPC分类号： B24B31/00 ,  C25F3/02 ,  C25F3/04 ,  C25F3/06 ,  C25F3/08 ,  B23P1/04

CPC分类号： B24B31/00 ,  C25F3/02 ,  C25F3/04 ,  C25F3/06 ,  C25F3/08

摘要： Apparatus for the electrochemical deburring of metallic workpieces in which a fixture forms a support for the workpieces which, together with carbon particles and/or other abrasive particles, are agitated in an electrolyte.

摘要翻译： 用于金属工件的电化学去毛刺的装置，其中夹具形成用于工件的支撑件，其与碳颗粒和/或其它磨料颗粒一起在电解液中搅拌。

公开(公告)号：US3560357A

公开(公告)日：1971-02-02

申请号：US3560357D

申请日：1968-07-26

申请人： RCA CORP

发明人： SHAW JOSEPH M

IPC分类号： C25F3/08 ,  C23B3/04 ,  C23F1/02

CPC分类号： C25F3/08

摘要： A TUNGSTEN FILM IS ETCHED ELECTROLYTICALLY IN A SOLUTION WHICH ALSO ACTS AS A CHEMICAL ETCHANT. THE CHEMICAL ACTION OF THE ETCHANT REMOVES THE LAST TRACES OF TUNGSTEN AFTER THE ELECTROLYTIC ETCHING ACTION IS TERMINATED BY BREAK-UP OF THE TUNGSTEN LAYER INTO A NUMBER OF THIS ELECTRICALLY ISOLATED "ISLANDS."