Pre-exfoliated layered material
    3.
    发明授权

    公开(公告)号:US10414900B2

    公开(公告)日:2019-09-17

    申请号:US15104711

    申请日:2014-12-11

    Abstract: Pre-exfoliated natural or synthetic, modified or unmodified layered materials are prepared by mixing layered materials with one or more plastics additives selected from the group consisting of ultraviolet light absorbers, hindered amine light stabilizers, antioxidants, colorants, flame retardants, antimicrobials and fatty acid additives and melt extruding the mixture. The layered materials are for example modified or unmodified layered silicate clays. The galleries of the layered materials in the mixtures are expanded to a level of less than full exfoliation. The melt extruded mixtures of layered materials and additives are highly useful to prepare polymer nanocomposites.

    ALKOXYLATED ALCOHOL COMPOSITION AND PREPARATION OF SAME

    公开(公告)号:US20170267914A1

    公开(公告)日:2017-09-21

    申请号:US15617406

    申请日:2017-06-08

    CPC classification number: C09K8/584 C07C43/04

    Abstract: The invention relates to an alkoxylated alcohol composition, wherein the composition comprises an alkoxylated alcohol which is of the formula (I) Formula (I) R—O—[PO]x[EO]y—H wherein R is a hydrocarbyl group which has a weight average carbon number of from 5 to 32, PO is a propylene oxide group, EO is an ethylene oxide group, x is the number of propylene oxide groups and is of from 0 to 40, y is the number of ethylene oxide groups and is of from 0 to 50, and the sum of x and y is of from 5 to 60; and wherein the composition additionally comprises a stabilizer which is a phenolic antioxidant. Further, the invention relates to a process for preparing said alkoxylated alcohol composition.

    STABILIZER FOR THIOL-ENE COMPOSITIONS
    8.
    发明申请

    公开(公告)号:US20170022414A1

    公开(公告)日:2017-01-26

    申请号:US15039901

    申请日:2014-11-24

    Abstract: The present invention relates to stabilizers for thiol-ene compositions and to radiation curable thiol-ene compositions based thereon. Such radiation curable compositions can advantageously be used in inks, overprint varnishes, coatings, adhesives, for the making of 3D objects and for the making of solder resist and gel nails. Provided in particular is an inhibitor system (I) for thiol-ene compositions based on —at least one inhibitor compound (i) having a % DPPH radical scavenging activity of at least 90%, the inhibitor compound (i) being selected from substituted benzene compounds or substituted naphthalene compounds containing at least two substituents selected from the group consisting of hydroxyl groups and C1-C3 alkoxy groups bonded directly to the benzene or the naphthalene ring, —at least one acidic compound (ii) having a pKa between 1 and 3, and —at least one compound (iii) selected from the group consisting of phosphites and phosphonites, with the proviso that if the inhibitor compound (i) is a substituted benzene that it contains at least two hydroxyl groups bonded directly to the benzene ring. Also provided is an inhibitor system (II) for thiol-ene compositions based on that is based on —at least one inhibitor compound (i) having a % DPPH radical scavenging activity of at least 90%, the inhibitor compound (i) being selected from substituted benzene compounds or substituted naphthalene compounds containing at least two substituents selected from the group consisting of hydroxyl groups and C1-C3 alkoxy groups bonded directly to the benzene or the naphthalene ring, —at least one compound (iv) selected from the group consisting of spirophosphites, and —optionally, at least one acidic compound (ii) having a pKa between 1 and 3, and with the proviso that if the inhibitor compound (i) is a substituted benzene that it contains at least two hydroxyl groups bonded directly to the benzene ring.

Patent Agency Ranking