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    Sintered quartz glass products and methods for making same
    3.
    发明授权
    Sintered quartz glass products and methods for making same 失效
    烧结石英玻璃制品及其制造方法

    公开(公告)号：US06381986B1

    公开(公告)日：2002-05-07

    申请号：US09481208

    申请日：2000-01-11

    申请人： Ted A. Loxley ,  John F. Blackmer ,  Klaus-Markus Peters

    发明人： Ted A. Loxley ,  John F. Blackmer ,  Klaus-Markus Peters

    IPC分类号： C03B1906

    CPC分类号： C03B19/12 ,  C03B19/06 ,  C03B19/066 ,  C03B20/00 ,  C03B2201/24 ,  Y02P40/57 ,  Y10S65/08

    摘要： A number of unique processes are disclosed for manufacture of sintered high-purity quartz glass products in which a shaped silica body or preform is made from an aqueous slurry of micronized silica particles by gel casting, slip casting or electrophoretic deposition. The silica particles may comprise a major portion by weight of crystalline silica. In one embodiment of the invention the sintered quartz glass is transparent, substantially bubble-free and suitable for scientific or optical uses. In another embodiment the porous silica preform is fired in steam to increase the hydroxyl content and then nitrided in a nitrogen-hydrogen reducing atmosphere. A minute amount of chemically-combined nitrogen in the high-purity quartz glass is sufficient to provide a tremendous improvement in physical properties and an incredible increase in the resistance to devitrification.

    摘要翻译： 公开了用于制造烧结高纯度石英玻璃产品的许多独特方法，其中通过凝胶浇铸，滑移浇铸或电泳沉积由二氧化硅微粒化颗粒的水性浆料制成成形二氧化硅体或预制件。 二氧化硅颗粒可以包含大部分重量的结晶二氧化硅。 在本发明的一个实施例中，烧结石英玻璃是透明的，基本上无气泡的并且适用于科学或光学用途。 在另一个实施方案中，多孔二氧化硅预制体在蒸汽中焙烧以增加羟基含量，然后在氮 - 氢还原气氛中氮化。 高纯度石英玻璃中的少量化学结合的氮足以提供物理性能的极大改善和耐失透性的惊人增加。

    Synthetic quartz glass manufacturing process
    4.
    发明授权
    Synthetic quartz glass manufacturing process 有权
    合成石英玻璃制造工艺

    公开(公告)号：US06339940B1

    公开(公告)日：2002-01-22

    申请号：US09553392

    申请日：2000-04-20

    申请人： Motoyuki Yamada ,  Hisatoshi Otsuka ,  Koji Matsuo

    发明人： Motoyuki Yamada ,  Hisatoshi Otsuka ,  Koji Matsuo

    IPC分类号： C03B1906

    CPC分类号： C03B37/0144 ,  C03B19/1407 ,  C03B19/1446

    摘要： A process for manufacturing synthetic quartz glass involves feeding a quartz glass-forming raw material to a high-temperature gas zone within a chamber, converting the quartz glass-forming raw material into quartz soot, and forming synthetic quartz glass from the soot. A suspended soot-discharging gas which has been flow-straightened in a suspended soot discharging direction flows through the chamber in the vicinity of the high-temperature gas zone. This process keeps free suspended soot from settling onto the surface of the quartz ingot where fusion and growth take place, thereby preventing the formation of bubbles within the quartz glass under growth.

    摘要翻译： 制造合成石英玻璃的方法包括将石英玻璃形成原料进料到室内的高温气体区域，将石英玻璃形成原料转化成石英烟灰，并从烟灰形成合成石英玻璃。 在悬浮烟炱排出方向上流动整流的悬浮的烟灰排出气体在高温气体区域附近流过室。 该过程保持游离的悬浮烟灰沉降到熔融和生长发生的石英锭的表面上，从而防止石英玻璃生长过程中的气泡形成。

    Product method of synthetic silica glass and thermal treatment apparatus
    6.
    发明授权
    Product method of synthetic silica glass and thermal treatment apparatus 有权
    合成石英玻璃和热处理设备的产品方法

    公开(公告)号：US06732546B1

    公开(公告)日：2004-05-11

    申请号：US09806236

    申请日：2001-03-28

    申请人： Shouji Yajima ,  Hiroyuki Hiraiwa ,  Yasuji Ishida

    发明人： Shouji Yajima ,  Hiroyuki Hiraiwa ,  Yasuji Ishida

    IPC分类号： C03B1906

    CPC分类号： C03B19/1484 ,  C03B19/1453 ,  C03B25/02 ,  C03B32/00 ,  C03C3/06 ,  C03C23/007 ,  C03C2201/02 ,  C03C2203/40 ,  C03C2203/52

    摘要： A production method of synthetic silica glass according to the present invention comprises a first step of ejecting a silicon compound and a combustion gas containing oxygen and hydrogen from a burner to effect hydrolysis of the silicon compound in oxyhydrogen flame to produce fine particles of silica glass, and thereafter depositing and vitrifying the fine particles of silica glass on a target opposed to the burner to obtain a synthetic silica glass ingot; a second step of heating the synthetic silica glass ingot or the like obtained in the first step up to a first retention temperature of not less than 900° C., retaining the ingot or the like at the first retention temperature, and cooling the ingot or the like at a temperature decrease rate of not more than 10° C./h down to a temperature of not more than 500° C.; and a third step of heating the synthetic silica glass ingot or the like obtained in the second step up to a second retention temperature of not less than 500° C. nor more than 1100° C., retaining the ingot or the like thereat, and thereafter cooling the ingot or the like at a temperature decrease rate of not less than 50° C./h down to a temperature 100° C. lower than the second retention temperature.

    摘要翻译： 根据本发明的合成石英玻璃的制造方法包括：第一步骤，从燃烧器喷射含有氧和氢的硅化合物和燃烧气体，以在氢氧焰中水解硅化合物，生成石英玻璃微粒， 然后在与燃烧器相对的靶上沉积并玻璃化石英玻璃的微粒，得到合成石英玻璃锭; 将第一步骤中获得的合成石英玻璃锭等加热至不低于900℃的第一保持温度，将锭等保持在第一保持温度的第二步骤，并将锭子或 其温度降低率不超过10℃/ h，降至不超过500℃的温度; 以及将第二工序中得到的合成二氧化硅玻璃锭等加热至不低于500℃，不高于1100℃的第二保持温度的第三步骤，将锭等保持在其上， 然后以不低于50℃/ h的温度降低速率将锭等冷却至比第二保持温度低100℃的温度。

    Quartz glass body for optical component and process for manufacture thereof
    7.
    发明授权
    Quartz glass body for optical component and process for manufacture thereof 有权
    用于光学部件的石英玻璃体及其制造方法

    公开(公告)号：US06550277B1

    公开(公告)日：2003-04-22

    申请号：US09709168

    申请日：2000-11-10

    申请人： Bruno Uebbing ,  Jan Vydra

    发明人： Bruno Uebbing ,  Jan Vydra

    IPC分类号： C03B1906

    CPC分类号： C03C4/0085 ,  C03B19/1453 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/075 ,  C03C3/06 ,  C03C2201/06 ,  C03C2201/08 ,  C03C2201/23 ,  C03C2203/40 ,  Y10S65/08 ,  Y10S65/16 ,  Y10S501/905

    摘要： The invention concerns a quartz glass body for an optical component for the transmission of UV radiation with a wavelength of 250 nm and less, especially for a wavelength of 157 nm, as well as a process for the manufacture of the quartz glass body where fine quartz glass particles are formed by flame hydrolysis of a silicon compound, deposited and vitrified. Suitability of a quartz glass as represented by high base transmission and radiation resistance depends on structural properties caused by local stoichiometric deviations, and on the chemical composition. The quartz glass body according to the inventions is distinguished by a uniform base transmission (relative change of base transmission ≦1%) in the wavelength range from 155 nm to 250 nm (radiation penetration depth of 10 mm) of at least 80%, a low OH content (less than 10 ppm by weight) and a glass structure substantially free from oxygen defect centers. A quartz glass body of this kind is manufactured by a process which allows bulk embedding of hydrogen or oxygen into the glass network in that at least a two stage heat treatment takes place at temperatures ranging from 850° C. to 1600° C. before the vitrification, the last stage comprising sintering at a temperature between 1300° C. and 1600° C. in an atmosphere containing hydrogen or oxygen, or a nonflammable mixture of these substances.

    摘要翻译： 本发明涉及一种用于传输波长为250nm以下，特别是波长为157nm的紫外线的光学部件的石英玻璃体，以及用于制造石英玻璃体的方法，其中精细的石英 通过硅化合物的火焰水解形成玻璃颗粒，沉积并玻璃化。 由高碱性透射和耐辐射性表示的石英玻璃的适用性取决于由局部化学计量偏差引起的结构特性以及化学成分。 根据本发明的石英玻璃体的特征在于在155nm至250nm（辐射穿透深度为10mm）的波长范围内的均匀的基底透射率（基底透射率的相对变化<= 1％）为至少80％ 低OH含量（小于10ppm重量）和基本上不含氧缺陷中心的玻璃结构。 这种石英玻璃体是通过允许将氢气或氧气大量嵌入玻璃网络的方法来制造的，因为至少在两个阶段之间的热处理在850℃至1600℃之间的温度下进行 玻璃化，最后阶段包括在含有氢气或氧气的气氛中在1300℃和1600℃之间的温度下烧结，或这些物质的不可燃混合物。

    Process for producing flame reaction members for burners
    8.
    发明授权
    Process for producing flame reaction members for burners 失效
    燃烧器用火焰反应部件的制造方法

    公开(公告)号：US06311521B1

    公开(公告)日：2001-11-06

    申请号：US09111607

    申请日：1998-07-07

    申请人： Hideo Mifune ,  Masato Seki

    发明人： Hideo Mifune ,  Masato Seki

    IPC分类号： C03B1906

    CPC分类号： F23Q2/30 ,  F23Q2/287

    摘要： A raw material mixture, which has a glass composition containing a salt or an oxide of a flame reaction metal, is heated, and an intermediate base material, in which the salt of the flame reaction metal, or the like, has been thermally decomposed and which is in a temporary sintered state or a fused glass state, is thereby formed. The intermediate base material is ground, and a ground material is thereby obtained. The ground material is mixed together with a liquid and, optionally, a binder, and a viscous flame reaction material is thereby formed. The viscous flame reaction material is supported on a substrate and heated to a temperature, which is not lower than a vitrification melting temperature of the viscous flame reaction material. In this manner, the flame reaction material is fusion bonded to the substrate. Generation of a thermal decomposition gas in the baking step is thus restricted, and the carrying of the flame reaction material on the substrate is carried out appropriately.

    摘要翻译： 具有含有火焰反应金属的盐或氧化物的玻璃组合物的原料混合物被加热，其中火焰反应金属的盐等已被热分解的中间基材， 由此形成临时烧结状态或熔融玻璃状态。 研磨中间基材，得到研磨材料。 研磨材料与液体和任选的粘合剂混合在一起，从而形成粘性火焰反应材料。 将粘性火焰反应材料负载在基材上并加热到不低于粘性火焰反应材料的玻璃化熔融温度的温度。 以这种方式，将火焰反应材料熔合到基材上。 因此，在烘烤工序中产生热分解气体受到限制，并且适当地进行基材上的火焰反应物质的携带。

    Methods for producing fused silica glass
    10.
    发明授权
    Methods for producing fused silica glass 失效
    石英玻璃生产方法

    公开(公告)号：US06532767B1

    公开(公告)日：2003-03-18

    申请号：US09659880

    申请日：2000-09-12

    申请人： Raymond E. Lindner ,  Mahendra Kumar Misra ,  David C. Sauer

    发明人： Raymond E. Lindner ,  Mahendra Kumar Misra ,  David C. Sauer

    IPC分类号： C03B1906

    CPC分类号： C03B19/14 ,  C03B19/1423 ,  C03B2201/21 ,  C03B2207/36 ,  C03B2207/70 ,  Y10S65/08 ,  Y10S65/13

    摘要： Methods for producing high purity fused silica (HPFS) glass having desired levels of dissolved hydrogen are provided. The methods involve measuring the level of hydrogen in the cavity of the furnace used to produce the glass and controlling the pressure within the furnace and/or gas flows to the furnace's burners so that the measured concentration has a desired value. In this way, the level of dissolved hydrogen in the glass can be controlled since, as shown in FIG. 3, there is a direct correlation between the hydrogen concentration in the cavity atmosphere and level of dissolved hydrogen in the glass.

    摘要翻译： 提供了具有所需水溶液的高纯度熔融石英（HPFS）玻璃的方法。 这些方法包括测量用于制造玻璃的炉的空腔中的氢的水平，并且控制炉内的压力和/或气体流入炉的燃烧器，使得测量的浓度具有期望的值。 以这种方式，可以控制玻璃中溶解的氢的水平，因为如图1所示。 如图3所示，在空腔气氛中的氢浓度和玻璃中溶解氢的水平之间存在直接的相关性。