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公开(公告)号：US20120274004A1
公开(公告)日：2012-11-01
申请号：US13546436
申请日：2012-07-11
申请人： Boris Kobrin
发明人： Boris Kobrin
CPC分类号： G03F7/2035 , B82Y40/00 , G03F1/0007 , G03F1/0084 , G03F1/34 , G03F1/50 , G03F1/60 , G03F7/0012 , G03F7/2014 , G03F7/2032
摘要： Embodiments of the invention relate to methods and apparatus useful in the nanopatterning of large area substrates, where a movable nanostructured film is used to image a radiation-sensitive material. The nanopatterning technique makes use of Near-Field photolithography, where the nanostructured film used to modulate light intensity reaching radiation-sensitive layer. The Near-Field photolithography may make use of an elastomeric phase-shifting mask, or may employ surface plasmon technology, where a movable film comprises metal nano holes or nanoparticles.
摘要翻译： 本发明的实施例涉及在大面积基板的纳米图案中有用的方法和装置，其中使用可移动的纳米结构膜来对辐射敏感材料成像。 纳米图案技术利用近场光刻技术，其中纳米结构膜用于调制到达辐射敏感层的光强度。 近场光刻可以使用弹性体相移掩模，或者可以采用表面等离子体激元技术，其中可移动膜包括金属纳米孔或纳米颗粒。
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公开(公告)号：US08017308B2
公开(公告)日：2011-09-13
申请号：US11837253
申请日：2007-08-10
IPC分类号： G03F7/24
CPC分类号： G03F1/14 , G03F1/0007 , G03F1/50 , G03F1/60 , G03F7/24 , G03F7/703 , G03F7/7035 , G03F7/70783 , G03F7/70791
摘要： A pattern is formed on a non-planar surface by forming a layer of photoresist on a part having a surface comprising a non-planar surface area. A deformable mask is aligned over at least a portion of the non-planar surface area of the part such that the deformable mask substantially deforms in a manner corresponding to at least a portion of the non-planar surface area of the part. The photoresist on the part is exposed through the mask so as to transfer a desired pattern onto the part while the deformable mask is maintained in a deformed state.
摘要翻译： 通过在具有非平面表面积的表面的部分上形成光致抗蚀剂层，在非平面表面上形成图案。 可变形掩模在部件的非平面表面区域的至少一部分上对齐，使得可变形掩模基本上以与部件的非平面表面区域的至少一部分相对应的方式变形。 部件上的光致抗蚀剂通过掩模曝光，以将期望的图案转印到部件上，同时可变形掩模保持在变形状态。
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公开(公告)号：US09465296B2
公开(公告)日：2016-10-11
申请号：US13546436
申请日：2012-07-11
申请人： Boris Kobrin
发明人： Boris Kobrin
CPC分类号： G03F7/2035 , B82Y40/00 , G03F1/0007 , G03F1/0084 , G03F1/34 , G03F1/50 , G03F1/60 , G03F7/0012 , G03F7/2014 , G03F7/2032
摘要： Embodiments of the invention relate to methods and apparatus useful in the nanopatterning of large area substrates, where a movable nanostructured film is used to image a radiation-sensitive material. The nanopatterning technique makes use of Near-Field photolithography, where the nanostructured film used to modulate light intensity reaching radiation-sensitive layer. The Near-Field photolithography may make use of an elastomeric phase-shifting mask, or may employ surface plasmon technology, where a movable film comprises metal nano holes or nanoparticles.
摘要翻译： 本发明的实施例涉及在大面积基板的纳米图案中有用的方法和装置，其中使用可移动的纳米结构膜来对辐射敏感材料成像。 纳米图案技术利用近场光刻技术，其中纳米结构膜用于调制到达辐射敏感层的光强度。 近场光刻可以使用弹性体相移掩模，或者可以采用表面等离子体激元技术，其中可移动膜包括金属纳米孔或纳米颗粒。
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公开(公告)号：US20110292360A1
公开(公告)日：2011-12-01
申请号：US13206770
申请日：2011-08-10
IPC分类号： G03B27/52
CPC分类号： G03F1/14 , G03F1/0007 , G03F1/50 , G03F1/60 , G03F7/24 , G03F7/703 , G03F7/7035 , G03F7/70783 , G03F7/70791
摘要： A system for forming a pattern on a part comprises a chamber base, a pressure vessel and a retaining device. The retaining device is positionable between the chamber base and the pressure vessel to secure a deformable mask therebetween. The system further comprises a first pressure source, a second pressure source and a third pressure source. The first pressure source provides a negative pressure within the chamber to draw the mask towards a part installed within the chamber base. The second pressure source provides a positive pressure within the pressure vessel to direct the mask towards the part so that the mask corresponds to at least one complex non-planar surface of the part. The third pressure source provides a negative pressure within pressure vessel. An exposure source exposes the part through the mask while the mask is deformed corresponding to the at least one complex non-planar surface of the part.
摘要翻译： 用于在部件上形成图案的系统包括腔室底座，压力容器和保持装置。 保持装置可定位在腔室底座和压力容器之间，以将可变形掩模固定在其间。 该系统还包括第一压力源，第二压力源和第三压力源。 第一压力源在腔室内提供负压，以朝着安装在腔室底部内的部分拉出掩模。 第二压力源在压力容器内提供正压力以将掩模引向部件，使得掩模对应于部件的至少一个复杂的非平面表面。 第三压力源在压力容器内提供负压。 当掩模相对于该零件的至少一个复杂非平面表面变形时，曝光源通过掩模曝光该零件。
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公开(公告)号：US09740072B2
公开(公告)日：2017-08-22
申请号：US14777523
申请日：2015-06-24
发明人： Xiaoping Yu , Hsiaohsien Chen
IPC分类号： G02F1/1335 , G02F1/15 , G02F1/1343 , G02F1/155 , G02F1/163 , G02B5/22 , G03F1/00 , G02B5/20
CPC分类号： G02F1/1521 , G02B5/201 , G02B5/223 , G02F1/133512 , G02F1/133514 , G02F1/133516 , G02F1/134309 , G02F1/13439 , G02F1/155 , G02F1/157 , G02F1/163 , G02F2001/134345 , G02F2001/1515 , G02F2201/44 , G02F2201/52 , G02F2203/30 , G02F2203/62 , G03F1/0007
摘要： The present invention provides a color filter and a liquid crystal display. The color filter comprises a substrate, and a color resist layer and a black matrix positioned on the substrate, and the color resist layer comprises a plurality of pixel areas aligned in array, and the plurality of pixel areas are separated by the black matrix, and the pixel area comprises a sub pixel main area and a sub pixel sub area, and two sides of the sub pixel sub area are respectively provided with a first transparent electrode and a second transparent electrode electrically coupled thereto; the sub pixel sub area is made by electrochromic material, and by adjusting voltage signals applied to the two sides of the sub pixel sub area with the first transparent electrode and the second transparent electrode, color variation of the sub pixel sub area is controlled to achieve switch of the color filter between high color saturation and high brightness display modes. The liquid crystal panel of the present invention is provided with the color filter capable of achieving switch of the color filter between high color saturation and high brightness display modes to satisfy the display requirement of high color saturation and high brightness at the same time.
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公开(公告)号：US20170168365A1
公开(公告)日：2017-06-15
申请号：US14777523
申请日：2015-06-24
发明人： Xiaoping Yu , Hsiaohsien Chen
IPC分类号： G02F1/15 , G02F1/163 , G02F1/155 , G02F1/1343 , G02F1/1335
CPC分类号： G02F1/1521 , G02B5/201 , G02B5/223 , G02F1/133512 , G02F1/133514 , G02F1/133516 , G02F1/134309 , G02F1/13439 , G02F1/155 , G02F1/157 , G02F1/163 , G02F2001/134345 , G02F2001/1515 , G02F2201/44 , G02F2201/52 , G02F2203/30 , G02F2203/62 , G03F1/0007
摘要： The present invention provides a color filter and a liquid crystal display. The color filter comprises a substrate, and a color resist layer and a black matrix positioned on the substrate, and the color resist layer comprises a plurality of pixel areas aligned in array, and the plurality of pixel areas are separated by the black matrix, and the pixel area comprises a sub pixel main area and a sub pixel sub area, and two sides of the sub pixel sub area are respectively provided with a first transparent electrode and a second transparent electrode electrically coupled thereto; the sub pixel sub area is made by electrochromic material, and by adjusting voltage signals applied to the two sides of the sub pixel sub area with the first transparent electrode and the second transparent electrode, color variation of the sub pixel sub area is controlled to achieve switch of the color filter between high color saturation and high brightness display modes. The liquid crystal panel of the present invention is provided with the color filter capable of achieving switch of the color filter between high color saturation and high brightness display modes to satisfy the display requirement of high color saturation and high brightness at the same time.
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公开(公告)号：US08891065B2
公开(公告)日：2014-11-18
申请号：US13206770
申请日：2011-08-10
CPC分类号： G03F1/14 , G03F1/0007 , G03F1/50 , G03F1/60 , G03F7/24 , G03F7/703 , G03F7/7035 , G03F7/70783 , G03F7/70791
摘要： A system for forming a pattern on a part comprises a chamber base, a pressure vessel and a retaining device. The retaining device is positionable between the chamber base and the pressure vessel to secure a deformable mask therebetween. The system further comprises a first pressure source, a second pressure source and a third pressure source. The first pressure source provides a negative pressure within the chamber to draw the mask towards a part installed within the chamber base. The second pressure source provides a positive pressure within the pressure vessel to direct the mask towards the part so that the mask corresponds to at least one complex non-planar surface of the part. The third pressure source provides a negative pressure within pressure vessel. An exposure source exposes the part through the mask while the mask is deformed corresponding to the at least one complex non-planar surface of the part.
摘要翻译： 用于在部件上形成图案的系统包括腔室底座，压力容器和保持装置。 保持装置可定位在腔室底座和压力容器之间，以将可变形掩模固定在其间。 该系统还包括第一压力源，第二压力源和第三压力源。 第一压力源在腔室内提供负压，以朝着安装在腔室底部内的部分拉出掩模。 第二压力源在压力容器内提供正压力以将掩模朝向部件引导，使得掩模对应于部件的至少一个复杂的非平面表面。 第三压力源在压力容器内提供负压。 当掩模相对于该零件的至少一个复杂非平面表面变形时，曝光源通过掩模曝光该零件。
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公开(公告)号：US20080038677A1
公开(公告)日：2008-02-14
申请号：US11837253
申请日：2007-08-10
申请人： Eric Hogue , Stephen Krak , Timothy Stanfield
发明人： Eric Hogue , Stephen Krak , Timothy Stanfield
CPC分类号： G03F1/14 , G03F1/0007 , G03F1/50 , G03F1/60 , G03F7/24 , G03F7/703 , G03F7/7035 , G03F7/70783 , G03F7/70791
摘要： A pattern is formed on a non-planar surface by forming a layer of photoresist on a part having a surface comprising a non-planar surface area. A deformable mask is aligned over at least a portion of the non-planar surface area of the part such that the deformable mask substantially deforms in a manner corresponding to at least a portion of the non-planar surface area of the part. The photoresist on the part is exposed through the mask so as to transfer a desired pattern onto the part while the deformable mask is maintained in a deformed state.
摘要翻译： 通过在具有非平面表面积的表面的部分上形成光致抗蚀剂层，在非平面表面上形成图案。 可变形掩模在部件的非平面表面区域的至少一部分上对齐，使得可变形掩模基本上以与部件的非平面表面区域的至少一部分相对应的方式变形。 部件上的光致抗蚀剂通过掩模曝光，以将期望的图案转印到部件上，同时可变形掩模保持在变形状态。
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